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EP1069448
European procedure
Extract from the Register of European Patents
EP About this file: EP1069448
| EP1069448 - Catadioptric optical system and projection exposure apparatus equipped with the same [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 24.01.2004 Database last updated on 26.03.2026 | Most recent event Tooltip | 24.01.2004 | No opposition filed within time limit | published on 10.03.2004 [2004/11] | Applicant(s) | For all designated states NIKON CORPORATION 2-3, Marunouchi 3-chome Chiyoda-Ku Tokyo / JP | [N/P] |
| Former [2001/03] | For all designated states NIKON CORPORATION 2-3, Marunouchi 3-chome, Chiyoda-Ku Tokyo / JP | Inventor(s) | 01 /
Suenaga, Yutaka, Nikon Corp. Fuji Bldg., 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo / JP | 02 /
Miyashita, Tomohiro, Nikon Corp. Fuji Bldg., 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo / JP | 03 /
Yamaguchi, Kotaro, Nikon Corp. Fuji Bldg., 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo / JP | [2001/03] | Representative(s) | Burke, Steven David, et al R.G.C. Jenkins & Co 26 Caxton Street London SW1H 0RJ / GB | [N/P] |
| Former [2001/03] | Burke, Steven David, et al R.G.C. Jenkins & Co. 26 Caxton Street London SW1H 0RJ / GB | Application number, filing date | 00305938.3 | 13.07.2000 | [2001/03] | Priority number, date | JP19990199467 | 13.07.1999 Original published format: JP 19946799 | [2001/03] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1069448 | Date: | 17.01.2001 | Language: | EN | [2001/03] | Type: | B1 Patent specification | No.: | EP1069448 | Date: | 19.03.2003 | Language: | EN | [2003/12] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 03.11.2000 | Classification | IPC: | G02B17/08, G03F7/20 | [2001/03] | CPC: |
G02B17/0812 (EP,US);
G02B17/0892 (EP,US);
G03F7/70225 (EP,US);
G03F7/70275 (EP,US);
G03F7/70358 (EP,US)
| Designated contracting states | DE, NL [2001/40] |
| Former [2001/03] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System | [2001/03] | English: | Catadioptric optical system and projection exposure apparatus equipped with the same | [2001/03] | French: | Système optique catadioptrique et dispositif d'exposition par projection muni d'un tel système | [2001/03] | Examination procedure | 10.07.2001 | Examination requested [2001/36] | 12.07.2001 | Amendment by applicant (claims and/or description) | 18.07.2001 | Loss of particular rights, legal effect: designated state(s) | 09.11.2001 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, PT, SE | 21.02.2002 | Despatch of a communication from the examining division (Time limit: M04) | 03.07.2002 | Reply to a communication from the examining division | 07.08.2002 | Communication of intention to grant the patent | 13.12.2002 | Fee for grant paid | 13.12.2002 | Fee for publishing/printing paid | Divisional application(s) | EP03000101.0 / EP1318425 | Opposition(s) | 22.12.2003 | No opposition filed within time limit [2004/11] | Fees paid | Renewal fee | 12.07.2002 | Renewal fee patent year 03 | Penalty fee | Penalty fee Rule 85a EPC 1973 | 22.08.2001 | AT M01 Not yet paid | 22.08.2001 | BE M01 Not yet paid | 22.08.2001 | CH M01 Not yet paid | 22.08.2001 | CY M01 Not yet paid | 22.08.2001 | DK M01 Not yet paid | 22.08.2001 | ES M01 Not yet paid | 22.08.2001 | FI M01 Not yet paid | 22.08.2001 | FR M01 Not yet paid | 22.08.2001 | GB M01 Not yet paid | 22.08.2001 | GR M01 Not yet paid | 22.08.2001 | IE M01 Not yet paid | 22.08.2001 | IT M01 Not yet paid | 22.08.2001 | LU M01 Not yet paid | 22.08.2001 | MC M01 Not yet paid | 22.08.2001 | PT M01 Not yet paid | 22.08.2001 | SE M01 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XAY] US4685777 (HIROSE RYUSHO et al.) [X] 1,2,4,8,9,17 * column 1, line 8 - line 61 * * column 2, line 42 - column 4, line 60 * * abstract *[A] 7,14 [Y] 3,10,11,15,16 | [XAY] US4812028 (MATSUMOTO KOHICHI et al.) [X] 1,2,4,6-9,17 * column 3, line 11 - column 16, line 34 * * abstract *[A] 13,14 [Y] 3,10,11,15 | [XA] EP0779528 (SVG LITHOGRAPHY SYSTEMS INC et al.) [X] 1,2,4,5,7-9,17 * page 3, line 1 - page 9, line 37 * * abstract *[A] 12,14 | [XAY] US4293186 (OFFNER ABE et al.) [X] 1,2,4,6-9,17 * column 5, line 65 - column 19, line 32 * * abstract *[A] 13,14 [Y] 3,10,11,15,16 | [XY] US5734496 (BEACH ALLAN DAVID et al.) [X] 1,2,17 * column 5, line 14 - column 11, line 6 * * abstract *[Y] 3 | [XDA] US5717518 (SHAFER DAVID R et al.) [XD] 1,2,6,17 * abstract *[A] 13 | [YA] WO9532446 (ZEISS CARL et al.) [Y] 3,10 * page 8, line 22 - page 9, line 14 * * abstract *[A] 1,2,4,8-11,15-17 | [A] US5737137 (COHEN SIMON J et al.) [A] 1,4,11,17 * column 5, line 8 - line 18 * * abstract * | [XAY] OWEN G ET AL: "A CATADIOPTRIC REDUCTION CAMERA FOR DEEP UV MICROLITHOGRAPHY", MICROELECTRONIC ENGINEERING,NL,ELSEVIER PUBLISHERS BV., AMSTERDAM, vol. 11, no. 1 / 04, 1 April 1990 (1990-04-01), pages 219 - 222, XP000134590, ISSN: 0167-9317 [X] 1,2,17 * page 220, line 6 - page 222, line 12 * * abstract *[A] 5 [Y] 15 DOI: http://dx.doi.org/10.1016/0167-9317(90)90101-X | [A] HAGA T ET AL: "Large-field (@? 20 @? 25 mm) replication by EUV lithography", MICROELECTRONIC ENGINEERING,NL,ELSEVIER PUBLISHERS BV., AMSTERDAM, vol. 30, no. 1, 1996, pages 179 - 182, XP004003058, ISSN: 0167-9317 [A] 1,4-6,17 * page 179, column 2, line 8 - page 181, column 1, line 13 * * abstract * DOI: http://dx.doi.org/10.1016/0167-9317(95)00221-9 |