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Extract from the Register of European Patents

EP About this file: EP1107293

EP1107293 - X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE [Right-click to bookmark this link]
Status	The application has been withdrawn Status updated on 29.12.2006 Database last updated on 12.07.2024
Most recent event Tooltip	25.07.2008	Change - representative	published on 27.08.2008 [2008/35]
Applicant(s)	For all designated states MITSUBISHI DENKI KABUSHIKI KAISHA 7-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8310 / JP
	For all designated states CANON KABUSHIKI KAISHA 30-2, Shimomaruko 3-chome Ohta-ku Tokyo 146-8501 / JP
	[N/P]
Former [2006/18]	For all designated states MITSUBISHI DENKI KABUSHIKI KAISHA 7-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8310 / JP
	For all designated states CANON KABUSHIKI KAISHA 30-2, Shimomaruko 3-chome Ohta-ku Tokyo 146-8501 / JP
Former [2001/24]	For all designated states MITSUBISHI DENKI KABUSHIKI KAISHA 2-3, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8310 / JP
	For all designated states CANON KABUSHIKI KAISHA 30-2, Shimomaruko 3-chome Ohta-ku Tokyo 146-8501 / JP
Inventor(s)	01 / ITOGA, Kenji, Mitsubishi Denki Kabushiki Kaisha 2-3, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-8310 / JP
	02 / KITAYAMA, Toyoki, Mitsubishi Denki Kab. Kaisha 2-3, Marunouchi 2-chome, Chiyoda-ku Tokyo 100-8310 / JP
	03 / WATANABE, Yutaka, Canon Kabushiki Kaisha 30-2, Shimomaruko 3-chome, Ohta-ku Tokyo 146-8501 / JP
	04 / UZAWA, Shunichi, Canon Kabushiki Kaisha 30-2, Shimomaruko 3-chome, Ohta-ku Tokyo 146-8501 / JP
	[2001/24]
Representative(s)	Hofer, Dorothea, et al Prüfer & Partner GbR Patentanwälte Sohnckestrasse 12 81479 München / DE
	[N/P]
Former [2008/35]	Hofer, Dorothea, et al Prüfer & Partner GbR Patentanwälte Sohnckestrasse 12 81479 München / DE
Former [2006/14]	Hofer, Dorothea, et al Prüfer & Partner GbR Patentanwälte Harthauser Strasse 25 d 81545 München / DE
Former [2001/24]	Prüfer, Lutz H., Dipl.-Phys., et al PRÜFER & PARTNER, Patentanwälte, Harthauser Strasse 25d 81545 München / DE
Application number, filing date	00929857.1	24.05.2000
	[2001/24]
	WO2000JP03337
Priority number, date	JP19990149621	28.05.1999 Original published format: JP 14962199
	[2001/24]
Filing language	JA
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO0074119
	Date:	07.12.2000
	Language:	EN
	[2000/49]
	Type:	A1 Application with search report
	No.:	EP1107293
	Date:	13.06.2001
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 07.12.2000 takes the place of the publication of the European patent application.
	[2001/24]
Search report(s)	International search report - published on:	JP	07.12.2000
	(Supplementary) European search report - dispatched on:	EP	12.10.2001
Classification	IPC:	H01L21/027, H05H13/04, G21K1/06	[2001/47]
	CPC:	G03F7/70008 (EP,US); H01L21/027 (KR); G03F7/708 (EP,US); G21K1/06 (EP,US); G21K1/10 (EP,US); G21K5/04 (EP,US)
	Former IPC [2001/24]	H01L21/027, H05H13/04
Designated contracting states	DE, GB, NL [2004/20]
Former [2001/24]	AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE
Extension states	AL	Not yet paid
	LT	Not yet paid
	LV	Not yet paid
	MK	Not yet paid
	RO	Not yet paid
	SI	Not yet paid
Title	German:	RÖNTGEN BELICHTER METHODE MASKE SPIEGEL SYNCHROTON STRAHLER BESTRAHLUNGSMETHODE UND ALBLEITERANORDNUNG	[2001/24]
