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Extract from the Register of European Patents

EP About this file: EP1161574

EP1161574 - METHOD AND APPARATUS FOR ARC DEPOSITION [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.10.2004
Database last updated on 23.04.2024
Most recent event   Tooltip15.08.2008Change - applicantpublished on 17.09.2008  [2008/38]
Applicant(s)For all designated states
GENERAL ELECTRIC COMPANY
1 River Road
Schenectady, NY 12345 / US
[N/P]
Former [2008/38]For all designated states
GENERAL ELECTRIC COMPANY
1 River Road
Schenectady NY 12345 / US
Former [2001/50]For all designated states
General Electric Company
1 River Road
Schenectady, NY 12345 / US
Inventor(s)01 / IACOVANGELO, Charles, Dominic
1717 Dorwaldt Boulevard
Schenectady, NY 12309 / US
02 / BORST, Keith, Milton
392 West Glenville Road
Scotia, NY 12302 / US
03 / JERABEK, Elihu, Calvin
504 Feura Bush Road
Glenmont, NY 12077 / US
04 / MARZANO, Patrick, Peter
3 Maurice Lane
Clifton Park, NY 12065 / US
05 / YANG, Barry, Lee-Mean
3 Algonquin Road
Clifton Park, NY 12065 / US
 [2001/50]
Representative(s)Szary, Anne Catherine, et al
GPO Europe
GE International Inc. The Ark
201 Talgarth Road
Hammersmith
London W6 8BJ / GB
[N/P]
Former [2001/50]Szary, Anne Catherine, Dr., et al
London Patent Operation, GE International, Inc., Essex House, 12-13 Essex Street
London WC2R 3AA / GB
Application number, filing date00907176.204.02.2000
[2001/50]
WO2000US03028
Priority number, dateUS1999027165517.03.1999         Original published format: US 271655
[2001/50]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0055388
Date:21.09.2000
Language:EN
[2000/38]
Type: A1 Application with search report 
No.:EP1161574
Date:12.12.2001
Language:EN
The application published by WIPO in one of the EPO official languages on 21.09.2000 takes the place of the publication of the European patent application.
[2001/50]
Type: B1 Patent specification 
No.:EP1161574
Date:17.12.2003
Language:EN
[2003/51]
Search report(s)International search report - published on:EP21.09.2000
ClassificationIPC:C23C16/50, B05B7/22, C23C14/22, C23C14/24
[2001/50]
CPC:
C23C14/228 (EP,US); C23C14/32 (EP,US); C23C16/513 (EP,US);
H01J37/32422 (EP,US)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2001/50]
TitleGerman:VERFAHREN UND VORRICHTUNG ZUM BESCHICHTEN MITTELS BOGENENTLADUNG[2001/50]
English:METHOD AND APPARATUS FOR ARC DEPOSITION[2001/50]
French:PROCEDE ET APPAREIL DE DEPOT A L'ARC[2001/50]
Entry into regional phase17.10.2001National basic fee paid 
17.10.2001Designation fee(s) paid 
17.10.2001Examination fee paid 
Examination procedure21.08.2000Request for preliminary examination filed
International Preliminary Examining Authority: EP
17.10.2001Examination requested  [2001/50]
04.12.2001Despatch of a communication from the examining division (Time limit: M04)
04.04.2002Reply to a communication from the examining division
10.04.2003Communication of intention to grant the patent
20.10.2003Fee for grant paid
20.10.2003Fee for publishing/printing paid
Opposition(s)20.09.2004No opposition filed within time limit [2004/50]
Fees paidRenewal fee
28.02.2002Renewal fee patent year 03
28.02.2003Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT17.12.2003
BE17.12.2003
CH17.12.2003
CY17.12.2003
FI17.12.2003
IT17.12.2003
LI17.12.2003
NL17.12.2003
IE04.02.2004
LU04.02.2004
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
PT17.05.2004
[2008/03]
Former [2007/35]AT17.12.2003
BE17.12.2003
CH17.12.2003
CY17.12.2003
FI17.12.2003
IT17.12.2003
LI17.12.2003
NL17.12.2003
IE04.02.2004
LU04.02.2004
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2007/08]AT17.12.2003
BE17.12.2003
CH17.12.2003
CY17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
IE04.02.2004
LU04.02.2004
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2005/23]AT17.12.2003
BE17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
IE04.02.2004
LU04.02.2004
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2005/19]AT17.12.2003
BE17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
IE04.02.2004
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2005/02]AT17.12.2003
BE17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
MC28.02.2004
DK17.03.2004
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2004/52]AT17.12.2003
BE17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2004/46]AT17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
GR17.03.2004
SE17.03.2004
ES28.03.2004
Former [2004/33]AT17.12.2003
CH17.12.2003
FI17.12.2003
LI17.12.2003
NL17.12.2003
GR17.03.2004
SE17.03.2004
Former [2004/31]AT17.12.2003
FI17.12.2003
SE17.03.2004
Former [2004/26]FI17.12.2003
SE17.03.2004
Former [2004/24]SE17.03.2004
Cited inInternational search[A]US3625848  (SNAPER ALVIN A) [A] 1-46,48-53* figure 1 *;
 [XAY]DE3014258  (WINTER HEINRICH DR) [X] 1,3 * page 7, line 1 - line 20 * * page 10, line 7 - line 11 * [A] 7,8,23 [Y] 29-37,43,44;
 [Y]EP0293229  (INCO LTD [CA]) [Y] 48-53 * column 3, line 23 - line 45; figures 1,2 *;
 [A]EP0617142  (SHINETSU CHEMICAL CO [JP]) [A] 1-46,48-53 * figure 1; example 1 *;
 [XY]US5571332  (HALPERN BRET [US]) [X] 1,2,5,6,21,26,28 * column 5, line 11 - column 7, line 2 * * column 10, line 23 - column 11, line 2; figures 3-5 * [Y] 4,9-13,17-22,29-38,43,44,48-53;
 [XY]EP0887437  (GEN ELECTRIC [US]) [X] 27 * page 5, line 43 - line 46 * * page 6, line 14 - line 16 * [Y] 4,9-13,17-22;
 [A]EP0887110  (GEN ELECTRIC [US]) [A] 29-36,48-53 * page 3, line 28 - line 52; figures 1,2 *;
 [Y]  - RAO N ET AL, "NANOPARTICLE FORMATION USING A PLASMA EXPANSION PROCESS", PLASMA CHEMISTRY AND PLASMA PROCESSING,US,PLENUM PRESS. NEW YORK, (19951201), vol. 15, no. 4, ISSN 0272-4324, pages 581 - 606, XP000539562 [Y] 29,37,38 * page 587, line 8 - line 14; figures 1,2 *

DOI:   http://dx.doi.org/10.1007/BF01447062
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