blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News flashes

New version of the European Patent Register - SPC information for Unitary Patents.

2024-03-06

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1457583

EP1457583 - Mechanical enhancement of dense and porous organosilicate materials by UV exposure [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  06.04.2018
Database last updated on 23.04.2024
FormerThe patent has been granted
Status updated on  28.04.2017
FormerGrant of patent is intended
Status updated on  12.12.2016
Most recent event   Tooltip26.06.2020Lapse of the patent in a contracting state
New state(s): CY
published on 29.07.2020  [2020/31]
Applicant(s)For all designated states
Versum Materials US, LLC
8555 River Parkway
Tempe, AZ 85284 / US
[2017/38]
Former [2004/38]For all designated states
AIR PRODUCTS AND CHEMICALS, INC.
7201 Hamilton Boulevard
Allentown, PA 18195-1501 / US
Inventor(s)01 / Lukas, Aaron Scott
107 Finch Run
Lansdale PA 19446 / US
02 / O'Neill, Mark Leonard
830 N. 30th Street
Allentown PA 18104 / US
03 / Vincent, Jean Louise
3943 Suncrest Lane
Bethlehem PA 18020 / US
04 / Vrtis, Raymond Nicholas
1510 Randi Lane
Orefield PA 18069 / US
05 / Bitner, Mark Daniel
17 East High Street
Nazareth PA 18064 / US
06 / Karwacki, Eugene Joseph, Jr.
5620 Snowdrift Lane
Orefield PA 18069 / US
 [2004/38]
Representative(s)Kador & Partner Part mbB
Corneliusstraße 15
80469 München / DE
[N/P]
Former [2017/22]Kador & Partner
Corneliusstraße 15
80469 München / DE
Former [2004/38]Kador & Partner
Corneliusstrasse 15
80469 München / DE
Application number, filing date04004877.902.03.2004
[2004/38]
Priority number, dateUS2003062435721.07.2003         Original published format: US 624357
US2003037946604.03.2003         Original published format: US 379466
[2004/38]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1457583
Date:15.09.2004
Language:EN
[2004/38]
Type: A3 Search report 
No.:EP1457583
Date:17.02.2010
[2010/07]
Type: B1 Patent specification 
No.:EP1457583
Date:31.05.2017
Language:EN
[2017/22]
Type: B8 Corrected title page of specification 
No.:EP1457583
Date:11.10.2017
[2017/41]
Search report(s)(Supplementary) European search report - dispatched on:EP19.01.2010
ClassificationIPC:H01L21/316, C23C16/40, C23C16/56, H01L21/3105
[2016/51]
CPC:
H01L21/02126 (EP); E21B4/14 (KR); C23C16/401 (EP);
C23C16/56 (EP); H01L21/02203 (EP); H01L21/02211 (EP);
H01L21/02216 (EP); H01L21/02274 (EP); H01L21/02348 (EP);
H01L21/3105 (EP); E21B33/138 (KR) (-)
Former IPC [2004/38]C23C16/56, C23C16/40, H01L21/31
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2017/22]
Former [2010/42]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Former [2004/38]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Mechanische Verstärkung von dichten und porösen Organosilikatmaterialien durch UV-Bestrahlung[2004/38]
English:Mechanical enhancement of dense and porous organosilicate materials by UV exposure[2004/38]
French:Amelioration de la stabilite mechanique de materiaux organosilicate denses ou poreux par rayonnement UV[2004/38]
Examination procedure11.05.2010Examination requested  [2010/25]
30.08.2010Despatch of a communication from the examining division (Time limit: M04)
30.08.2010Invitation to provide information on prior art
03.09.2010Reply to a communication from the examining division
03.09.2010Reply to the invitation to provide information on prior art
16.08.2011Despatch of a communication from the examining division (Time limit: M04)
23.12.2011Reply to a communication from the examining division
09.11.2016Date of oral proceedings
24.11.2016Minutes of oral proceedings despatched
13.12.2016Communication of intention to grant the patent
11.04.2017Fee for grant paid
11.04.2017Fee for publishing/printing paid
11.04.2017Receipt of the translation of the claim(s)
Divisional application(s)EP17167460.9  / EP3231892
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  30.08.2010
Opposition(s)01.03.2018No opposition filed within time limit [2018/19]
Fees paidRenewal fee
06.03.2006Renewal fee patent year 03
