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Extract from the Register of European Patents

EP About this file: EP1147550

EP1147550 - METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE COMPRISING SiGe HBTs [Right-click to bookmark this link]
StatusThe application has been refused
Status updated on  24.04.2009
Database last updated on 29.03.2025
Most recent event   Tooltip24.04.2009Refusal of applicationpublished on 27.05.2009  [2009/22]
Applicant(s)For all designated states
NXP B.V.
High Tech Campus 60
5656 AG Eindhoven / NL
[2007/31]
Former [2001/43]For all designated states
Koninklijke Philips Electronics N.V.
Groenewoudseweg 1
5621 BA Eindhoven / NL
Inventor(s)01 / TERPSTRA, Doede
Prof. Holstlaan 6
NL-5656 AA Eindhoven / NL
02 / SLOTBOOM, Jan, W.
Prof. Holstlaan 6
NL-5656 AA Eindhoven / NL
03 / PONOMAREV, Youri
Prof. Holstlaan 6
NL-5656 AA Eindhoven / NL
04 / MAGNEE, Petrus, H., C.
Prof. Holstlaan 6
NL-5656 AA Eindhoven / NL
05 / VAN RIJS, Freerk
Prof. Holstlaan 6
NL-5656 AA Eindhoven / NL
 [2001/43]
Representative(s)Williamson, Paul Lewis, et al
NXP Semiconductors
Intellectual Property and Licensing
Red Central
60 High Street, Redhill
Surrey RH1 1NY / GB
[N/P]
Former [2009/09]Williamson, Paul Lewis, et al
NXP Semiconductors UK Ltd. Intellectual Property Department Betchworth House Station Road Redhill
Surrey RH1 1DL / GB
Former [2007/01]White, Andrew Gordon, et al
NXP Semiconductors Intellectual Property Department Cross Oak Lane
Redhill, Surrey RH1 5HA / GB
Former [2001/43]Duijvestijn, Adrianus Johannes
Internationaal Octrooibureau B.V., Prof. Holstlaan 6
5656 AA Eindhoven / NL
Application number, filing date00974472.326.10.2000
[2001/43]
WO2000EP10615
Priority number, dateEP1999020385018.11.1999         Original published format: EP 99203850
[2001/43]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO0137331
Date:25.05.2001
Language:EN
[2001/21]
Type: A1 Application with search report 
No.:EP1147550
Date:24.10.2001
Language:EN
The application published by WIPO in one of the EPO official languages on 25.05.2001 takes the place of the publication of the European patent application.
[2001/43]
Search report(s)International search report - published on:EP25.05.2001
ClassificationIPC:H01L21/331, H01L21/8224, H01L21/265, H01L29/737, H01L29/165
[2001/43]
CPC:
H10D10/021 (EP,US); H10D84/00 (KR); H10D84/0121 (EP,US);
H10D84/038 (EP,US); H10D84/673 (EP,US)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2004/20]
Former [2001/43]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:VERFAHREN ZUR HERSTELLUNG EINES HALBLEITERBAUELEMENTS MIT SIGE HBTS[2001/43]
English:METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE COMPRISING SiGe HBTs[2001/43]
French:PROCEDE DE FABRICATION D'UN DISPOSITIF SEMI-CONDUCTEUR COMPRENANT DES TRANSISTORS BIPOLAIRES A HETEROJONCTION EN SIGE[2001/43]
Entry into regional phase20.08.2001National basic fee paid 
26.11.2001Designation fee(s) paid 
26.11.2001Examination fee paid 
Examination procedure26.11.2001Examination requested  [2002/04]
04.08.2005Despatch of a communication from the examining division (Time limit: M04)
12.08.2005Reply to a communication from the examining division
18.12.2007Application refused, date of legal effect [2009/22]
18.12.2007Date of oral proceedings
10.01.2008Despatch of communication that the application is refused, reason: substantive examination [2009/22]
10.01.2008Minutes of oral proceedings despatched
Appeal following examination21.01.2008Appeal received No.  T0765/08
03.04.2008Statement of grounds filed
04.02.2009Result of appeal procedure: appeal of the applicant deemed not to be filed
Request for further processing for:An appeal is deemed not to have been filed
10.07.2008Request for further processing filed
10.07.2008Full payment received (date of receipt of payment)
Fees paidRenewal fee
31.10.2002Renewal fee patent year 03
31.10.2003Renewal fee patent year 04
02.11.2004Renewal fee patent year 05
31.10.2005Renewal fee patent year 06
31.10.2006Renewal fee patent year 07
31.10.2007Renewal fee patent year 08
31.10.2008Renewal fee patent year 09
Penalty fee
Additional fee for renewal fee
31.10.200405   M06   Not yet paid
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Cited inInternational search[A]JPH10135238  ;
 [A]US5696007  (RYUM BYUNG-RYUL [KR], et al);
 [A]US5834800  (JALALI-FARAHANI BAHRAM [US], et al);
 [A]US5846867  (GOMI TAKAYUKI [JP], et al);
 [PA]US6043552  (MIWA HIROYUKI [JP])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.