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Extract from the Register of European Patents

EP About this file: EP1251402

EP1251402 - Lithographic apparatus and device manufacturing method [Right-click to bookmark this link]
Former [2002/43]Lithographic apparatus
[2007/19]
StatusNo opposition filed within time limit
Status updated on  29.08.2008
Database last updated on 23.04.2024
Most recent event   Tooltip29.08.2008No opposition filed within time limitpublished on 01.10.2008  [2008/40]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[2007/43]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/43]For all designated states
ASML Netherlands B.V.
De Run 1110, Building 2
5503 LA Veldhoven / NL
Inventor(s)01 / Baselmans, Johannes Jacobus Matheus
De Kruik 1
5688 GG Oirschot / NL
02 / Engelen, Adrianus Franciscus Petrus
Karel de Grotelaan 115
5615 SR Eindhoven / NL
03 / Cramer, Hugo Augustinus Joseph
Lisven 2
5646 HM Eindhoven / NL
04 / Finders, Jozef Maria
Haag 4
5509 NJ Veldhoven / NL
05 / Kohler, Carsten
Poeierhei 12
5508 VL Veldhoven / NL
 [2002/43]
Representative(s)Leeming, John Gerard
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[N/P]
Former [2002/43]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5JJ / GB
Application number, filing date02252340.128.03.2002
[2002/43]
Priority number, dateEP2001030303630.03.2001         Original published format: EP 01303036
[2002/43]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1251402
Date:23.10.2002
Language:EN
[2002/43]
Type: B1 Patent specification 
No.:EP1251402
Date:24.10.2007
Language:EN
[2007/43]
Search report(s)(Supplementary) European search report - dispatched on:EP13.08.2002
ClassificationIPC:G03F7/20
[2002/43]
CPC:
G03F7/705 (EP); G03F7/706 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2003/29]
Former [2002/43]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung[2007/19]
English:Lithographic apparatus and device manufacturing method[2007/19]
French:Appareil lithographique et méthode de fabrication d'un dispositif[2007/19]
Former [2002/43]Lithographisher Apparat
Former [2002/43]Lithographic apparatus
Former [2002/43]Appareil lithographique
Examination procedure16.04.2003Amendment by applicant (claims and/or description)
16.04.2003Examination requested  [2003/25]
01.03.2004Despatch of a communication from the examining division (Time limit: M06)
06.09.2004Reply to a communication from the examining division
18.05.2007Communication of intention to grant the patent
05.09.2007Fee for grant paid
05.09.2007Fee for publishing/printing paid
Opposition(s)25.07.2008No opposition filed within time limit [2008/40]
Fees paidRenewal fee
27.02.2004Renewal fee patent year 03
08.03.2005Renewal fee patent year 04
15.03.2006Renewal fee patent year 05
14.03.2007Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US5444538  (PELLEGRINI JOSEPH C [US]) [A] 1,16* the whole document *;
 [X]WO0031592  (KONINKL PHILIPS ELECTRONICS NV [NL]) [X] 1,16 * page 10, line 24 - line 28 * * page 20, line 23 - page 26, line 7 *;
 [DX]US6115108  (CAPODIECI LUIGI [US]) [DX] 1-7,9,10,16-25 * column 3, line 9 - line 38 * * column 6, line 57 - column 7, line 53 * * column 8, line 14 - column 10, line 22 * * column 12, line 24 - column 14, line 3 * * figure 15 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.