blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1206685

EP1206685 - REFLECTION MATERIAL MEASURE AND METHOD FOR PRODUCING A REFLECTION MATERIAL MEASURE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.04.2004
Database last updated on 11.09.2024
Most recent event   Tooltip02.04.2004No opposition filed within time limitpublished on 19.05.2004  [2004/21]
Applicant(s)For all designated states
Dr. Johannes Heidenhain GmbH
Postfach 12 60
83292 Traunreut / DE
[2002/21]
Inventor(s)01 / WEIDMANN, Josef
Kramerstrasse 10
D-83224 Grassau / DE
02 / SPECKBACHER, Peter
Blumenstrasse 3a
D-84558 Kirchweidach / DE
 [2002/21]
Application number, filing date00953051.015.07.2000
[2002/21]
WO2000EP06772
Priority number, dateDE199913702305.08.1999         Original published format: DE 19937023
[2002/21]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO0111320
Date:15.02.2001
Language:DE
[2001/07]
Type: A1 Application with search report 
No.:EP1206685
Date:22.05.2002
Language:DE
The application published by WIPO in one of the EPO official languages on 15.02.2001 takes the place of the publication of the European patent application.
[2002/21]
Type: B1 Patent specification 
No.:EP1206685
Date:28.05.2003
Language:DE
[2003/22]
Search report(s)International search report - published on:EP15.02.2001
ClassificationIPC:G01D5/347, G02B5/00
[2002/21]
CPC:
G01D5/34707 (EP,US); G01D5/347 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2004/20]
Former [2003/22]DE,  FR,  GB,  NL 
Former [2002/21]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
TitleGerman:REFLEXIONS-MASSVERKÖRPERUNG UND VERFAHREN ZUR HERSTELLUNG EINER RELEXIONS-MASSVERKÖRPERUNG[2002/21]
English:REFLECTION MATERIAL MEASURE AND METHOD FOR PRODUCING A REFLECTION MATERIAL MEASURE[2002/21]
French:MESURE MATERIALISEE A REFLEXION ET PROCEDE DE PRODUCTION D'UNE MESURE MATERIALISEE A REFLEXION[2002/21]
Entry into regional phase05.03.2002National basic fee paid 
05.03.2002Designation fee(s) paid 
05.03.2002Examination fee paid 
Examination procedure21.02.2001Request for preliminary examination filed
International Preliminary Examining Authority: EP
05.03.2002Examination requested  [2002/21]
16.10.2002Despatch of a communication from the examining division (Time limit: M04)
26.10.2002Reply to a communication from the examining division
06.12.2002Communication of intention to grant the patent
11.01.2003Fee for grant paid
11.01.2003Fee for publishing/printing paid
Opposition(s)02.03.2004No opposition filed within time limit [2004/21]
Fees paidRenewal fee
31.07.2002Renewal fee patent year 03
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[Y]GB2072850  (MITUTOYO MFG CO LTD) [Y] 1,10 * page 1, line 57 - line 86 *;
 [A]US4644156  (TAKAHASHI YOSHIHIRO [JP], et al) [A] 1,10 * claim 1 *;
 [A]EP0511597  (MEGAMATION INC [US]) [A] 1,10 * column 3, line 33 - line 52 *;
 [Y]DE4320728  (HEIDENHAIN GMBH DR JOHANNES [DE]) [Y] 1,10 * column 3, line 19 - line 27 *;
 [A]EP0849567  (HEIDENHAIN GMBH DR JOHANNES [DE]) [A] 1,10 * column 4, line 33 - line 52 *;
 [DA]  - ZUBEL I, "Silicon anisotropic etching in alkaline solutions. II. On the influence of anisotropy on the smoothness of etched surfaces", SENSORS AND ACTUATORS A,CH,ELSEVIER SEQUOIA S.A., LAUSANNE, (19981030), vol. 70, no. 3, ISSN 0924-4247, pages 260 - 268, XP004140059 [DA] 1-5,7,9-18 * column W *

DOI:   http://dx.doi.org/10.1016/S0924-4247(98)00142-3
 [A]  - ZUBEL I ET AL, "Silicon anisotropic etching in alkaline solutions. I. The geometric description of figures developed under etching Si(100) in various solutions", SENSORS AND ACTUATORS A,CH,ELSEVIER SEQUOIA S.A., LAUSANNE, (19981030), vol. 70, no. 3, ISSN 0924-4247, pages 250 - 259, XP004140058 [A] 1-5,7,9-18 * the whole document *

DOI:   http://dx.doi.org/10.1016/S0924-4247(98)00142-3
 [A]  - PETERSEN K E, "SILICON AS A MECHANICAL MATERIAL", PROCEEDINGS OF THE IEEE,US,IEEE. NEW YORK, (19820501), vol. 70, no. 5, ISSN 0018-9219, pages 420 - 457, XP000565139 [A] 1-5,7,9-18 * column W *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.