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Extract from the Register of European Patents

EP About this file: EP2889605

EP2889605 - SURFACE-ENHANCED RAMAN SCATTERING ELEMENT [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  16.12.2022
Database last updated on 21.03.2025
FormerThe patent has been granted
Status updated on  07.01.2022
FormerGrant of patent is intended
Status updated on  18.11.2021
FormerExamination is in progress
Status updated on  25.10.2021
FormerGrant of patent is intended
Status updated on  26.07.2021
FormerExamination is in progress
Status updated on  18.11.2019
Most recent event   Tooltip06.09.2024Lapse of the patent in a contracting state
New state(s): MT		published on 09.10.2024  [2024/41]
Applicant(s)For all designated states
Hamamatsu Photonics K.K.
1126-1, Ichino-cho
Higashi-ku
Hamamatsu-shi, Shizuoka 435-8558 / JP
[2015/27]
Inventor(s)01 / SHIBAYAMA, Katsumi
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi, Shizuoka 435-8558 / JP
02 / MARUYAMA, Yoshihiro
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi, Shizuoka 435-8558 / JP
03 / ITO, Masashi
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi, Shizuoka 435-8558 / JP
 [2015/46]
Former [2015/27]01 / SHIBAYAMA Katsumi
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi Shizuoka 435-8558 / JP
02 / MARUYAMA Yoshihiro
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi Shizuoka 435-8558 / JP
03 / ITO Masashi
c/o Hamamatsu Photonics K.K.
1126-1 Ichino-cho
Higashi-ku
Hamamatsu-shi Shizuoka 435-8558 / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2015/27]
Application number, filing date13827159.809.08.2013
[2022/06]
WO2013JP71696
Priority number, dateJP2012017877310.08.2012         Original published format: JP 2012178773
[2015/27]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2014025027
Date:13.02.2014
Language:JA
[2014/07]
Type: A1 Application with search report 
No.:EP2889605
Date:01.07.2015
Language:EN
[2015/27]
Type: B1 Patent specification 
No.:EP2889605
Date:09.02.2022
Language:EN
[2022/06]
Search report(s)International search report - published on:JP13.02.2014
(Supplementary) European search report - dispatched on:EP20.07.2016
ClassificationIPC:G01N21/65, B82Y15/00, B82Y40/00
[2015/27]
CPC:
G01N21/658 (EP,US); B82Y40/00 (EP,US); G01N2021/651 (US)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/27]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:OBERFLÄCHENVERSTÄRKTES RAMANSTREUUNGSELEMENT[2015/27]
English:SURFACE-ENHANCED RAMAN SCATTERING ELEMENT[2015/27]
French:ELÉMENT À DIFFUSION RAMAN EXALTÉE PAR EFFET DE SURFACE[2015/27]
Entry into regional phase06.03.2015Translation filed 
06.03.2015National basic fee paid 
06.03.2015Search fee paid 
06.03.2015Designation fee(s) paid 
06.03.2015Examination fee paid 
Examination procedure06.03.2015Examination requested  [2015/27]
14.02.2017Amendment by applicant (claims and/or description)
21.11.2019Despatch of a communication from the examining division (Time limit: M06)
26.05.2020Reply to a communication from the examining division
27.07.2021Communication of intention to grant the patent
25.10.2021Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
19.11.2021Communication of intention to grant the patent
30.12.2021Fee for grant paid
30.12.2021Fee for publishing/printing paid
30.12.2021Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  21.11.2019
Opposition(s)10.11.2022No opposition filed within time limit [2023/03]
Fees paidRenewal fee
24.08.2015Renewal fee patent year 03
25.08.2016Renewal fee patent year 04
14.08.2017Renewal fee patent year 05
10.08.2018Renewal fee patent year 06
15.08.2019Renewal fee patent year 07
13.08.2020Renewal fee patent year 08
13.08.2021Renewal fee patent year 09
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU09.08.2013
AL09.02.2022
AT09.02.2022
CY09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
MK09.02.2022
MT09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
TR09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
[2024/41]
Former [2024/29]HU09.08.2013
AL09.02.2022
AT09.02.2022
CY09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
MK09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
