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EP1094040
European procedure
Extract from the Register of European Patents
EP About this file: EP1094040
| EP1094040 - Silica glass optical material for excimer laser and excimer lamp, and method for producing the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 28.12.2007 Database last updated on 26.06.2024 | Most recent event Tooltip | 26.06.2009 | Change - representative | published on 29.07.2009 [2009/31] | Applicant(s) | For all designated states Heraeus Quarzglas GmbH & Co. KG Quarzstrasse 63450 Hanau / DE | For all designated states SHIN-ETSU QUARTZ PRODUCTS CO., LTD. 22-2, Nishi-Shinjuku 1-chome Shinjuku-ku Tokyo 160-0023 / JP | [2007/19] |
| Former [2007/08] | For all designated states Heraeus Quarzglas GmbH Quarzstrasse 63450 Hanau / DE | ||
| For all designated states SHIN-ETSU QUARTZ PRODUCTS CO., LTD. 22-2, Nishi-Shinjuku 1-chome Shinjuku-ku Tokyo 160-0023 / JP | |||
| Former [2001/17] | For all designated states Heraeus Quarzglas GmbH Quarzstrasse 63450 Hanau / DE | ||
| For all designated states Shin-Etsu Quartz Products Co., Ltd. 22-2, Nishi-Shinjuku 1-chome Shinjuku-ku Tokyo 160-0023 / JP | Inventor(s) | 01 /
Yamagata, Shigeru, Dr. Hanasaki 2-10-7 Narashino-shi, Chiba-ken 275-0013 / JP | [2001/17] | Representative(s) | Staudt, Armin Walter, et al Sandeldamm 24a 63450 Hanau / DE | [N/P] |
| Former [2009/31] | Staudt, Armin Walter, et al Patentanwalt Auf der Mauer 8 63674 Altenstadt / DE | ||
| Former [2005/32] | Staudt, Armin, Dipl.-Ing., et al Patentanwalt Auf der Mauer 8 63674 Altenstadt / DE | ||
| Former [2004/35] | Staudt, Armin, Dipl.-Ing., et al Patentanwalt Lange Strasse 10 63674 Altenstadt / DE | ||
| Former [2001/17] | Staudt, Armin Walter Patentanwälte Grimm & Staudt Edith-Stein-Strasse 22 63075 Offenbach/M. / DE | Application number, filing date | 00122418.7 | 13.10.2000 | [2001/17] | Priority number, date | JP19990296101 | 19.10.1999 Original published format: JP 29610199 | [2001/17] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1094040 | Date: | 25.04.2001 | Language: | EN | [2001/17] | Type: | A3 Search report | No.: | EP1094040 | Date: | 31.10.2001 | [2001/44] | Type: | B1 Patent specification | No.: | EP1094040 | Date: | 21.02.2007 | Language: | EN | [2007/08] | Type: | B8 Corrected title page of specification | No.: | EP1094040 | Date: | 30.05.2007 | [2007/22] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.09.2001 | Classification | IPC: | C03C3/06, C03B19/14, C03C4/00 | [2001/44] | CPC: |
G03F7/70958 (EP,US);
C03C3/06 (EP,KR,US);
C03B19/1453 (EP,US);
C03B2201/07 (EP,US);
C03B2201/075 (EP,US);
C03B2201/12 (EP,US);
C03B2201/21 (EP,US);
C03B2201/23 (EP,US);
C03C2201/12 (EP,US);
C03C2201/21 (EP,US);
C03C2201/23 (EP,US);
C03C2203/40 (EP,US);
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| Former IPC [2001/17] | C03C3/06 | Designated contracting states | AT, DE, FR, GB, NL [2002/29] |
| Former [2001/17] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Optischer Werkstoff aus Quarzglas für Excimer Laser und Excimer Lampe, und Verfahren zu dessen Herstellung | [2001/17] | English: | Silica glass optical material for excimer laser and excimer lamp, and method for producing the same | [2001/17] | French: | Matériau optique en verre de silice pour laser excimère et lampe excimère, et méthode de son production | [2001/17] | Examination procedure | 11.12.2001 | Examination requested [2002/06] | 10.11.2003 | Despatch of a communication from the examining division (Time limit: M06) | 30.04.2004 | Reply to a communication from the examining division | 01.09.2005 | Despatch of a communication from the examining division (Time limit: M04) | 31.12.2005 | Reply to a communication from the examining division | 22.05.2006 | Communication of intention to grant the patent | 13.09.2006 | Fee for grant paid | 13.09.2006 | Fee for publishing/printing paid | Opposition(s) | 22.11.2007 | No opposition filed within time limit [2008/05] | Fees paid | Renewal fee | 27.09.2002 | Renewal fee patent year 03 | 26.09.2003 | Renewal fee patent year 04 | 07.10.2004 | Renewal fee patent year 05 | 25.10.2005 | Renewal fee patent year 06 | 13.10.2006 | Renewal fee patent year 07 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]JPH09235134 ; | [PA]JPH11302025 ; | [DA]US5326729 (YABA SUSUMU [JP], et al) [DA] 1,12 * examples 1,2 *; | [XY]EP0691312 (NIPPON KOGAKU KK [JP]) [X] 1-11 * page 4, line 54 - page 5, line 31; claims 1,10-15 * [Y] 12,13; | [A]EP0835848 (NIPPON KOGAKU KK [JP]) [A] 1,12 * claims 6,8,18 *; | [PXY]EP1043282 (ASAHI GLASS CO LTD [JP]) [PX] 1-11 * paragraphs [0059] , [0068]; examples 6,7,25,26,37; claims 16-18; tables 1,4,5,7,18-20 * [Y] 12,13 | [Y] - PATENT ABSTRACTS OF JAPAN, (19980130), vol. 1998, no. 1, & JP09235134 A 19970909 (SHIN-ETSU QUARTZ PRODUCTS CO LTD) [Y] 12,13 * abstract * * paragraphs [0014] - [0017] * | [PA] - PATENT ABSTRACTS OF JAPAN, (20000229), vol. 2000, no. 2, & JP11302025 A 19991102 (ASAHI GLASS CO LTD) [PA] 1,12 * abstract * | by applicant | US2904713 | US3128166 | US3128169 | US3483613 | JPH0627013 | JPH0648734 | JPH06227827 | - YAMAGATA S., MINERALOGICAL JOURNAL, (1991), vol. 15, no. 8, pages 333 - 342 | - DODD D.M. ET AL, "Optical determination of OH in fused silica", JOURNAL OF APPLIED PHYSICS, (1966), vol. 37, page 3911 | - KHOTIMCHENKO V.K. ET AL, "Determining the content of hydrogen dissolved in quartz glass using the methods of Raman scattering and mass spectrometry", JOURNAL OF APPLIED SPECTROSCOPY, (1987), vol. 46, no. 6, pages 632 - 635 | - HOSONO H. ET AL, "Experimental evidence for the Si-Si bond model of the 7.6 eV band in SiO2 glass", PHYSICAL REVIEW B, (1991), vol. 44, no. 21, pages 12043 - 12045 |