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Extract from the Register of European Patents

EP About this file: EP1052546

EP1052546 - Substrate handler for use in lithographic projection apparatus [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.07.2005
Database last updated on 23.04.2024
Most recent event   Tooltip22.07.2005No opposition filed within time limitpublished on 07.09.2005  [2005/36]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2004/38]For all designated states
ASML Netherlands B.V.
De Run 1110, Building 2
5503 LA Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2000/46]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Segers, Hubert Marie
Munteltuinen 10
5212 's Hertogenbosch / NL
02 / Boon, Rudolf Maria
Eimerick 22
5653 RM Eindhoven / NL
03 / Bijnagte, Anton Adriaan
Kerkstraat 10
4196 AB Tricht / NL
04 / Jacobs, Fransiscus Mathijs
Eikelaar 91
5721 DE Asten / NL
[2000/46]
Representative(s)Leeming, John Gerard
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[N/P]
Former [2000/46]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date00302997.210.04.2000
[2000/46]
Priority number, dateEP1999020122321.04.1999         Original published format: EP 99201223
[2000/46]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1052546
Date:15.11.2000
Language:EN
[2000/46]
Type: A3 Search report 
No.:EP1052546
Date:21.11.2001
[2001/47]
Type: B1 Patent specification 
No.:EP1052546
Date:15.09.2004
Language:EN
[2004/38]
Search report(s)(Supplementary) European search report - dispatched on:EP09.10.2001
ClassificationIPC:G03F7/20
[2000/46]
CPC:
G03F7/707 (EP); G03F7/70358 (EP); G03F7/70716 (EP);
G03F7/7075 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2002/32]
Former [2000/46]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Substrathandhabungsvorrichtung zur Verwendung in lithographischen Projektionsapparaten[2000/46]
English:Substrate handler for use in lithographic projection apparatus[2000/46]
French:Manipulateur de substrats pour utilisation dans appareils de projection lithographique[2000/46]
Examination procedure19.12.2001Examination requested  [2002/09]
15.03.2004Communication of intention to grant the patent
09.07.2004Fee for grant paid
09.07.2004Fee for publishing/printing paid
Opposition(s)16.06.2005No opposition filed within time limit [2005/36]
Fees paidRenewal fee
25.03.2002Renewal fee patent year 03
27.03.2003Renewal fee patent year 04
31.03.2004Renewal fee patent year 05
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Documents cited:Search[A]US3865254  (JOHANNSMEIER KARL-HEINZ) [A] 1 * column 4 - column 8; figures 1-8 *;
 [A]WO9840791  (KONINKL PHILIPS ELECTRONICS NV [NL], et al) [A] 1 * page 5 - page 13; figures 1-4 *;
 [A]US4655584  (TANAKA HIROSHI [JP], et al) [A] 1 * column 3 - column 9; figures 1-9 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.