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Extract from the Register of European Patents

EP About this file: EP1180237

EP1180237 - OPTICAL INSPECTION OF SEMI-CONDUCTOR STRUCTURES [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  04.09.2015
Database last updated on 09.09.2024
Most recent event   Tooltip04.09.2015Application deemed to be withdrawnpublished on 07.10.2015  [2015/41]
Applicant(s)For all designated states
BELTRONICS, INC.
199 Wells Avenue
Newton, MA 02159 / US
[2002/08]
Inventor(s)01 / BISHOP, Robert
86 Deborah Road
Newton, MA 01259 / US
 [2002/08]
Representative(s)Warren, Anthony Robert, et al
Baron Warren Redfern Cambridge House 100 Cambridge Grove Hammersmith London
W6 0LE / GB
[N/P]
Former [2003/32]Warren, Anthony Robert, et al
BARON & WARREN, 19 South End, Kensington
London W8 5BU / GB
Former [2002/08]Allsop, John Rowland
McLeod Allsop, Bledington Grounds
Bledington, Glos 0X7 6XL / GB
Application number, filing date00911151.922.03.2000
[2002/08]
WO2000IB00334
Priority number, dateUS1999027534922.03.1999         Original published format: US 275349
[2002/08]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO0057162
Date:28.09.2000
Language:EN
[2000/39]
Type: A2 Application without search report 
No.:EP1180237
Date:20.02.2002
Language:EN
The application published by WIPO in one of the EPO official languages on 28.09.2000 takes the place of the publication of the European patent application.
[2002/08]
Search report(s)International search report - published on:EP04.01.2001
ClassificationIPC:G01N21/88, G01N21/64
[2002/08]
CPC:
G01N21/956 (EP,US); H01L22/00 (KR)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2002/08]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:OPTISCHE UNTERSUCHUNG VON HALBLEITER-STRUKTUREN[2014/52]
English:OPTICAL INSPECTION OF SEMI-CONDUCTOR STRUCTURES[2002/08]
French:INSPECTION OPTIQUE DE STRUCTURES DE SEMI-CONDUCTEURS[2014/52]
Former [2002/08]OPTISCHE UNTERSUCHUNG VON HALBLEITENDEN STRUKTUREN
Former [2002/08]STRUCTURES DE SEMI-CONDUCTEURS
Entry into regional phase05.12.2001National basic fee paid 
05.12.2001Designation fee(s) paid 
05.12.2001Examination fee paid 
Examination procedure09.10.2000Request for preliminary examination filed
International Preliminary Examining Authority: EP
05.12.2001Examination requested  [2002/08]
28.02.2007Despatch of a communication from the examining division (Time limit: M06)
04.09.2007Reply to a communication from the examining division
24.08.2011Despatch of a communication from the examining division (Time limit: M06)
28.02.2012Reply to a communication from the examining division
11.07.2014Despatch of a communication from the examining division (Time limit: M04)
06.11.2014Reply to a communication from the examining division
03.12.2014Communication of intention to grant the patent
14.04.2015Application deemed to be withdrawn, date of legal effect  [2015/41]
20.05.2015Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2015/41]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  28.02.2007
Fees paidRenewal fee
12.04.2002Renewal fee patent year 03
24.04.2003Renewal fee patent year 04
13.02.2004Renewal fee patent year 05
24.03.2005Renewal fee patent year 06
23.03.2006Renewal fee patent year 07
30.04.2007Renewal fee patent year 08
14.03.2008Renewal fee patent year 09
17.03.2009Renewal fee patent year 10
04.03.2010Renewal fee patent year 11
23.03.2011Renewal fee patent year 12
20.03.2012Renewal fee patent year 13
14.03.2013Renewal fee patent year 14
20.03.2014Renewal fee patent year 15
Penalty fee
Penalty fee Rule 85a EPC 1973
29.11.2001AT   M01   Fee paid on   05.12.2001
29.11.2001BE   M01   Fee paid on   05.12.2001
29.11.2001CH   M01   Fee paid on   05.12.2001
29.11.2001CY   M01   Fee paid on   05.12.2001
29.11.2001DE   M01   Fee paid on   05.12.2001
29.11.2001DK   M01   Fee paid on   05.12.2001
29.11.2001ES   M01   Fee paid on   05.12.2001
29.11.2001FI   M01   Fee paid on   05.12.2001
29.11.2001FR   M01   Fee paid on   05.12.2001
29.11.2001GB   M01   Fee paid on   05.12.2001
29.11.2001GR   M01   Fee paid on   05.12.2001
29.11.2001IE   M01   Fee paid on   05.12.2001
29.11.2001IT   M01   Fee paid on   05.12.2001
29.11.2001LU   M01   Fee paid on   05.12.2001
29.11.2001MC   M01   Fee paid on   05.12.2001
29.11.2001NL   M01   Fee paid on   05.12.2001
29.11.2001PT   M01   Fee paid on   05.12.2001
29.11.2001SE   M01   Fee paid on   05.12.2001
Penalty fee Rule 85b EPC 1973
29.11.2001M01   Fee paid on   05.12.2001
Additional fee for renewal fee
02.04.200203   M06   Fee paid on   12.04.2002
31.03.200304   M06   Fee paid on   24.04.2003
31.03.200708   M06   Fee paid on   30.04.2007
31.03.201516   M06   Not yet paid
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Licence(s)ID:01 01/exclusive
For:AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE
Licencee:TORAY ENGINEERING CO., LTD.
3-16, Nihonbashi-Hongokucho 3-chome, Chuo-ku
Tokyo / JP
Date:24.03.2010
[2010/33]
Cited inInternational search[XY]US4816686  (HARA YASUHIKO [JP], et al) [X] 1-3,6-8,11,15,18-20 * column 1, line 9 - line 13 * * column 2, line 44 - line 57 * * column 7, line 39 - column 8, line 4 * * column 8, line 66 - column 9, line 2 * * column 10, line 21 - line 33 * * column 10 * [Y] 4,5,9,10,12,13,16,17;
 [Y]US4877326  (CHADWICK CURT H [US], et al) [Y] 4,9,13,16 * column 1, line 30 - line 44 * * column 21, line 22 - line 60 *;
 [Y]WO9906823  (KLA TENCOR CORP [US], et al) [Y] 5,10,12,17 * page 1, line 4 - line 15 * * page 8, line 1 - line 20 ** figure 1 *;
 [XP]US6014209  (BISHOP ROBERT [US]) [XP] 11,14,15 * column 3, line 44 - line 47 * * column 4, line 7 - line 31 * * column 4, line 64 - column 5, line 5 *
ExaminationUS4152723
 US4556903
 US5278012
by applicantUS4152723
 US4556903
 US4816686
 US4877326
 US5278021
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.