TR09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
Former [2024/27]HU09.08.2013
AL09.02.2022
AT09.02.2022
CY09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
MK09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
Former [2024/20]HU09.08.2013
AL09.02.2022
AT09.02.2022
CY09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
Former [2024/18]HU09.08.2013
AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
Former [2023/42]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
BE31.08.2022
CH31.08.2022
LI31.08.2022
Former [2023/35]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
IT09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
CH31.08.2022
LI31.08.2022
Former [2023/33]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
IE09.08.2022
LU09.08.2022
CH31.08.2022
LI31.08.2022
Former [2023/21]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
LU09.08.2022
CH31.08.2022
LI31.08.2022
Former [2023/16]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
MC09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2023/10]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SI09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2023/01]AL09.02.2022
AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/49]AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SK09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/48]AT09.02.2022
CZ09.02.2022
DK09.02.2022
EE09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/47]AT09.02.2022
DK09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RO09.02.2022
RS09.02.2022
SE09.02.2022
SM09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/46]AT09.02.2022
DK09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RS09.02.2022
SE09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/42]AT09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RS09.02.2022
SE09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
IS09.06.2022
PT09.06.2022
Former [2022/39]AT09.02.2022
ES09.02.2022
FI09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RS09.02.2022
SE09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
PT09.06.2022
Former [2022/36]AT09.02.2022
ES09.02.2022
HR09.02.2022
LT09.02.2022
LV09.02.2022
NL09.02.2022
PL09.02.2022
RS09.02.2022
SE09.02.2022
BG09.05.2022
NO09.05.2022
GR10.05.2022
PT09.06.2022
Former [2022/35]ES09.02.2022
HR09.02.2022
LT09.02.2022
NL09.02.2022
RS09.02.2022
SE09.02.2022
BG09.05.2022
NO09.05.2022
PT09.06.2022
Former [2022/34]ES09.02.2022
LT09.02.2022
NL09.02.2022
NO09.05.2022
PT09.06.2022
Former [2022/33]LT09.02.2022
NO09.05.2022
Documents cited:Search[I]GB2419940  (MESOPHOTONICS LTD [GB]) [I] 1,2 * figures 15A-C * * page 9, line 13 - line 16 * * page 18, line 29 - page 19, line 11 *;
 [XI]US2008297802  (OGAWA MIKI [JP], et al) [X] 1-3,5 * paragraphs [0035] , [0045] , [0046] , [0047] , [0049] , [0051] , [0052] * * figures 2B,2C, 3A,4A,4B * [I] 4;
 [XI]WO2011121857  (KANEKA CORP [JP], et al) [X] 6,7 * abstract * [I] 9,10;
 [P]EP2554973  (KANEKA CORP [JP], et al) [P] * page 4, line 36 - line 38 * * page 13, line 19 - line 24 * * page 14, line 49 - line 50 * * figures 3,7 *;
 [X]  - WEI FEN JIANG ET AL, "Improved surface-enhanced Raman scattering of patterned gold nanoparticles deposited on silicon nanoporous pillar arrays", APPLIED SURFACE SCIENCE, ELSEVIER, AMSTERDAM, NL, vol. 257, no. 18, doi:10.1016/J.APSUSC.2011.04.112, ISSN 0169-4332, (20110425), pages 8089 - 8092, (20110430), XP028373693 [X] 6-8 * abstract * * page 8089 * * page 8090, column l, paragraph l * * page 8091, column r * * figure 1 *

DOI:   http://dx.doi.org/10.1016/j.apsusc.2011.04.112
 [XP]  - SU YEON LEE ET AL, "Freestanding and Arrayed Nanoporous Microcylinders for Highly Active 3D SERS Substrate", CHEMISTRY OF MATERIALS, US, (20130625), vol. 25, no. 12, doi:10.1021/cm400298e, ISSN 0897-4756, pages 2421 - 2426, XP055286875 [XP] 6-8 * page 2421 - page 2422, column l * * figure 1 *

DOI:   http://dx.doi.org/10.1021/cm400298e
International search[Y]JP2008519254  (D3 TECHNOLOGIES LTD.);
 [Y]JP2008196992  (NAT INST INF & COMM TECH);
 [Y]WO2011021085  (INDIAN INST TECHNOLOGY MADRAS [IN], et al);
 [X]US2011166045  (DHAWAN ANUJ [US], et al)
by applicantJP2009222507
 JP2011033518
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.