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Extract from the Register of European Patents

EP About this file: EP1047288

EP1047288 - Plasma focus high energy photon source [Right-click to bookmark this link]
Status	No opposition filed within time limit Status updated on 16.04.2010 Database last updated on 23.04.2024
Most recent event Tooltip	10.08.2012	Lapse of the patent in a contracting state New state(s): CY	published on 12.09.2012 [2012/37]
Applicant(s)	For all designated states Cymer, Inc. 17075 Thornmint Court San Diego, CA 92127 / US
	[2004/14]
Former [2000/43]	For all designated states Cymer, Inc. 16750 Via del Campo Court San Diego, CA 92127-1712 / US
Inventor(s)	01 / Partlo, William N. 12634 Pedriza Drive Poway, CA 92064 / US
	02 / Fomenkov, Igor V. 14390 Janal Way San Diego, CA 92129 / US
	03 / Birx, Daniel L. 3300 Crismore Lane, Route 2, 175 D Oakley, CA 94561 / US
	[2000/43]
Representative(s)	Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstrasse 4 80802 München / DE
	[N/P]
Former [2000/43]	Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE
Application number, filing date	00105276.0	14.03.2000
	[2000/43]
Priority number, date	US19990268243	15.03.1999 Original published format: US 268243
	US19990324526	02.06.1999 Original published format: US 324526
	[2000/43]
Filing language	EN
Procedural language	EN
Publication	Type:	A2 Application without search report
	No.:	EP1047288
	Date:	25.10.2000
	Language:	EN
	[2000/43]
	Type:	A3 Search report
	No.:	EP1047288
	Date:	02.01.2004
	[2004/01]
	Type:	B1 Patent specification
	No.:	EP1047288
	Date:	10.06.2009
	Language:	EN
	[2009/24]
Search report(s)	(Supplementary) European search report - dispatched on:	EP	11.11.2003
Classification	IPC:	H05G2/00	[2000/43]
	CPC:	B25J19/00 (KR); B82Y10/00 (EP,US); G03F7/70033 (EP,US); G03F7/70166 (EP,US); G03F7/70916 (EP,US); G06F3/16 (KR); (+) G10L13/08 (KR); H05G2/003 (EP,US); H05G2/005 (EP,US); H05H1/06 (EP,US) (-)
Designated contracting states	AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE [2000/43]
Title	German:	Plasmaquelle von Hochenergie-Photonen	[2000/43]
	English:	Plasma focus high energy photon source	[2000/43]
	French:	Source à plasma de photons de haute énergie	[2000/43]
Examination procedure	14.03.2000	Examination requested [2000/43]
	31.07.2006	Despatch of a communication from the examining division (Time limit: M06)
	12.02.2007	Reply to a communication from the examining division
	28.03.2008	Despatch of a communication from the examining division (Time limit: M04)
	07.08.2008	Reply to a communication from the examining division
	17.12.2008	Communication of intention to grant the patent
	24.04.2009	Fee for grant paid
	24.04.2009	Fee for publishing/printing paid
Opposition(s)	11.03.2010	No opposition filed within time limit [2010/20]
Fees paid	Renewal fee
	28.03.2002	Renewal fee patent year 03
	28.03.2003	Renewal fee patent year 04
	22.03.2004	Renewal fee patent year 05
	22.03.2005	Renewal fee patent year 06
	29.03.2006	Renewal fee patent year 07
	28.03.2007	Renewal fee patent year 08
	27.03.2008	Renewal fee patent year 09
	26.03.2009	Renewal fee patent year 10
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	AT	10.06.2009
	BE	10.06.2009
	CY	10.06.2009
	DK	10.06.2009
	FI	10.06.2009
	IT	10.06.2009
	SE	10.09.2009
	GR	11.09.2009
	ES	21.09.2009
	PT	10.10.2009
	[2012/37]
Former [2011/14]	AT	10.06.2009
	BE	10.06.2009
	DK	10.06.2009
	FI	10.06.2009
	IT	10.06.2009
	SE	10.09.2009
	GR	11.09.2009
	ES	21.09.2009
	PT	10.10.2009
Former [2010/47]	AT	10.06.2009
	BE	10.06.2009
	DK	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
	GR	11.09.2009
	ES	21.09.2009
	PT	10.10.2009
Former [2010/20]	AT	10.06.2009
	BE	10.06.2009
	DK	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
	ES	21.09.2009
	PT	10.10.2009
Former [2010/16]	AT	10.06.2009
	BE	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
	ES	21.09.2009
	PT	10.10.2009
Former [2010/10]	AT	10.06.2009
	BE	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
	ES	21.09.2009
Former [2010/08]	AT	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
	ES	21.09.2009
Former [2009/52]	AT	10.06.2009
	FI	10.06.2009
	SE	10.09.2009
Former [2009/49]	AT	10.06.2009
	FI	10.06.2009
Documents cited:	Search	[XY]US5763930 (PARTLO WILLIAM NORMAN [US]) [X] 1,12-16,18,19,21 * the whole document * [Y] 6,25,31-33,35-37;
		[DYA]US5504795 (MCGEOCH MALCOLM W [US]) [DY] 6,25 * column 2, line 56 - line 59 * * column 3, line 25 - line 35 * * column 3, line 60 - column 4, line 36 * * figure 1 * [A] 28;
		[YA]US5499282 (SILFVAST WILLIAM T [US]) [Y] 31-33,35-37 * column 9, line 31 - column 11, line 11 * * figures 9a-9c * [A] 4,5,7-9,12;
		[A]US4578805 (PEARLMAN JAY S [US], et al) [A] 2,3 * column 2, line 14 - line 19 * * column 3, line 29 - line 50 * * figure 2 *;
		[A]US3426233 (SIMON DONALD R, et al) [A] 26 * column 1, line 14 - line 24 * * column 5, line 70 - column 6, line 37 *;
		[A]EP0539149 (BRITISH AEROSPACE [GB]) [A] 29 * column 1, line 1 - line 26 *;
		[A]JPH10189537
		[A] - PATENT ABSTRACTS OF JAPAN, (19981031), vol. 1998, no. 12, & JP10189537 A 19980721 (SONY CORP) [A] 20 * abstract *

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