05.03.2007Renewal fee patent year 04
10.03.2008Renewal fee patent year 05
06.03.2009Renewal fee patent year 06
08.03.2010Renewal fee patent year 07
10.03.2011Renewal fee patent year 08
07.03.2012Renewal fee patent year 09
07.03.2013Renewal fee patent year 10
07.03.2014Renewal fee patent year 11
06.03.2015Renewal fee patent year 12
07.03.2016Renewal fee patent year 13
07.03.2017Renewal fee patent year 14
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU02.03.2004
AT31.05.2017
CY31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
MC31.05.2017
PL31.05.2017
PT31.05.2017
RO31.05.2017
SE31.05.2017
SI31.05.2017
SK31.05.2017
TR31.05.2017
BG31.08.2017
GR01.09.2017
[2020/31]
Former [2020/28]HU02.03.2004
AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
MC31.05.2017
PL31.05.2017
PT31.05.2017
RO31.05.2017
SE31.05.2017
SI31.05.2017
SK31.05.2017
TR31.05.2017
BG31.08.2017
GR01.09.2017
Former [2020/15]AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
MC31.05.2017
PL31.05.2017
RO31.05.2017
SE31.05.2017
SI31.05.2017
SK31.05.2017
TR31.05.2017
BG31.08.2017
GR01.09.2017
Former [2018/52]AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
MC31.05.2017
PL31.05.2017
RO31.05.2017
SE31.05.2017
SI31.05.2017
SK31.05.2017
BG31.08.2017
GR01.09.2017
Former [2018/25]AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
PL31.05.2017
RO31.05.2017
SE31.05.2017
SI31.05.2017
SK31.05.2017
BG31.08.2017
GR01.09.2017
Former [2018/11]AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
PL31.05.2017
RO31.05.2017
SE31.05.2017
SK31.05.2017
BG31.08.2017
GR01.09.2017
Former [2018/10]AT31.05.2017
CZ31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
RO31.05.2017
SE31.05.2017
SK31.05.2017
BG31.08.2017
GR01.09.2017
Former [2018/09]AT31.05.2017
DK31.05.2017
EE31.05.2017
ES31.05.2017
FI31.05.2017
SE31.05.2017
BG31.08.2017
GR01.09.2017
Former [2017/50]AT31.05.2017
ES31.05.2017
FI31.05.2017
SE31.05.2017
BG31.08.2017
GR01.09.2017
Former [2017/49]AT31.05.2017
ES31.05.2017
FI31.05.2017
GR01.09.2017
Documents cited:Search[X]EP0537364  (SEMICONDUCTOR PROCESS LAB CO [JP], et al) [X] 1-14,17,18 * column 12, line 20 - column 13, line 40 *;
 [X]EP0575650  (SEMICONDUCTOR PROCESS LAB CO [JP], et al) [X] 1-14,17,18 * column 2, line 39 - column 3, line 11 * * column 4, line 22 - column 7, line 31 * * column 17, line 35 - column 19, line 40 *;
 [X]EP1122333  (MOTOROLA INC [US]) [X] 1-14,17,18 * paragraphs [0001] , [0002] , [0005] - [0009] - [0012] *;
 [X]US2002065331  (ZAMPINI ANTHONY [US], et al) [X] 30-37 * paragraphs [0016] - [0018] - [0076] - [0078] - [0081] , [0082] *;
 [XA]EP1225194  (AIR PROD & CHEM [US]) [X] 15,16,19-21,24,25 * paragraphs [0030] - [0041] - [0049] - [0080]; tables 1-3 * [A] 1-14,17,18,22,23,26-37;
 [XA]US2002119676  (AOI NOBUO [JP]) [X] 15,16,19-21,26-29 * paragraphs [0001] , [0012] , [0013] , [0018] , [0020] , [0022] - [0025] - [0047] , [0048] , [0051] - [0060] - [0075] , [0076] * [A] 1-14,17,18,22-25,32-37;
 [PXD]US2003054115  (ALBANO RALPH [US], et al) [PXD] 1-14,17,18 * abstract * * paragraphs [0014] - [0016] - [0021] - [0028] - [0063] - [0087] *;
 [PXL]EP1354980  (AIR PROD & CHEM [US]) [PXL] 15,16,19,21-25 * L: Priority; paragraphs [0006] - [0008] - [0015] - [0039] - [0046] - [0064] - [0066] , [0076] , [0077] , [0083] - [0088] - [0091] - [0098] *;
 [PXL]US2003198742  (VRTIS RAYMOND NICHOLAS [US], et al) [PXL] 30,31 * L: Priority; paragraphs [0129] - [0133] - [0137] - [0145] *;
 [E]EP1420439  (AIR PROD & CHEM [US]) [E] 15,16,19,21-23,26 * paragraphs [0001] , [0011] - [0015] - [0024] , [0025] , [0030] , [0031] , [0054] , [0059] , [0075] , [0100]; examples 1-6; claims 26-29 *;
 [E]US2004096672  (LUKAS AARON SCOTT [US], et al) [E] 15,16,19,21-23,26* paragraphs [0001] , [0011] - [0015] - [0024] , [0025] , [0030] , [0031] , [0054] , [0059] , [0075] , [0100]; examples 1-6 *;
 [E]EP1464726  (AIR PROD & CHEM [US]) [E] 1-14,17,18 * paragraphs [0010] - [0013] - [0090] - [0095] *;
 [A]  - "A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, (19960902), vol. 69, no. 10, ISSN 0003-6951, pages 1399 - 1401, XP012016011 [A] 1-14,17,18 * the whole document *

