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Extract from the Register of European Patents

EP About this file: EP1228401

EP1228401 - STEP AND FLASH IMPRINT LITHOGRAPHY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  16.06.2006
Database last updated on 14.09.2024
Most recent event   Tooltip05.12.2008Lapse of the patent in a contracting state
New state(s): CY
published on 07.01.2009  [2009/02]
Applicant(s)For all designated states
Board of Regents, The University of Texas System
201 West 7th Street
Austin, TX 78701 / US
[N/P]
Former [2002/32]For all designated states
Board of Regents, The University of Texas System
201 West 7th Street
Austin Texas 78701 / US
Inventor(s)01 / WILLSON, Carlton, Grant
4 Downie Place
Austin, TX 78746 / US
02 / COLBURN, Matthew, Earl
808 Sweetbriar Court
Waukesha, WI 53186 / US
 [2002/32]
Representative(s)HGF
1 City Walk
Leeds LS11 9DX / GB
[N/P]
Former [2002/32]Harrison Goddard Foote
Belgrave Hall Belgrave Street
Leeds LS2 8DD / GB
Application number, filing date00913745.603.03.2000
[2002/32]
WO2000US05751
Priority number, dateUS1999026666311.03.1999         Original published format: US 266663
[2002/32]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0054107
Date:14.09.2000
Language:EN
[2000/37]
Type: A1 Application with search report 
No.:EP1228401
Date:07.08.2002
Language:EN
The application published by WIPO in one of the EPO official languages on 14.09.2000 takes the place of the publication of the European patent application.
[2002/32]
Type: B1 Patent specification 
No.:EP1228401
Date:10.08.2005
Language:EN
[2005/32]
Search report(s)International search report - published on:EP14.09.2000
ClassificationIPC:G03F7/00
[2002/32]
CPC:
B82Y10/00 (EP,US); B29C43/003 (EP,US); B29C43/021 (EP,US);
B82Y40/00 (EP,US); G03F7/0002 (EP,US); B29C2043/025 (EP,US);
H05K3/061 (EP,US); Y10S977/887 (EP,US); Y10S977/897 (EP,US) (-)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE [2002/32]
TitleGerman:PRÄGEFORM-LITHOGRAPHIE[2002/32]
English:STEP AND FLASH IMPRINT LITHOGRAPHY[2002/32]
French:LITHOGRAVURE EN PHOTOREPETITION[2002/32]
Entry into regional phase16.08.2001National basic fee paid 
16.08.2001Designation fee(s) paid 
16.08.2001Examination fee paid 
Examination procedure16.08.2000Request for preliminary examination filed
International Preliminary Examining Authority: EP
16.08.2001Examination requested  [2002/32]
11.02.2005Communication of intention to grant the patent
08.06.2005Fee for grant paid
08.06.2005Fee for publishing/printing paid
Opposition(s)11.05.2006No opposition filed within time limit [2006/29]
Fees paidRenewal fee
29.03.2002Renewal fee patent year 03
11.03.2003Renewal fee patent year 04
15.03.2004Renewal fee patent year 05
14.03.2005Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT10.08.2005
CH10.08.2005
CY10.08.2005
FI10.08.2005
IT10.08.2005
LI10.08.2005
DK10.11.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
LU31.03.2006
MC31.03.2006
[2009/02]
Former [2007/35]AT10.08.2005
CH10.08.2005
FI10.08.2005
IT10.08.2005
LI10.08.2005
DK10.11.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
LU31.03.2006
MC31.03.2006
Former [2007/08]AT10.08.2005
CH10.08.2005
FI10.08.2005
LI10.08.2005
DK10.11.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
LU31.03.2006
MC31.03.2006
Former [2006/46]AT10.08.2005
CH10.08.2005
FI10.08.2005
LI10.08.2005
DK10.11.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
MC31.03.2006
Former [2006/26]AT10.08.2005
CH10.08.2005
FI10.08.2005
LI10.08.2005
DK10.11.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
Former [2006/25]AT10.08.2005
CH10.08.2005
FI10.08.2005
LI10.08.2005
GR10.11.2005
ES21.11.2005
PT10.01.2006
Former [2006/14]AT10.08.2005
CH10.08.2005
FI10.08.2005
LI10.08.2005
GR10.11.2005
ES21.11.2005
Former [2006/13]AT10.08.2005
FI10.08.2005
Cited inInternational search[Y]JPH01196749  ;
 [A]DE2800476  (INSTRUMENTS SA);
 [A]EP0244884  (PHILIPS NV [NL]) [A] 10-12 * the whole document *;
 [Y]US4731155  (NAPOLI LOUIS S [US], et al) [Y] 1-17 * column 3, line 13 - column 4, line 24 *;
 [Y]US5126006  (CRONIN JOHN E [US], et al) [Y] 1-17 * figures 18-26 *;
 [Y]  - HAISMA J ET AL, "MOLD-ASSISTED NANOLITHOGRAPHY: A PROCESS FOR RELIABLE PATTERN REPLICATION", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B,US,AMERICAN INSTITUTE OF PHYSICS. NEW YORK, (19961101), vol. 14, no. 6, ISSN 0734-211X, pages 4124 - 4128, XP000721137 [Y] 1-17 * the whole document *

DOI:   http://dx.doi.org/10.1116/1.588604
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19891109), vol. 013, no. 495, Database accession no. (P - 956), & JP01196749 A 19890808 (HOYA CORP) [Y] 1-17 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.