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Extract from the Register of European Patents

EP About this file: EP2024992

EP2024992 - METHOD FOR SMOOTHING III-N SUBSTRATES [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.01.2018
Database last updated on 28.03.2024
FormerThe patent has been granted
Status updated on  27.01.2017
FormerGrant of patent is intended
Status updated on  02.11.2016
Most recent event   Tooltip05.01.2018No opposition filed within time limitpublished on 07.02.2018  [2018/06]
Applicant(s)For all designated states
Freiberger Compound Materials GmbH
Am Junger Löwe Schacht 5
09599 Freiberg / DE
[2009/08]
Inventor(s)01 / HÖLZIG, Stefan
Friedmar-Brendel-Weg 19
09599 Freiberg / DE
02 / LEIBIGER, Gunnar
Dr.-Külz-Str. 7
09599 Freiberg / DE
 [2009/08]
Representative(s)Prüfer & Partner mbB Patentanwälte · Rechtsanwälte
Sohnckestraße 12
81479 München / DE
[2017/09]
Former [2009/08]Prüfer & Partner GbR European Patent Attorneys
Sohnckestraße 12
81479 München / DE
Application number, filing date06762845.326.07.2006
[2009/08]
WO2006EP07413
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2008011897
Date:31.01.2008
Language:DE
[2008/05]
Type: A1 Application with search report 
No.:EP2024992
Date:18.02.2009
Language:DE
The application published by WIPO in one of the EPO official languages on 31.01.2008 takes the place of the publication of the European patent application.
[2009/08]
Type: B1 Patent specification 
No.:EP2024992
Date:01.03.2017
Language:DE
[2017/09]
Search report(s)International search report - published on:EP31.01.2008
ClassificationIPC:H01L21/304, H01L21/306, C09G1/02, C09K3/14
[2016/47]
CPC:
C09G1/02 (EP); C30B33/00 (KR); C09K3/1409 (EP);
C30B29/38 (KR); H01L21/02024 (EP); H01L21/304 (KR);
H01L21/30625 (EP) (-)
Former IPC [2009/08]H01L21/304, H01L21/306, C30B33/00
Designated contracting statesDE,   FR,   GB,   PL [2017/09]
Former [2009/35]DE,  FR,  GB,  PL 
Former [2009/08]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:VERFAHREN ZUM GLÄTTEN VON III-N-SUBSTRATEN[2009/08]
English:METHOD FOR SMOOTHING III-N SUBSTRATES[2009/08]
French:PROCEDE DE LISSAGE DE SUBSTRATS III-N[2016/47]
Former [2009/08]PROCEDE DE LISSAGE DE III-N-SUBSTRATS
Entry into regional phase09.12.2008National basic fee paid 
09.12.2008Designation fee(s) paid 
09.12.2008Examination fee paid 
Examination procedure09.12.2008Amendment by applicant (claims and/or description)
09.12.2008Examination requested  [2009/08]
27.02.2009Loss of particular rights, legal effect: designated state(s)
07.04.2009Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PT, RO, SE, SI, SK, TR
05.04.2011Despatch of a communication from the examining division (Time limit: M04)
03.08.2011Reply to a communication from the examining division
20.10.2016Cancellation of oral proceeding that was planned for 16.11.2016
03.11.2016Communication of intention to grant the patent
16.11.2016Date of oral proceedings (cancelled)
12.01.2017Fee for grant paid
12.01.2017Fee for publishing/printing paid
12.01.2017Receipt of the translation of the claim(s)
Divisional application(s)EP16201978.0  / EP3157045
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  05.04.2011
Opposition(s)04.12.2017No opposition filed within time limit [2018/06]
Fees paidRenewal fee
09.12.2008Renewal fee patent year 03
31.07.2009Renewal fee patent year 04
29.07.2010Renewal fee patent year 05
28.07.2011Renewal fee patent year 06
31.07.2012Renewal fee patent year 07
31.07.2013Renewal fee patent year 08
30.07.2014Renewal fee patent year 09
30.07.2015Renewal fee patent year 10
29.07.2016Renewal fee patent year 11
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Cited inInternational search[X]WO2006075527  (SUMITOMO ELECTRIC INDUSTRIES [JP], et al) [X] 1,3-9,12-19 * paragraphs [0025] , [0031] , [0036] , [0038] , [0046] , [0058] , [0062] *;
 [E]US2006283840  (MATSUMOTO NAOKI [JP]) [E] 1,3,13,19 * the whole document *;
 [X]JP2006060074  (SUMITOMO ELECTRIC INDUSTRIES) [X] 1-9,12-19 * paragraphs [0008] - [0014] - [0018] - [0048]; claims 1,4; table 4 *;
 [DXA]US2002185054  (XU XUEPING [US], et al) [DX] 13,15,17-19 * paragraphs [0009] - [0012] - [0018] , [0019] , [0066] - [0074] * [A] 1,10,11;
 [X]EP1431426  (NGK INSULATORS LTD [JP]) [X] 14,16-19 * paragraphs [0019] - [0036] *
 [DX]  - WEYHER J L ET AL, "Chemical polishing of bulk and epitaxial GaN", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, (199712), vol. 182, no. 1-2, ISSN 0022-0248, pages 17 - 22, XP004100368 [DX] 13-19 * the whole document *

DOI:   http://dx.doi.org/10.1016/S0022-0248(97)00320-5
Examination   - MISKYS C R ET AL, "MOCVD-EPITAXY ON FREE-STANDING HVPE-GAN SUBSTRATES", PHYSICA STATUS SOLIDI (A). APPLIED RESEARCH, BERLIN, DE, (19990704), vol. 176, no. 1, doi:10.1002/(SICI)1521-396X(199911)176:1<443::AID-PSSA443>3.0.CO;2-Q, ISSN 0031-8965, pages 443 - 446, XP009049524

DOI:   http://dx.doi.org/10.1002/(SICI)1521-396X(199911)176:1<443::AID-PSSA443>3.0.CO;2-Q
by applicantJP2003100373
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.