blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP4073832

EP4073832 - METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS [Right-click to bookmark this link]
StatusRequest for examination was made
Status updated on  16.09.2022
Database last updated on 11.11.2024
FormerThe international publication has been made
Status updated on  18.06.2021
Formerunknown
Status updated on  01.12.2020
Most recent event   Tooltip14.10.2024New entry: Renewal fee paid 
Applicant(s)For all designated states
Evatec AG
Hauptstrasse 1a
9477 Trübbach / CH
[2022/42]
Inventor(s)01 / GOOD, Romeo
Zollackerstrasse 6
8880 Walenstadt / CH
02 / SCHWYN THÖNY, Silvia
Grofenbrüelstrasse 22
7323 Wangs / CH
03 / PADRUN, Marco
Pardellgasse 14a
7304 Maienfeld / CH
04 / SCHÜNGEL, Edmund
Schläppliweg 11
9470 Buchs / CH
05 / GEES, Silvio
Bidemstrasse 51
7310 Bad Ragaz / CH
 [2022/42]
Representative(s)Troesch Scheidegger Werner AG
Schwäntenmos 14
8126 Zumikon / CH
[2022/42]
Application number, filing date20811282.120.11.2020
[2022/42]
WO2020EP82850
Priority number, dateCH2019000162013.12.2019         Original published format: CH 16202019
[2022/42]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2021115758
Date:17.06.2021
Language:EN
[2021/24]
Type: A1 Application with search report 
No.:EP4073832
Date:19.10.2022
Language:EN
The application published by WIPO in one of the EPO official languages on 17.06.2021 takes the place of the publication of the European patent application.
[2022/42]
Search report(s)International search report - published on:EP17.06.2021
ClassificationIPC:H01J37/34, C23C14/35, H01J37/32
[2022/42]
CPC:
H01J37/34 (EP); C23C14/352 (EP,KR); H01J37/3452 (EP,KR,US);
C23C14/0057 (US); C23C14/0063 (US); C23C14/14 (US);
C23C14/35 (US); C23C14/505 (EP,KR,US); H01J37/3244 (US);
H01J37/32761 (EP,US); H01J37/32779 (EP); H01J37/3405 (US);
H01J37/3408 (EP,KR,US); H01J37/3423 (US); H01J37/345 (EP);
H01J37/347 (EP,KR) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2022/42]
TitleGerman:VERFAHREN ZUR SPUTTERBESCHICHTUNG VON SUBSTRATEN ODER ZUR HERSTELLUNG VON SPUTTERBESCHICHTETEN SUBSTRATEN UND VORRICHTUNGEN[2022/42]
English:METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS[2022/42]
French:PROCÉDÉ DE REVÊTEMENT PAR PULVÉRISATION DE SUBSTRATS OU DE FABRICATION DE SUBSTRATS REVÊTUS PAR PULVÉRISATION ET APPAREIL[2022/42]
Entry into regional phase02.05.2022National basic fee paid 
02.05.2022Designation fee(s) paid 
02.05.2022Examination fee paid 
Examination procedure02.05.2022Examination requested  [2022/42]
02.05.2022Date on which the examining division has become responsible
19.01.2023Amendment by applicant (claims and/or description)
Fees paidRenewal fee
11.11.2022Renewal fee patent year 03
25.10.2023Renewal fee patent year 04
14.10.2024Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[Y]JPS63247366  (MATSUSHITA ELECTRIC IND CO LTD);
 [YD]US5182003  (MAASS WOLFRAM [DE], et al);
 [Y]EP2378538  (JDS UNIPHASE CORP [US]);
 [A]WO2017042123  (EVATEC AG [CH]);
 [Y]WO2019087724  (ULVAC INC [JP])
by applicantUS5182003
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.