Extract from the Register of European Patents

About this file: EP0686480

EP0686480 - Stereolithographic supports [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  04.10.2002
Database last updated on 28.07.2017
Most recent event   Tooltip28.12.2007Lapse of the patent in a contracting state
New state(s): IT		published on 30.01.2008  [2008/05]
Applicant(s)For all designated states
3D SYSTEMS, INC.
26081 Avenue Hall Valencia
California 91355 / US
[N/P]
Former [2001/48]For all designated states
3D SYSTEMS, INC.
26081 Avenue Hall
Valencia, California 91355 / US
Former [1995/50]For all designated states
3D SYSTEMS, INC.
26081 Avenue Hall
Valencia California 91355 / US
Inventor(s)01 / Hull, Charles W.
28155 North Tamarack Lane
Santa Clarita, CA 91350 / US
02 / Lewis, Charles W.
3930 Cody Road
Sherman Oaks, CA 91403 / US
[1995/50]
Representative(s)Hess, Peter K. G. , et al
Bardehle Pagenberg Partnerschaft mbB
Patentanwälte, Rechtsanwälte
Postfach 86 06 20
81633 München / DE
[N/P]
Former [1999/47]Hess, Peter K., Dipl.-Phys. , et al
Bardehle-Pagenberg-Dost-Altenburg-Geissler-Isenbruck Patent- und Rechtsanwälte Postfach 86 06 20
81633 München / DE
Former [1995/50]Frohwitter, Bernhard, Dipl.-Ing. , et al
Patent- und Rechtsanwälte Bardehle . Pagenberg . Dost . Altenburg . Frohwitter . Geissler & Partner Postfach 86 06 20
D-81633 München / DE
Application number, filing date95111925.417.04.1989
[1995/50]
Priority number, dateUS1988018280118.04.1988         Original published format: US 182801
US1988026980108.11.1988         Original published format: US 269801
[1995/50]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP0686480
Date:13.12.1995
Language:EN
[1995/50]
Type: A3 Search report 
No.:EP0686480
Date:20.11.1996
[1996/47]
Type: B1 Patent specification 
No.:EP0686480
Date:28.11.2001
Language:EN
[2001/48]
International and Supplementary
search report(s)		Supplementary European search report -
dispatched on:		EP02.10.1996
ClassificationInternational:B29C67/00
[1995/50]
Designated contracting statesAT,   BE,   CH,   DE,   ES,   FR,   GB,   GR,   IT,   LI,   LU,   NL,   SE [1995/50]
TitleGerman:Stereolithografische Stützen[1995/50]
English:Stereolithographic supports[1995/50]
French:Supports stéréolithographiques[1995/50]
Examination procedure28.07.1995Examination requested  [1995/50]
14.12.1998Despatch of a communication from the examining division (Time limit: M06)
23.07.1999Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
04.10.1999Reply to a communication from the examining division
18.02.2000Despatch of a communication from the examining division (Time limit: M08)
06.10.2000Reply to a communication from the examining division
18.01.2001Despatch of communication of intention to grant (Approval: Yes)
06.06.2001Communication of intention to grant the patent
28.08.2001Fee for grant paid
28.08.2001Fee for publishing/printing paid
Parent application(s)   TooltipEP89303786.1  / EP0338751
Opposition(s)29.08.2002No opposition filed within time limit [2002/47]
Request for further processing for:04.10.1999Request for further processing filed
04.10.1999Full payment received (date of receipt of payment)
Request granted
21.10.1999Decision despatched
Fees paidRenewal fee
28.07.1995Renewal fee patent year 03
28.07.1995Renewal fee patent year 04
28.07.1995Renewal fee patent year 05
28.07.1995Renewal fee patent year 06
28.07.1995Renewal fee patent year 07
25.04.1996Renewal fee patent year 08
28.04.1997Renewal fee patent year 09
28.04.1998Renewal fee patent year 10
26.04.1999Renewal fee patent year 11
28.04.2000Renewal fee patent year 12
25.04.2001Renewal fee patent year 13
Lapses during opposition  TooltipAT28.11.2001
CH28.11.2001
GR28.11.2001
IT28.11.2001
LI28.11.2001
SE28.02.2002
LU17.04.2002
ES30.05.2002
[2008/05]
Former [2004/39]AT28.11.2001
CH28.11.2001
GR28.11.2001
LI28.11.2001
SE28.02.2002
LU17.04.2002
ES30.05.2002
Former [2004/04]AT28.11.2001
CH28.11.2001
GR28.11.2001
LI28.11.2001
SE28.02.2002
ES30.05.2002
Former [2003/09]AT28.11.2001
CH28.11.2001
GR28.11.2001
LI28.11.2001
SE28.02.2002
Former [2003/01]CH28.11.2001
GR28.11.2001
LI28.11.2001
SE28.02.2002
Former [2002/49]GR28.11.2001
SE28.02.2002
Former [2002/26]SE28.02.2002
Documents cited:Search[X]EP0250121  (SCITEX CORP LTD [IL]) [X] 1-24 * column 15, line 30 - line 41; figures 6,9; claims 1,19,22,23,25,27 * * column 18, line 21 - line 26 *;
 [E]WO9011178  (SONY CORP [JP]) [E] 1-24 * abstract *;
 [A]US4575330  (HULL CHARLES W [US]) [A] 1-24 * figure -; claim - *;
 [A]JPS60247515
 [A]  - PATENT ABSTRACTS OF JAPAN, (19860502), vol. 010, no. 118, Database accession no. (M - 475), [A] 1-24 * abstract *
by applicantUS4041476
 US4078229
 US4238840
 US4288861
 US4575330
    - SLA-1 Training Manuel, Revision 3.0, 3D SYSTEMS INC., (198804),
 US19880182823
 US19880182830
 US19880183015
 US19880182801
 US19880183016
 US19880183014
 US19880183012
 US19890269801
 US19890268816
 US19890268907
 US19890268429
 US19890268408