Extract from the Register of European Patents

About this file: EP0355945

EP0355945 - Reduced stereolithographic part distortion through isolation [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  24.04.1998
Database last updated on 28.07.2017
Most recent event   Tooltip30.11.2007Lapse of the patent in a contracting statepublished on 02.01.2008  [2008/01]
Applicant(s)For all designated states
3D SYSTEMS, INC.
26081 Avenue Hall Valencia
California 91355 / US
[N/P]
Former [1990/09]For all designated states
3D SYSTEMS, INC.
26081 Avenue Hall
Valencia California 91355 / US
Inventor(s)01 / Smalley, Dennis Rollette
14131 Los Angeles Street
Baldwin Park California 91706 / US
[1990/09]
Representative(s)Allam, Peter Clerk , et al
Lloyd Wise Commonwealth House, 1-19 New Oxford Street
London WC1A 1LW / GB
[N/P]
Former [1993/33]Allam, Peter Clerk , et al
LLOYD WISE, TREGEAR & CO. Norman House 105-109 Strand
London WC2R 0AE / GB
Former [1990/09]Ayers, Martyn Lewis Stanley
J.A. KEMP & CO. 14 South Square Gray's Inn
London WC1R 5LX / GB
Application number, filing date89303785.317.04.1989
[1990/09]
Priority number, dateUS1988018301518.04.1988         Original published format: US 183015
[1990/09]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0355945
Date:28.02.1990
Language:EN
[1990/09]
Type: A3 Search report 
No.:EP0355945
Date:09.10.1991
Language:EN
[1991/41]
Type: B1 Patent specification 
No.:EP0355945
Date:18.06.1997
Language:EN
[1997/25]
International and Supplementary
search report(s)		Supplementary European search report -
dispatched on:		EP20.08.1991
ClassificationInternational:B29C39/42, B29C39/40, B29C67/24
[1990/09]
Designated contracting statesAT,   BE,   CH,   DE,   ES,   FR,   GB,   GR,   IT,   LI,   LU,   NL,   SE [1990/09]
TitleGerman:Verringerung der Verformung von stereolithografischen Teilen durch Isolierung der Spannungen[1990/09]
English:Reduced stereolithographic part distortion through isolation[1990/09]
French:Réduction de la déformation de pièces stéréolithographiques par isolation des tensions[1990/09]
Examination procedure24.03.1992Examination requested  [1992/21]
06.08.1993Despatch of a communication from the examining division (Time limit: M08)
18.04.1994Reply to a communication from the examining division
28.11.1994Despatch of a communication from the examining division (Time limit: M06)
07.07.1995Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
05.09.1995Reply to a communication from the examining division
29.09.1995Despatch of a communication from the examining division (Time limit: M06)
07.02.1996Reply to a communication from the examining division
11.06.1996Despatch of communication of intention to grant (Approval: No)
17.10.1996Despatch of communication of intention to grant (Approval: later approval)
22.10.1996Communication of intention to grant the patent
27.01.1997Fee for grant paid
27.01.1997Fee for publishing/printing paid
Opposition(s)19.03.1998No opposition filed within time limit [1998/24]
Request for further processing for:26.07.1995Request for further processing filed
26.07.1995Full payment received (date of receipt of payment)
Request granted
11.09.1995Decision despatched
Fees paidRenewal fee
12.04.1991Renewal fee patent year 03
18.05.1992Renewal fee patent year 04
15.03.1993Renewal fee patent year 05
27.04.1994Renewal fee patent year 06
09.06.1995Renewal fee patent year 07
16.04.1996Renewal fee patent year 08
12.04.1997Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
01.05.199204   M06   Fee paid on   18.05.1992
30.04.199507   M06   Fee paid on   09.06.1995
Lapses during opposition  TooltipAT18.06.1997
BE18.06.1997
CH18.06.1997
ES18.06.1997
GR18.06.1997
IT18.06.1997
LI18.06.1997
NL18.06.1997
SE18.09.1997
[2008/01]
Former [2003/07]AT18.06.1997
BE18.06.1997
CH18.06.1997
ES18.06.1997
GR18.06.1997
IT18.06.1997
LI18.06.1997
NL18.06.1997
SE18.09.1997
Former [2002/24]AT18.06.1997
BE18.06.1997
CH18.06.1997
ES18.06.1997
GR18.06.1997
IT18.06.1997
LI18.06.1997
SE18.09.1997
Former [2000/04]AT18.06.1997
BE18.06.1997
CH18.06.1997
GR18.06.1997
IT18.06.1997
LI18.06.1997
SE18.09.1997
Former [1999/42]AT18.06.1997
BE18.06.1997
CH18.06.1997
IT18.06.1997
LI18.06.1997
SE18.09.1997
Former [1998/43]AT18.06.1997
BE18.06.1997
CH18.06.1997
LI18.06.1997
SE18.09.1997
Former [1998/12]AT18.06.1997
BE18.06.1997
SE18.09.1997
Former [1998/10]AT18.06.1997
BE18.06.1997
Former [1998/02]AT18.06.1997
Documents cited:Search[X]EP0250121  (SCITEX CORP LTD [IL]);
 [AD]US4575330  (HULL CHARLES W [US])
Examination   - Systems and Computers in Japan, 20(1989)March, no. 8, New York, US, T. Nakai and Y. Marutani : "Fabrication of Three-Dimensional Objects using Laser Lithography" pages 58 - 66 (Translated from Denshi Joho Tsushin Gakkai Ronbunshi, Vol. 71.D, No. 2, February 1988, pp. 416 - 423),