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EP1491502
European procedure
Extract from the Register of European Patents
EP About this file: EP1491502
| EP1491502 - A method for producing nanoparticles through size-selective photoetching [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 27.01.2012 Database last updated on 22.01.2025 | Most recent event Tooltip | 27.01.2012 | No opposition filed within time limit | published on 29.02.2012 [2012/09] | Applicant(s) | For all designated states Hitachi Solutions, Ltd. 4-12-7, Higashishinagawa Shinagawa-ku Tokyo 140-0002 / JP | [2011/08] |
| Former [2005/01] | For all designated states Hitachi Software Engineering Co., Ltd. 1-43, Suehiro-cho 1-chome, Tsurumi-ku Yokohama-shi, Kanagawa 230-0045 / JP | Inventor(s) | 01 /
Sato, Keiichi c/o Hitachi Software Engineering Co., Ltd. 4-12-7, Higashihinagawa, Shinagawa-ku Tokyo 140-0002 / JP | 02 /
Kuwabata, Susumu c/o Department.of Materials Chemistry Graduate School of Engineering, Osaka University, 2-1 Yamada-oka Suita-shi, Osaka 565-0871 / JP | 03 /
Torimoto, Tsukasa 1-3-109, N9W16, Chuo-ku Sapporo-shi, Hokkaido 060-0009 / JP | [2010/42] |
| Former [2005/01] | 01 /
Sato, Keiichi Hitachi Software Engineer.Co.Ltd. 4-12-7, Higashihinagawa Shinagawa-ku Tokyo 140-0002 / JP | ||
| 02 /
Kuwabata, Susumu Dpt of Mat.Chemi.Grad. School Engineering,Osaka Uni. 2-1 Yamada-oka Suita-shi Osaka 565-0871 / JP | |||
| 03 /
Torimoto, Tsukasa 1-3-109, N9W16 Chuo-ku Sapporo-shi Hokkaido 060-0009 / JP | Representative(s) | Liesegang, Roland Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [N/P] |
| Former [2005/01] | Liesegang, Roland, Dr.-Ing. FORRESTER & BOEHMERT Pettenkoferstrasse 20-22 80336 München / DE | Application number, filing date | 04012329.1 | 25.05.2004 | [2005/01] | Priority number, date | JP20030154977 | 30.05.2003 Original published format: JP 2003154977 | [2005/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1491502 | Date: | 29.12.2004 | Language: | EN | [2004/53] | Type: | A3 Search report | No.: | EP1491502 | Date: | 25.10.2006 | [2006/43] | Type: | B1 Patent specification | No.: | EP1491502 | Date: | 23.03.2011 | Language: | EN | [2011/12] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 22.09.2006 | Classification | IPC: | C01G11/02, C01G1/12, C01G1/02, C01G1/00, C09K11/56 | [2006/42] | CPC: |
B82Y30/00 (EP,US);
C01G1/00 (EP,US);
C01G1/02 (EP,US);
C01G1/12 (EP,US);
C01G11/02 (EP,US);
C09K11/02 (EP,US);
C09K11/565 (EP,US);
C01P2002/84 (EP,US);
C01P2004/64 (EP,US);
|
| Former IPC [2005/01] | C01G11/02, C01G1/12, C01G1/02, C01G1/00 | Designated contracting states | DE, FR, GB [2007/27] |
| Former [2005/01] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LI, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Verfahren zur Herstellung von Nanopartikeln durch grössenspezifische Photoätzung | [2005/01] | English: | A method for producing nanoparticles through size-selective photoetching | [2005/01] | French: | Procédé de préparation de particules nanométriques par gravure photo | [2005/01] | Examination procedure | 25.05.2004 | Examination requested [2004/53] | 14.05.2007 | Despatch of a communication from the examining division (Time limit: M04) | 24.09.2007 | Reply to a communication from the examining division | 09.03.2010 | Despatch of a communication from the examining division (Time limit: M04) | 28.06.2010 | Reply to a communication from the examining division | 06.10.2010 | Communication of intention to grant the patent | 26.01.2011 | Fee for grant paid | 26.01.2011 | Fee for publishing/printing paid | Opposition(s) | 27.12.2011 | No opposition filed within time limit [2012/09] | Fees paid | Renewal fee | 10.05.2006 | Renewal fee patent year 03 | 14.05.2007 | Renewal fee patent year 04 | 28.03.2008 | Renewal fee patent year 05 | 12.05.2009 | Renewal fee patent year 06 | 31.03.2010 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [DX] - T. TORIMOTO, H. NISHIYAMA, T. SAKATA, H. MORI, H. YONEYAMA, "Characteristic Features of Size-Selective Photoetching of CdS Nanoparticles as a Means of Preparation of Monodisperse Particles", J. ELECTROCHEM. SOC., (1998), vol. 145, no. 6, pages 1964 - 1968, XP002398568 [DX] 1,6 * paragraphs [EXPERIMENTAL] , [EFFECT] , [00OF] , [00PH]; figures 4,6 * DOI: http://dx.doi.org/10.1149/1.1838583 | [X] - L. SPANHEL, M. HAASE, H. WELLER, A. HENGLEIN, "Photochemistry of Colloidal Semiconductors. 20. Surface Modification and Stability of Strong Luminescing CdS Particles.", J. AM. CHEM. SOC., (1987), vol. 109, pages 5649 - 5655, XP002398569 [X] 1-7 * paragraph [EXPERIMENTAL]; figures 2,3 * DOI: http://dx.doi.org/10.1021/ja00253a015 | by applicant | - SPANHEL ET AL., J. AM. CHEM. SOC., (1987), vol. 109, pages 5649 - 5655 |