Extract from the Register of European Patents

Citations: EP0996973

Cited inInternational search
Type:Patent literature
Publication No.:JPS645015  [X]
 ;
Type:Patent literature
Publication No.:JPS63317676  [X]
 ;
Type:Patent literature
Publication No.:US5356835  [X]
 (SOMEKH SASSON ET AL) [X] 1-6,8,9 * column 6, line 10 - line 20 *;
Type:Patent literature
Publication No.:EP0778358  [X]
 (APPLIED MATERIALS INC) [X] 27-30 * the whole document *;
Type:Patent literature
Publication No.:EP0711846  [A]
 (APPLIED MATERIALS INC) [A] * table 2 *;
Type:Patent literature
Publication No.:US5232872  [A]
 (OHBA TAKAYUKI) [A] * the whole document *;
Type:Patent literature
Publication No.:EP0840363  [PX]
 (TEXAS INSTRUMENTS INC) [PX] 1-4,18,20-26 * figure 1 *;
Type:Patent literature
Publication No.:EP0841690  [PX]
 (SAMSUNG ELECTRONICS CO LTD) [PX] 1-5,14-17,20,21,24-26 * column 4, line 30 - column 5, line 31 *;
Type:Patent literature
Publication No.:US5648175  [PX]
 (RUSSELL KATHLEEN ET AL) [PX] 27-30 * the whole document *
Type:Non-patent literature
Publication information:[X]  - PATENT ABSTRACTS OF JAPAN, (19890424), vol. 013, no. 173, Database accession no. (E - 748), & JP01005015 A 19890110 (SHARP CORP) [X] 1-4,15-17,20,21,24-26 * abstract *
Type:Non-patent literature
Publication information:[X]  - PATENT ABSTRACTS OF JAPAN, (19890421), vol. 013, no. 169, Database accession no. (C - 587), & JP63317676 A 19881226 (SHARP CORP) [X] 1-6,15,16,20-22,25,26 * abstract *
Type:Non-patent literature
Publication information:[PX]  - LU J P ET AL, "A new process for depositing tungsten nitride thin films", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, FEB. 1998, ELECTROCHEM. SOC, USA, ISSN 0013-4651, vol. 145, no. 2, pages L21 - L23, XP002079461 [PX] 1-4,10-21,24-26 * the whole document *