DOI:   http://dx.doi.org/10.1063/1.117594
 [XA]  - GRILL A ET AL, "Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, (20010806), vol. 79, no. 6, ISSN 0003-6951, pages 803 - 805, XP012029992 [X] 15,16,19,30,31 * the whole document * [A] 1-14,17,18,20-37

DOI:   http://dx.doi.org/10.1063/1.1392976
 [A]  - WU Z-C ET AL, "PHYSICAL AND ELECTRICAL CHARACTERISTICS OF METHYLSILANE- AND TRIMETHYLSILANE-DOPED LOW DIELECTRIC CONSTANT CHEMICAL VAPOR DEPOSITED OXIDES", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOCIETY. MANCHESTER, NEW HAMPSHIRE, US, (20010601), vol. 148, no. 6, ISSN 0013-4651, pages F127 - F132, XP001058314 [A] 15,16,19-29 * the whole document *

DOI:   http://dx.doi.org/10.1149/1.1369373
ExaminationWO0223629
 WO03015129
    - ETEMADI R ET AL, "Optical and compositional study of silicon oxide thin films deposited in a dual-mode (microwave/radiofrequency) plasma-enhanced chemical vapor deposition reactor", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS, US, (19980515), vol. 83, no. 10, doi:10.1063/1.367343, ISSN 0021-8979, pages 5224 - 5232, XP012043825

DOI:   http://dx.doi.org/10.1063/1.367343
    - HOZUMI A ET AL, "PHOTOCALCINATION OF MESOPOROUS SILICA FILMS USING VACUUM ULTRAVIOLET LIGHT", ADVANCED MATERIALS, WILEY - V C H VERLAG GMBH & CO. KGAA, DE, (20000705), vol. 12, no. 13, doi:10.1002/1521-4095(200006)12:13<985::AID-ADMA985>3.0.CO;2-#, ISSN 0935-9648, pages 985 - 987, XP000937090

DOI:   http://dx.doi.org/10.1002/1521-4095(200006)12:13<985::AID-ADMA985>3.0.CO;2-#
    - C. Waldfried ET AL, "Single wafer RapidCuring/spl trade/ of porous low-k materials", Proceedings of the IEEE 2002 International Interconnect Technology Conference, 2002, (20020101), doi:10.1109/IITC.2002.1014941, ISBN 978-0-7803-7216-0, pages 226 - 228, XP055246289

DOI:   http://dx.doi.org/10.1109/IITC.2002.1014941
by applicantJPS59124729
 US4603168
 WO9700535
 US5609925
 US5935646
 US5970384
 US6017806
 US6042994
 US6168980
 WO0129052
 US6231989
 EP1122333
 WO0161737
 US6284050
 JP2001257207
 US2001038919
 US2001055891
 WO0222710
 US6426236
 US2002102413
 US2002106500
 WO02065534
 US2002132496
 US2002142585
 US6472076
 US6475930
 US6495479
 US2003003288
 US2003032300
 US2003054115
 WO03025993
 WO03025994
 US2003087042
 US2003151031
 US2003162034
 US2003198742
 US2003224622
 US2003232137
 US2004096593
 US2004096672
 WO2004083495
 EP1482550
 US2005048795
 WO2005019303
 US7041748
    - E. G. PARADA ET AL., "Improvement of Silicon Oxide Film Properties by Ultraviolet Excimer Lamp Annealing", APPLIED SURFACE SCIENCE, (1995), vol. 86, doi:doi:10.1016/0169-4332(94)00433-1, pages 294 - 298, XP005278386

DOI:   http://dx.doi.org/10.1016/0169-4332(94)00433-1
    - A. GUO ET AL., "Highly Active Visible-Light Photocatalysts for Curing a Ceramic Precursor1", CHEM MATER., (1998), vol. 10, pages 531 - 536
    - T. CLARK. JR. ET AL., "A New Application of UV-Ozone Treatment in the Preparation of Substrate-Supported, Mesoporous Thin Films", CHEM. MATER., (2000), vol. 12, doi:doi:10.1021/cm000456f, pages 3879 - 3884, XP055077221

DOI:   http://dx.doi.org/10.1021/cm000456f
    - M. BRINKMANN ET AL., "Room-Temperature Synthesis of a-Si02 Thin Films by UV-Assisted Ozonolysis of a Polymer Precursor", CHEM. MATER., (2001), vol. 13, pages 967 - 972
    - A. HOZUMI ET AL., "Low-Temperature Elimination of Organic Components from Mesostructured Organic-Inorganic Composite Films Using Vacuum Ultraviolet Light", CHEM. MATER., (2000), vol. 12, doi:doi:10.1021/cm000546k, pages 3842 - 3847, XP008060695

DOI:   http://dx.doi.org/10.1021/cm000546k
    - M. OUYANG ET AL., "Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes", CHEM. MATER., (2000), vol. 12, doi:doi:10.1021/cm990770d, pages 1591 - 1596, XP002267213

DOI:   http://dx.doi.org/10.1021/cm990770d
    - Q. HAN ET AL., "Ultra Low-k Porous Silicon Dioxide Films from a Plasma Process", IEEE, (2001), pages 171 - 173
    - C. WALDFRIED ET AL., "Single Wafer RapidCuring of Porous Low-k Materials", IEEE, (2002), pages 226 - 228
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.