	English:	X-RAY EXPOSURE APPARATUS, X-RAY EXPOSING METHOD, X-RAY MASK, X-RAY MIRROR, SYNCHROTRON RADIATOR, SYNCHROTRON RADIATING METHOD, AND SEMICONDUCTOR DEVICE	[2001/24]
	French:	APPAREIL D'EXPOSITION AUX RAYONS X, PROCEDE D'EXPOSITION AUX RAYONS X, MASQUE A RAYONS X, APPAREIL A RAYONNEMENT SYNCHROTRON, PROCEDE DE RAYONNEMENT PAR SYNCHROTRON ET DISPOSITIF A SEMI-CONDUCTEUR	[2001/24]
Entry into regional phase	30.01.2001	Translation filed
	31.01.2001	National basic fee paid
	31.01.2001	Search fee paid
	31.01.2001	Designation fee(s) paid
	31.01.2001	Examination fee paid
Examination procedure	31.01.2001	Examination requested [2001/24]
	31.01.2001	Request for accelerated examination filed
	07.12.2001	Amendment by applicant (claims and/or description)
	02.08.2002	Despatch of a communication from the examining division (Time limit: M04)
	02.08.2002	Decision about request for accelerated examination - accepted: Yes
	05.12.2002	Reply to a communication from the examining division
	25.08.2006	Despatch of a communication from the examining division (Time limit: M04)
	21.12.2006	Application withdrawn by applicant [2007/05]
Fees paid	Renewal fee
	28.05.2002	Renewal fee patent year 03
	28.05.2003	Renewal fee patent year 04
	27.05.2004	Renewal fee patent year 05
	20.05.2005	Renewal fee patent year 06
	31.05.2006	Renewal fee patent year 07
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[A]GB2054195 (AGA AB) [A] 1,4,5,7,11,19,20,27,28,30,34 * the whole document *;
		[PA] - ZICHUN LE ET AL, "Theoretical calculations of a square multilayer Bragg-Fresnel lens by quantum theory", OPTICS AND LASER TECHNOLOGY, OCT. 1999, ELSEVIER, UK, vol. 31, no. 7, ISSN 0030-3992, pages 497 - 503, XP002178984 [PA] 1,2 * page 500, column R, paragraph 3 - page 501, column L, paragraph 1 * DOI: http://dx.doi.org/10.1016/S0030-3992(99)00104-8
	International search	[X]JPH1114800 (NIPPON TELEGRAPH & TELEPHONE);
		[X]EP0903638 (MICROPARTS GMBH [DE]);
		[Y]JPS5571311U
	Examination	- CERRINA F.; GUCKEL H.; WILEY J.D., "A synchrotron radiation x-ray lithography beam line of novel design", J.VAC.SCI.TECHNOL., (19850201), pages 227 - 231, XP002111158 DOI: http://dx.doi.org/10.1116/1.583233
		- BENNET H.E.; KHOUNSARY A.M., "Comparison of technology for high power laser mirrors and synchrotron radiation mirrors", ANNUAL MEETING OF SPIE, SAN DIEGO 11-16 JULY 1993, (19931101), XP009070784 DOI: http://dx.doi.org/10.1117/12.163826
		- TAKACS PETER Z.; FURENLID KAREN; FURENLID LARS, "Damage observations on synchrotron beam line mirrors", SPIE CONFERENCE ON OPTICAL SYSTEMS CONTAMINATION AND DEGRADATION; SAN DIEGO, JUL 20-23 1998
		- HENKE B.L.; GULLIKSON E.M.; DAVIS J.C., "X-RAY INTERACTIONS: PHOTOABSORPTION, SCATTERING, TRASMISSION, AND REFLECTION AT 3 = 50-30,000 EV,Z = 1-92", ATOMIC DATA AND NUCLEAR DATA TABLES, (19930701), vol. 54, pages 181 - 342, XP009069742
		- ELLIOT A., "The use of toroidal reflecting surfaces in x-ray diffraction cameras", J.SCI.INSTRUM., (1965), vol. 42, pages 312 - 316
		- JONES K.W. ET AL, "Fabrication of an 8:1 ellipsoidal mirror for a synchrotron x-ray microprobe", PROCEEDINGS OF THE SPIE, (1987), vol. 749, pages 37 - 44, XP009070763
		- ISHII M. ET AL, "The optically active center and its activation process in Er-doped Si thin film produced by laser ablation", J.APPL.PHYSICS, (19990415), vol. 85, pages 4024 - 4031

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