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Extract from the Register of European Patents

EP About this file: EP0752621

EP0752621 - Frame-supported pellicle for photomask protection [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.02.2001
Database last updated on 23.04.2024
Most recent event   Tooltip09.02.2001No opposition filed within time limitpublished on 28.03.2001 [2001/13]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo / JP
[N/P]
Former [1997/02]For all designated states
SHIN-ETSU CHEMICAL CO., LTD.
6-1, Ohtemachi 2-chome
Chiyoda-ku Tokyo / JP
Inventor(s)01 / Hamada, Yuichi
c/o Shin-Etsu Chem. Co., Ltd., 13-1, Isobe 2-chome
Annaka-shi, Gunma-Ken / JP
02 / Kashida, Meguru
c/o Shin-Etsu Chem. Co., Ltd., 13-1, Isobe 2-chome
Annaka-shi, Gunma-Ken / JP
[1997/02]
Representative(s)Armengaud Ainé, Alain, et al
Cabinet ARMENGAUD AINE 3 Avenue Bugeaud
75116 Paris / FR
[1997/02]
Application number, filing date96401439.328.06.1996
[1997/02]
Priority number, dateJP1995016954505.07.1995         Original published format: JP 16954595
[1997/02]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP0752621
Date:08.01.1997
Language:EN
[1997/02]
Type: B1 Patent specification 
No.:EP0752621
Date:12.04.2000
Language:EN
[2000/15]
Search report(s)(Supplementary) European search report - dispatched on:EP10.09.1996
ClassificationIPC:G03F1/14
[1997/02]
CPC:
G03F1/64 (EP,US); H01L21/027 (KR); Y10T428/249985 (EP,US)
Designated contracting statesDE,   FR,   GB [1997/02]
TitleGerman:Rahmengestützte Membranabdeckung zum Schutz einer Photomaske[1997/02]
English:Frame-supported pellicle for photomask protection[1997/02]
French:Pellicule supportée par un châssis pour la protection d'un photomasque[1997/02]
Examination procedure11.06.1997Examination requested  [1997/33]
16.07.1998Despatch of a communication from the examining division (Time limit: M04)
07.11.1998Reply to a communication from the examining division
08.04.1999Despatch of a communication from the examining division (Time limit: M04)
22.05.1999Reply to a communication from the examining division
07.06.1999Despatch of a communication from the examining division (Time limit: M04)
01.07.1999Reply to a communication from the examining division
20.08.1999Despatch of communication of intention to grant (Approval: Yes)
15.09.1999Communication of intention to grant the patent
20.10.1999Fee for grant paid
20.10.1999Fee for publishing/printing paid
Opposition(s)13.01.2001No opposition filed within time limit [2001/13]
Fees paidRenewal fee
15.06.1998Renewal fee patent year 03
14.06.1999Renewal fee patent year 04
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Documents cited:Search[X]JPH0627644  ;
 [A]JPH05150446  ;
 [A]JPH04342257  ;
 [A]JPH04212958  ;
 [A]JPS63284551  ;
 [A]JPH01154062
 [X]  - PATENT ABSTRACTS OF JAPAN, (19940510), vol. 18, no. 244, Database accession no. (P - 1734), & JP06027644 A 19940204 (SEIKO EPSON CORP) [X] 1,4 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19930929), vol. 17, no. 543, Database accession no. (P - 1622), & JP05150446 A 19930618 (MATSUSHITA ELECTRON CORP) [A] 1 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19930415), vol. 17, no. 194, Database accession no. (P - 1522), & JP04342257 A 19921127 (RICOH CO LTD) [A] 1 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19921130), vol. 16, no. 559, Database accession no. (P - 1455), & JP04212958 A 19920804 (NIKON CORP) [A] 1 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890313), vol. 13, no. 104, Database accession no. (P - 842), & JP63284551 A 19881121 (MITSUBISHI ELECTRIC CORP) [A] 1 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19890920), vol. 13, no. 422, Database accession no. (P - 933), & JP01154062 A 19890616 (SEIKO EPSON CORP) [A] 4 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.