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Extract from the Register of European Patents

EP About this file: EP2800132

EP2800132 - A system and method for monitoring wafer handling and a wafer handling machine [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  04.05.2018
Database last updated on 23.04.2024
FormerThe patent has been granted
Status updated on  26.05.2017
FormerGrant of patent is intended
Status updated on  09.01.2017
FormerExamination is in progress
Status updated on  19.12.2016
Most recent event   Tooltip17.07.2020Lapse of the patent in a contracting state
New state(s): AL
published on 19.08.2020  [2020/34]
Applicant(s)For all designated states
Globalfoundries Inc.
Maples Corporate Services Limited
P.O. Box 309
Ugland House
KY1-1104 Grand Cayman / KY
[2017/26]
Former [2014/45]For all designated states
GlobalFoundries, Inc.
Maple Corporate Services Limited P.O. Box 309 Ugland House
Grand Cayman KY1-1104 / KY
Inventor(s)01 / Miner, Stephen Bradley
585 Selfridge Road
Gansevoort, NY 12831 / US
02 / Fosnight, William John
26 Winding Brook Drive
Saratoga Springs, NY 12866 / US
03 / Gallagher, Ryan
64 Hathorn Blvd
Saratoga Springs, NY 12866 / US
 [2015/15]
Former [2014/45]01 / Miner, Stephen Bradley
585 Selfridge Road
Gansevoort, NY New York 12831 / US
02 / Fosnight, William John
26 Winding Brook Drive
Saratoga Springs, NY New York 12866 / US
03 / Gallagher, Ryan
64 Hathorn Blvd
Saratoga Springs, NY New York 12866 / US
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstraße 4
80802 München / DE
[2017/26]
Former [2014/45]Grünecker, Kinkeldey, Stockmair & Schwanhäusser
Leopoldstrasse 4
80802 München / DE
Application number, filing date14166341.929.04.2014
[2014/45]
Priority number, dateUS20131387273429.04.2013         Original published format: US201313872734
[2014/45]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2800132
Date:05.11.2014
Language:EN
[2014/45]
Type: B1 Patent specification 
No.:EP2800132
Date:28.06.2017
Language:EN
[2017/26]
Search report(s)(Supplementary) European search report - dispatched on:EP16.09.2014
ClassificationIPC:H01L21/67, H01L21/68, B25J19/02
[2014/45]
CPC:
H01L21/67259 (EP,CN,US); H01L21/67 (KR); H01L21/67265 (US);
G05B19/4184 (US); G05B19/41875 (US); H01L21/67389 (US);
H01L21/67763 (KR); H01L21/68 (EP,CN,KR,US); H01L21/68707 (US);
G05B2219/37224 (US); G05B2219/45031 (US); Y02P90/02 (EP,US);
Y10S901/02 (EP,US); Y10S901/27 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/23]
Former [2014/45]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:System und Verfahren zur Überwachung von Wafer-Handhabung und Wafer-Handhabungsmaschine[2014/45]
English:A system and method for monitoring wafer handling and a wafer handling machine[2014/45]
French:Système et procédé de surveillance de manipulation de plaquette et machine de manipulation de plaquette[2014/45]
Examination procedure20.04.2015Amendment by applicant (claims and/or description)
20.04.2015Examination requested  [2015/23]
18.05.2015Despatch of a communication from the examining division (Time limit: M04)
28.09.2015Reply to a communication from the examining division
15.10.2015Despatch of a communication from the examining division (Time limit: M04)
23.02.2016Reply to a communication from the examining division
08.04.2016Despatch of a communication from the examining division (Time limit: M04)
02.08.2016Reply to a communication from the examining division
16.09.2016Communication of intention to grant the patent
14.12.2016Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
10.01.2017Communication of intention to grant the patent
12.05.2017Fee for grant paid
12.05.2017Fee for publishing/printing paid
12.05.2017Receipt of the translation of the claim(s)
Divisional application(s)EP17155850.5  / EP3185282
Opposition(s)29.03.2018No opposition filed within time limit [2018/23]
Fees paidRenewal fee
30.03.2016Renewal fee patent year 03
10.04.2017Renewal fee patent year 04
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU29.04.2014
AL28.06.2017
AT28.06.2017
CY28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
MC28.06.2017
MK28.06.2017
NL28.06.2017
PL28.06.2017
PT28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
TR28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
[2020/34]
Former [2020/31]HU29.04.2014
AT28.06.2017
CY28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
MC28.06.2017
MK28.06.2017
NL28.06.2017
PL28.06.2017
PT28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
TR28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2020/28]HU29.04.2014
AT28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
MC28.06.2017
NL28.06.2017
PL28.06.2017
PT28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
TR28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2020/15]AT28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
MC28.06.2017
NL28.06.2017
PL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
TR28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2018/52]AT28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
MC28.06.2017
NL28.06.2017
PL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2018/39]AT28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
PL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SI28.06.2017
SK28.06.2017
SM28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2018/21]AT28.06.2017
CZ28.06.2017
DK28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
PL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SK28.06.2017
SM28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2018/11]AT28.06.2017
CZ28.06.2017
EE28.06.2017
ES28.06.2017
FI28.06.2017
HR28.06.2017
IT28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
PL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SK28.06.2017
SM28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
IS28.10.2017
Former [2018/10]AT28.06.2017
CZ28.06.2017
EE28.06.2017
FI28.06.2017
HR28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
RO28.06.2017
RS28.06.2017
SE28.06.2017
SK28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
Former [2018/09]EE28.06.2017
FI28.06.2017
HR28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
RS28.06.2017
SE28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
Former [2017/52]FI28.06.2017
HR28.06.2017
LT28.06.2017
LV28.06.2017
NL28.06.2017
RS28.06.2017
SE28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
Former [2017/50]FI28.06.2017
HR28.06.2017
LT28.06.2017
LV28.06.2017
RS28.06.2017
SE28.06.2017
BG28.09.2017
NO28.09.2017
GR29.09.2017
Former [2017/49]FI28.06.2017
HR28.06.2017
LT28.06.2017
NO28.09.2017
GR29.09.2017
Documents cited:Search[X]US2009062960  (KRISHNASAMY SEKAR [US], et al) [X] 1-15 * paragraph [0033] - paragraph [0042]; figures 1, 5, 6 *;
 [X]EP0597637  (APPLIED MATERIALS INC [US]) [X] 1-15 * page 8, paragraph 18 - page 9, paragraph 3; figures 1,2, 11 *;
 [X]US2003202092  (SADIGHI IRAJ [US], et al) [X] 1-15 * paragraph [0087]; figures 1, 4-6 *
ExaminationUS2004068347
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.