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Extract from the Register of European Patents

EP About this file: EP1037510

EP1037510 - Plasma focus high energy photon source with blast shield [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  10.07.2009
Database last updated on 02.08.2024
Most recent event   Tooltip10.07.2009Application deemed to be withdrawnpublished on 12.08.2009  [2009/33]
Applicant(s)For all designated states
Cymer, Inc.
17075 Thornmint Court
San Diego, CA 92127 / US
[2004/14]
Former [2000/38]For all designated states
Cymer, Inc.
16750 Via del Campo Court
San Diego, CA 92127-1712 / US
Inventor(s)01 / Partlo, William N.
12634 Pedriza Drive
Poway, California 92064 / US
02 / Fomenkov, Igor V.
14390 Janal Way
San Diego, California 92129 / US
03 / Birx, Daniel L.
deceased / US
[2000/38]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstrasse 4
80802 München / DE
[N/P]
Former [2000/38]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Maximilianstrasse 58
80538 München / DE
Application number, filing date00105278.614.03.2000
[2000/38]
Priority number, dateUS1999026824315.03.1999         Original published format: US 268243
US1999044258218.11.1999         Original published format: US 442582
US1999032452602.06.1999         Original published format: US 324526
[2000/38]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1037510
Date:20.09.2000
Language:EN
[2000/38]
Type: A3 Search report 
No.:EP1037510
Date:02.01.2004
[2004/01]
Search report(s)(Supplementary) European search report - dispatched on:EP11.11.2003
ClassificationIPC:H05G2/00
[2000/38]
CPC:
H05G2/003 (EP,US); F21V19/008 (KR); B82Y10/00 (EP,US);
F21S8/033 (KR); F21V17/16 (KR); F21V21/02 (KR);
G03F7/70033 (EP,US); G03F7/70166 (EP,US); G03F7/70916 (EP,US);
H01R33/942 (KR); H05G2/005 (EP,US) (-)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2000/38]
TitleGerman:Plasmaquelle von Hochenergie-Photonen mit Schutzwand[2000/38]
English:Plasma focus high energy photon source with blast shield[2000/38]
French:Source à plasma de photons de haute énergie avec écran protecteur[2000/38]
Examination procedure14.03.2000Examination requested  [2000/38]
06.03.2007Despatch of a communication from the examining division (Time limit: M06)
31.08.2007Reply to a communication from the examining division
23.10.2007Despatch of a communication from the examining division (Time limit: M06)
19.03.2008Reply to a communication from the examining division
15.09.2008Cancellation of oral proceeding that was planned for 29.09.2008
15.09.2008Minutes of oral proceedings despatched
29.09.2008Date of oral proceedings
29.09.2008Date of oral proceedings (cancelled)
02.10.2008Communication of intention to grant the patent
13.02.2009Application deemed to be withdrawn, date of legal effect  [2009/33]
23.03.2009Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2009/33]
Fees paidRenewal fee
28.03.2002Renewal fee patent year 03
28.03.2003Renewal fee patent year 04
22.03.2004Renewal fee patent year 05
22.03.2005Renewal fee patent year 06
29.03.2006Renewal fee patent year 07
28.03.2007Renewal fee patent year 08
27.03.2008Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
31.03.200910   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[Y]JP9302461  ;
 [A]JPH10189537  ;
 [A]US3426233  (SIMON DONALD R, et al) [A] 29 * column 5, line 70 - column 6, line 37 * * column 1, line 14 - line 24 *;
 [A]US4578805  (PEARLMAN JAY S [US], et al) [A] 5,6 * column 2, line 14 - line 19 * * column 3, line 29 - line 50 * * figure 2 *;
 [A]EP0539149  (BRITISH AEROSPACE [GB]) [A] 32 * column 1, line 1 - line 26 *;
 [YA]US5499282  (SILFVAST WILLIAM T [US]) [Y] 34-36,38-40 * column 9, line 31 - column 11, line 11 * * figures 9a-9c * [A] 7,8,10-12,15;
 [DA]US5504795  (MCGEOCH MALCOLM W [US]) [DA] 28,31 * figure 1 * * column 3, line 25 - column 4, line 36 *;
 [A]US5656141  (BETZ HANS-GEORG [DE], et al) [A] 2 * column 3, line 50 - line 53 * * figure 1 *;
 [A]US5703923  (BARDASH MICHAEL J [US]) [A] 2,3 * column 5, line 14 - line 22 * * figure 1 *;
 [Y]US5763930  (PARTLO WILLIAM NORMAN [US]) [Y] 1,4,8,9,15-19,21,22,24,34-36,38-40 * the whole document *;
 [A]US5866871  (BIRX DANIEL [US]) [A] 9 * column 2, line 3 - line 37 * * column 3, line 46 - column 4, line 13 * * claim 27 *;
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19980227), vol. 1998, no. 03, & JP9302461 A 19971125 (TOYOTA CENTRAL RES & DEV LAB INC) [Y] 1,4,8,9,15-19,21,22,24,34-36,38-40 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19981031), vol. 1998, no. 12, & JP10189537 A 19980721 (SONY CORP) [A] 23 * abstract *
 [PDA]  - PARTLO W ET AL, "EUV (13.5NM) LIGHT GENERATION USING A DENSE PLASMA FOCUS DEVICE", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, (199903), vol. 3676, ISSN 0277-786X, pages 846 - 858, XP000920520

DOI:   http://dx.doi.org/10.1117/12.351080
ExaminationEP0182477
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