Extract from the Register of European Patents

EP About this file: EP1091252

EP1091252 - Lithographic method and apparatus [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  07.08.2009
Database last updated on 19.03.2026
Most recent event   Tooltip07.08.2009Application deemed to be withdrawnpublished on 09.09.2009  [2009/37]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2001/15]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / Finders, Jozef
Haag 4
5509 NJ Veldhoven / NL
02 / Baselmans, Johannes
De Kruik 1
5688 GG Oirschot / NL
03 / Flagello, Donis
8118 E. Juan Tabo Road
Schottsdale, AZ 85255 / US
04 / Bouchoms, Igor
Vestdijk 137c
5611 CB Eindhoven / NL
 [2001/15]
Representative(s)van den Hooven, Jan, et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/09]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2001/15]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5LX / GB
Application number, filing date00308528.928.09.2000
[2001/15]
Priority number, dateEP1999030768629.09.1999         Original published format: EP 99307686
EP1999020370407.11.1999         Original published format: EP 99203704
EP2000020018418.01.2000         Original published format: EP 00200184
[2001/15]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1091252
Date:11.04.2001
Language:EN
[2001/15]
Type: A3 Search report 
No.:EP1091252
Date:11.08.2004
[2004/33]
Search report(s)(Supplementary) European search report - dispatched on:EP29.06.2004
ClassificationIPC:G03F7/20
[2001/15]
CPC:
G03F7/70425 (EP); G03F1/70 (EP); G03F7/701 (EP);
G03F7/70125 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2005/18]
Former [2001/15]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:Apparat und Verfahren für Lithographie[2001/15]
English:Lithographic method and apparatus[2001/15]
French:Appareil et méthode pour lithographie[2001/15]
Examination procedure10.02.2005Examination requested  [2005/18]
27.10.2008Despatch of a communication from the examining division (Time limit: M04)
09.03.2009Application deemed to be withdrawn, date of legal effect  [2009/37]
16.04.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2009/37]
Fees paidRenewal fee
22.08.2002Renewal fee patent year 03
22.08.2003Renewal fee patent year 04
07.09.2004Renewal fee patent year 05
15.09.2005Renewal fee patent year 06
14.09.2006Renewal fee patent year 07
13.09.2007Renewal fee patent year 08
11.09.2008Renewal fee patent year 09
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Documents cited:Search[XY] EP0855623  (NIPPON KOGAKU KK et al.) [X] 1-4,6,7,9,10,17-19 * abstract * * figures 7,10,16,17 * * page 7, line 25 * * page 16, lines 3,4 * * page 18, lines 56-58 * * page 23, lines 20-25 * * page 23, line 51 - page 24, line 4 * * page 24, lines 21-23 *[Y] 5,11-13,15,20,21
 [XY] US5815247  (POSCHENRIEDER BERNHARD et al.) [X] 1,2,6,11,12 * abstract * * claim 6 * * column 4, lines 9-12 *[Y] 13
 [Y] WO9802784  (MICRON DISPLAY TECH INC et al.) [Y] 5,20 * claim 48 *
 [Y] EP0573281  (FUJITSU LTD et al.) [Y] 11-13 * page 22, lines 55-58 *
 [Y] US5851701  (ROLFSON BRETT J et al.) [Y] 15,21 * abstract * * column 1, lines 49-55 * * column 2, lines 23-32 *
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