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EP0097016
European procedure
Extract from the Register of European Patents
EP About this file: EP0097016
| EP0097016 - Electron beam exposure apparatus [Right-click to bookmark this link] | |||
| Former [1983/52] | Electron beam exposure apparatus and method | ||
| [1989/41] | Status | No opposition filed within time limit Status updated on 02.08.1990 Database last updated on 26.03.2025 | Most recent event Tooltip | 02.08.1990 | No opposition filed within time limit | published on 19.09.1990 [1990/38] | Applicant(s) | For all designated states FUJITSU LIMITED 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi Kanagawa 211 / JP | [N/P] |
| Former [1983/52] | For all designated states FUJITSU LIMITED 1015, Kamikodanaka, Nakahara-ku Kawasaki-shi, Kanagawa 211 / JP | Inventor(s) | 01 /
Yasuda, Hiroshi D 407, 916-1 Mamedo-cho Kohoku-ku Yokohama-shi Kanagawa 222 / JP | 02 /
Tsuchikawa, Haruo 195 Futoo-cho Kohoku-ku Yokohama-shi Kanagawa 222 / JP | [1983/52] | Representative(s) | Rackham, Stephen Neil, et al Gill Jennings & Every LLP Broadgate House 7 Eldon Street London EC2M 7LH / GB | [N/P] |
| Former [1983/52] | Rackham, Stephen Neil, et al GILL JENNINGS & EVERY, Broadgate House, 7 Eldon Street London EC2M 7LH / GB | Application number, filing date | 83303277.4 | 07.06.1983 | [1983/52] | Priority number, date | JP19820100422 | 11.06.1982 Original published format: JP 10042282 | [1983/52] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP0097016 | Date: | 28.12.1983 | Language: | EN | [1983/52] | Type: | A3 Search report | No.: | EP0097016 | Date: | 11.09.1985 | Language: | EN | [1985/37] | Type: | B1 Patent specification | No.: | EP0097016 | Date: | 11.10.1989 | Language: | EN | [1989/41] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 08.07.1985 | Classification | IPC: | H01J37/304, H01J37/317 | [1983/52] | CPC: |
B82Y10/00 (EP,US);
H01J37/304 (EP,US);
B82Y40/00 (EP,US);
H01J37/3174 (EP,US);
H01L21/30 (EP,US);
H01J2237/0209 (EP,US);
| Designated contracting states | DE, FR, GB [1983/52] | Title | German: | Elektronenstrahlbelichtungsgerät | [1989/41] | English: | Electron beam exposure apparatus | [1989/41] | French: | Appareil d'exposition pour faisceau d'électrons | [1989/41] |
| Former [1983/52] | Elektronenstrahlbelichtungsgerät und Methode | ||
| Former [1983/52] | Electron beam exposure apparatus and method | ||
| Former [1983/52] | Appareil d'exposition pour faisceau d'électrons et méthode | Examination procedure | 18.02.1986 | Examination requested [1986/17] | 27.07.1987 | Despatch of a communication from the examining division (Time limit: M06) | 26.01.1988 | Reply to a communication from the examining division | 26.02.1988 | Despatch of a communication from the examining division (Time limit: M06) | 23.08.1988 | Reply to a communication from the examining division | 21.11.1988 | Despatch of communication of intention to grant (Approval: Yes) | 22.03.1989 | Communication of intention to grant the patent | 08.06.1989 | Fee for grant paid | 08.06.1989 | Fee for publishing/printing paid | Opposition(s) | 12.07.1990 | No opposition filed within time limit [1990/38] | Fees paid | Renewal fee | 20.06.1985 | Renewal fee patent year 03 | 11.06.1986 | Renewal fee patent year 04 | 22.06.1987 | Renewal fee patent year 05 | 14.06.1988 | Renewal fee patent year 06 | 12.06.1989 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US3801792 (LIN L); | [A]US3911321 (WARDLY GEORGE A); | [X]US4125772 (HOLMES DUANE C); | [X]EP0025578 (SIEMENS AG [DE]) |