-
EP1091249
European procedure
- EP About this file
- EP Legal status
- EP Federated register
- EP Event history
- EP Citations
- EP Patent family
- EP All documents
Extract from the Register of European Patents
EP About this file: EP1091249
| EP1091249 - Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 02.10.2009 Database last updated on 02.09.2024 | Most recent event Tooltip | 13.11.2009 | Change - representative | published on 16.12.2009 [2009/51] | Applicant(s) | For all designated states Shipley Company LLC 455 Forest Street Marlborough, MA 01752 / US | [2001/15] | Inventor(s) | 01 /
Barclay, George G. 1566 Main Street Jefferson, Massachusetts 01522 / US | 02 /
Mao, Zhibiao 56K Shrewsbury Green Drive Shrewsbury, Massachusetts 01545 / US | 03 /
Kavanagh, Robert J. 85 Putnam Avenue Cambridge, Massachusetts 02139 / US | [2001/15] | Representative(s) | Kent, Venetia Katherine Patent Outsourcing Limited 1 King Street Bakewell Derbyshire DE45 1DZ / GB | [N/P] |
| Former [2009/51] | Kent, Venetia Katherine Patent Outsourcing Limited 1 King Street Bakewell Derbyshire DE 45 1DZ / GB | ||
| Former [2001/15] | Kent, Venetia Katherine Rohm and Haas (UK) Ltd European Operations Patent Dept. Lennig House 2 Mason's Avenue Croydon, CR9 3NB / GB | Application number, filing date | 00308825.9 | 06.10.2000 | [2001/15] | Priority number, date | US19990413763 | 07.10.1999 Original published format: US 413763 | [2001/15] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1091249 | Date: | 11.04.2001 | Language: | EN | [2001/15] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 25.01.2001 | Classification | IPC: | G03F7/039, C07C69/54, C08F20/06, C08F20/44 | [2001/15] | CPC: |
G03F7/039 (EP,KR,US);
C08F220/18 (KR);
C07C69/54 (EP,US);
C08F220/1811 (EP,US);
C08F220/44 (EP,KR,US);
G03F7/004 (KR);
G03F7/0045 (EP,KR,US);
G03F7/0047 (KR);
C07C2602/42 (EP,KR,US);
| Designated contracting states | DE, FR, GB, IT, NL [2002/01] |
| Former [2001/15] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE | Title | German: | Nitrilgruppen und alizyklische Abgangsgruppen enthaltende Copolymere, und diese Copolymere enthaltende Photoresistzusammensetzungen | [2001/15] | English: | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | [2001/15] | French: | Copolymères contenant des groupes nitriles et des groupements partants alicycliques et compositions pour photoréserves comprenant ces copolymères | [2001/15] | Examination procedure | 20.10.2000 | Examination requested [2001/15] | 22.12.2003 | Despatch of a communication from the examining division (Time limit: M04) | 01.04.2004 | Reply to a communication from the examining division | 22.09.2005 | Despatch of a communication from the examining division (Time limit: M06) | 03.04.2006 | Reply to a communication from the examining division | 05.05.2009 | Application deemed to be withdrawn, date of legal effect [2009/45] | 09.06.2009 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2009/45] | Fees paid | Renewal fee | 21.10.2002 | Renewal fee patent year 03 | 23.10.2003 | Renewal fee patent year 04 | 25.10.2004 | Renewal fee patent year 05 | 27.10.2005 | Renewal fee patent year 06 | 27.10.2006 | Renewal fee patent year 07 | 29.10.2007 | Renewal fee patent year 08 | Penalty fee | Additional fee for renewal fee | 31.10.2008 | 09 M06 Not yet paid |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JPS5381114 (TOKYO SHIBAURA ELECTRIC CO) [X] 27,28,30 * page 69; example 18; table 1 *; | [A]EP0663616 (FUJITSU LTD [JP]) [A] 1-30* page 42, line 1 - line 10 *; | [A]DE19626003 (FUJITSU LTD [JP]) [A] 1-30 * page 72 - page 73; examples 79,80 *; | [PX]EP0982628 (SUMITOMO CHEMICAL CO [JP]) [PX] 1-30 * page 11, line 5 - line 20 * * page 12, line 35 - line 45 * * page 13, line 1 - line 15 * * page 14, line 1 - line 15 * * examples 2,5,7 *; | [PX]EP1004568 (SHINETSU CHEMICAL CO [JP]) [PX] 31 * page 32, monomer 15 *; | [X] - T. WALLOW ET AL., "New Approaches to Production-worthy 193 nm Photoresists based on Acrylic Copolymers", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, USA, (19980223), vol. 3333, no. 1, pages 579 - 586, XP002156905 [X] 1-5,7,12,13,15,21-28,30 * page 580, paragraph 3.3 * DOI: http://dx.doi.org/10.1117/12.312470 |