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Extract from the Register of European Patents

EP About this file: EP1058156

EP1058156 - Integrating waveguide for use in lithographic projection apparatus [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  11.06.2010
Database last updated on 07.10.2024
Most recent event   Tooltip11.06.2010Application deemed to be withdrawnpublished on 14.07.2010  [2010/28]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2000/49]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Banine, Vadim Yevgenyevich
Nierslaan 2
5704 NK Helmond / NL
[2000/49]
Representative(s)Slenders, Petrus Johannes Waltherus, et al
ASML Netherlands B.V.
Corporate Intellectual Property
De Run 6501
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/23]Slenders, Petrus J. W., et al
ASML Netherlands B.V Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2009/09]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2000/49]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date00304664.601.06.2000
[2000/49]
Priority number, dateEP1999020176804.06.1999         Original published format: EP 99201768
[2000/49]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1058156
Date:06.12.2000
Language:EN
[2000/49]
Type: A3 Search report 
No.:EP1058156
Date:25.06.2003
[2003/26]
Search report(s)(Supplementary) European search report - dispatched on:EP14.05.2003
ClassificationIPC:G03F7/20
[2000/49]
CPC:
B82Y10/00 (EP); G03F7/70075 (EP); G03F7/70166 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2004/12]
Former [2000/49]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Integrierender Wellenleiter zur Verwendung in einem lithographischen Projektionsapparat[2000/49]
English:Integrating waveguide for use in lithographic projection apparatus[2000/49]
French:Guide intégrateur d' ondes pour l' utilisation dans un appareil de projection lithographique[2000/49]
Examination procedure17.12.2003Examination requested  [2004/09]
18.12.2003Amendment by applicant (claims and/or description)
01.03.2004Despatch of a communication from the examining division (Time limit: M04)
22.06.2004Reply to a communication from the examining division
05.01.2010Application deemed to be withdrawn, date of legal effect  [2010/28]
17.02.2010Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2010/28]
Fees paidRenewal fee
23.05.2002Renewal fee patent year 03
27.05.2003Renewal fee patent year 04
01.06.2004Renewal fee patent year 05
13.06.2005Renewal fee patent year 06
12.06.2006Renewal fee patent year 07
14.06.2007Renewal fee patent year 08
28.03.2008Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
30.06.200910   M06   Not yet paid
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]US5175755  (KUMAKHOV MURADIN A [SU]) [X] 1-4,6-18 * see parent application published as US 5 192 869 A; column 4, line 61 - line 63 * * column 6, line 10 - line 15 * * column 6, line 28 - line 58 * * figure 7 *;
 [A]US5192869  (KUMAKHOV MURADIN A [SU]) [A] 1-4,6-18 * publication of parent application of US 5 175 755 A * * abstract * * column 11, line 49 - line 57 * * column 14, line 45 - line 63 * * column 16, line 36 - line 43 *;
 [X]US5276724  (KUMASAKA FUMIAKI [JP], et al) [X] 1-4,6-18 * abstract *;
 [X]US5812631  (YAN YIMING [CN], et al) [X] 1-4,6-18 * abstract * * column 9, line 65 - column 10, line 16 * * figure 18 *;
 [X]WO9852389  (CYMER INC [US], et al) [X] 1-4,15-18 * abstract * * page 7, line 21 - line 22 *;
 [PX]WO9942904  (STICHTING TECH WETENSCHAPP [NL], et al) [PX] 1,2,16-18 * abstract ** page 4, line 32 - page 5, line 3 *;
 [X]  - "COLLIMATOR FOR X-RAY LITHOGRAPHY", IBM TECHNICAL DISCLOSURE BULLETIN, IBM CORP. NEW YORK, US, (19900901), vol. 33, no. 4, ISSN 0018-8689, pages 278 - 279, XP000106428 [X] 1-4,15-18 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.