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Extract from the Register of European Patents

EP About this file: EP3079015

EP3079015 - PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  05.03.2021
Database last updated on 23.04.2024
FormerThe patent has been granted
Status updated on  27.03.2020
FormerGrant of patent is intended
Status updated on  13.11.2019
FormerExamination is in progress
Status updated on  25.06.2019
FormerRequest for examination was made
Status updated on  17.02.2017
Most recent event   Tooltip23.06.2023Lapse of the patent in a contracting state
New state(s): CY		published on 26.07.2023  [2023/30]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome
Chiyoda-ku
Tokyo / JP
[2016/41]
Inventor(s)01 / ADACHI, Teppei
Shin-Etsu Chemical Co., Ltd.
c/o New Functional Materials Research Center
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata / JP
02 / WATANABE, Satoshi
Shin-Etsu Chemical Co., Ltd.
c/o New Functional Materials Research Center
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata / JP
03 / DOMON, Daisuke
Shin-Etsu Chemical Co., Ltd.
c/o New Functional Materials Research Center
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata / JP
04 / MASUNAGA, Keiichi
Shin-Etsu Chemical Co., Ltd.
c/o New Functional Materials Research Center
28-1, Nishi Fukushima
Kubiki-ku
Joetsu-shi, Niigata / JP
 [2016/41]
Representative(s)Ter Meer Steinmeister & Partner
Patentanwälte mbB
Nymphenburger Straße 4
80335 München / DE
[2016/41]
Application number, filing date16161526.522.03.2016
[2016/41]
Priority number, dateJP2015007845907.04.2015         Original published format: JP 2015078459
[2016/41]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3079015
Date:12.10.2016
Language:EN
[2016/41]
Type: B1 Patent specification 
No.:EP3079015
Date:29.04.2020
Language:EN
[2020/18]
Search report(s)(Supplementary) European search report - dispatched on:EP09.09.2016
ClassificationIPC:G03F7/039, G03F1/80, G03F7/004, G03F7/038
[2016/41]
CPC:
G03F7/0382 (EP,CN,KR,US); G03F7/038 (CN); G03F1/40 (CN);
G03F1/50 (CN,KR,US); G03F1/66 (KR); G03F1/80 (EP,US);
G03F7/00 (CN); G03F7/004 (CN); G03F7/0045 (US);
G03F7/0046 (EP,US); G03F7/039 (EP,US); G03F7/09 (US);
G03F7/093 (US); G03F7/11 (US); G03F7/2059 (US);
G03F7/322 (US); G03F7/36 (US); G03F7/40 (US);
G03F7/405 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/12]
Former [2016/41]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:FOTOMASKENROHLING, RESISTSTRUKTURBILDUNGSVERFAHREN UND VERFAHREN ZUR HERSTELLUNG EINER FOTOMASKE[2016/41]
English:PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK[2016/41]
French:ÉBAUCHE DE PHOTOMASQUE, PROCÉDÉ DE FORMATION DE MOTIF DE RÉSERVE ET PROCÉDÉ DE FABRICATION DE PHOTOMASQUE[2016/41]
Examination procedure22.03.2016Date on which the examining division has become responsible
09.02.2017Amendment by applicant (claims and/or description)
09.02.2017Examination requested  [2017/12]
28.06.2019Despatch of a communication from the examining division (Time limit: M04)
08.10.2019Reply to a communication from the examining division
14.11.2019Communication of intention to grant the patent
28.02.2020Fee for grant paid
28.02.2020Fee for publishing/printing paid
28.02.2020Receipt of the translation of the claim(s)
Opposition(s)01.02.2021No opposition filed within time limit [2021/14]
Fees paidRenewal fee
23.03.2018Renewal fee patent year 03
26.03.2019Renewal fee patent year 04
24.03.2020Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU22.03.2016
AL29.04.2020
AT29.04.2020
CY29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
MC29.04.2020
NL29.04.2020
PL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SI29.04.2020
SK29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
[2023/30]
Former [2023/27]HU22.03.2016
AL29.04.2020
AT29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
MC29.04.2020
NL29.04.2020
PL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SI29.04.2020
SK29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/45]AL29.04.2020
AT29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
MC29.04.2020
NL29.04.2020
PL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SI29.04.2020
SK29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/24]AL29.04.2020
AT29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
NL29.04.2020
PL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SI29.04.2020
SK29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/10]AL29.04.2020
AT29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
NL29.04.2020
PL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SK29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/09]AL29.04.2020
AT29.04.2020
CZ29.04.2020
DK29.04.2020
EE29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
NL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/08]AL29.04.2020
DK29.04.2020
ES29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
NL29.04.2020
RO29.04.2020
RS29.04.2020
SE29.04.2020
SM29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/04]AL29.04.2020
FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
NL29.04.2020
RS29.04.2020
SE29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2021/01]FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
RS29.04.2020
SE29.04.2020
BG29.07.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2020/51]FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
RS29.04.2020
SE29.04.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2020/50]FI29.04.2020
HR29.04.2020
LT29.04.2020
LV29.04.2020
SE29.04.2020
NO29.07.2020
GR30.07.2020
IS29.08.2020
PT31.08.2020
Former [2020/48]FI29.04.2020
LT29.04.2020
SE29.04.2020
NO29.07.2020
IS29.08.2020
PT31.08.2020
Former [2020/47]LT29.04.2020
NO29.07.2020
IS29.08.2020
Former [2020/46]IS29.08.2020
Documents cited:Search[X]JP2008203452  (SHINETSU CHEMICAL CO) [X] 1-3,5,7,11-15 * paragraphs [0022] , [0026] , [0109] , [0134] , [0208]; examples 14-28; claim 10 *;
 [A]EP2256551  (SHINETSU CHEMICAL CO [JP]) [A] 1-15* the whole document *;
 [X]EP2362267  (SHINETSU CHEMICAL CO [JP]) [X] 1-3,5,7,11-15 * paragraphs [0019] , [0062] - [0090] - [0097] , [0120] - [0132]; examples 11-27; claims 1,3,5,10 *;
 [X]EP2492746  (SHINETSU CHEMICAL CO [JP]) [X] 1-3,5,7,11-15 * paragraphs [0025] - [0090]; examples 1-15; claims 1,4,5,8,10 *
by applicantEP0041780
 JPH10309449
 JP2001166476
 JP2002226721
 JP2004115630
 JP2005326833
 EP1621927
 JP2006048029
 JP2006078807
 JP2006140635
 JP2007204385
 JP2007204448
 US7288363
 JP2008108535
 JP2008111103
 JP2008133448
 EP2000851
 JP2008304590
 US7531287
 US7537880
 JP2010077404
 JP2010514161
 JP2012032762
 US8343694
 WO2014007299
 JP2014015550
 JP2014028759
 JP2014028760
 JP2014177407
 JP2015078459
 US9091918
    - PROC. SPIE, vol. 8522, pages 852200 - 1
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.