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EP1156531

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EP About this file: EP1156531

EP1156531 - METHOD FOR RECLAIMING A DELAMINATED WAFER [Right-click to bookmark this link]
Former [2001/47]	METHOD FOR RECYCLED SEPARATED WAFER AND RECYCLED SEPARATED WAFER
	[2014/17]
Status	No opposition filed within time limit Status updated on 21.08.2015 Database last updated on 24.04.2024
Most recent event Tooltip	23.10.2015	Lapse of the patent in a contracting state	published on 25.11.2015 [2015/48]
Applicant(s)	For all designated states Shin-Etsu Handotai Co., Ltd. 6-2, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP
	For all designated states Soitec Parc Technologique des Fontaines Chemin des Franques 38190 Bernin / FR
	[2014/42]
Former [2012/19]	For all designated states Shin-Etsu Handotai Co., Ltd. 6-2, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP
	For all designated states Soitec Parc Technologique des Fontaines Chemin des Franques 38190 Bernin / FR
Former [2009/17]	For all designated states Shin-Etsu Handotai Co., Ltd. 6-2, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP
	For all designated states S.O.I.Tec Silicon on Insulator Technologies Parc Technologique des Fontaines, Chemin des Franques 38190 Bernin / FR
Former [2001/47]	For all designated states SHIN-ETSU HANDOTAI COMPANY LIMITED 4-2, Marunouchi 1-Chome Chiyoda-ku Tokyo 100-0005 / JP
	For all designated states S.O.I.Tec Silicon on Insulator Technologies Parc Technologique des Fontaines, Chemin des Franques 38190 Bernin / FR
Inventor(s)	01 / Kuwabara, Susumu@Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	02 / Mitani, Kiyoshi@Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	03 / Tate, Naoto@Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	04 / Nakano, Masatake@Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	05 / Barge, [email protected] Silicon on Insulator Tech Parc Technologique des Fontaines 38190 Bernin / FR
	06 / Maleville, Christophe@SOITEC Silicon on Ins. Tech Parc Technologique des Fontaines 38190 Bernin / FR
	[2014/42]
Former [2001/47]	01 / Kuwabara, Susumu Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	02 / Mitani, Kiyoshi Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	03 / Tate, Naoto Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	04 / Nakano, Masatake Isobe R & D Center Shin-Etsu Handotai Co., Ltd. 13-1, Isobe 2-chome Annaka-shi, Gunma 379-0196 / JP
	05 / Barge, Thierry S.O.I.TEC Silicon on Insulator Tech Parc Technologique des Fontaines 38190 Bernin / FR
	06 / Maleville, Christophe SOITEC Silicon on Ins. Tech Parc Technologique des Fontaines 38190 Bernin / FR
Representative(s)	Wibbelmann, Jobst, et al Wuesthoff & Wuesthoff Patentanwälte und Rechtsanwalt PartG mbB Schweigerstrasse 2 81541 München / DE
	[N/P]
Former [2013/51]	Wibbelmann, Jobst, et al Wuesthoff & Wuesthoff Patent- und Rechtsanwälte Schweigerstrasse 2 81541 München / DE
Former [2009/48]	Cooper, John, et al Murgitroyd & Company 165-169 Scotland Street Glasgow G5 8PL / GB
Former [2001/47]	Cooper, John, et al Murgitroyd & Company Ltd., 373 Scotland Street Glasgow G5 8QA / GB
Application number, filing date	00977956.2	27.11.2000
	[2001/47]
	WO2000JP08344
Priority number, date	JP19990338137	29.11.1999 Original published format: JP 33813799
	[2001/47]
Filing language	JA
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO0141218
	Date:	07.06.2001
	Language:	EN
	[2001/23]
	Type:	A1 Application with search report
	No.:	EP1156531
	Date:	21.11.2001
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 07.06.2001 takes the place of the publication of the European patent application.
	[2001/47]
	Type:	B1 Patent specification
	No.:	EP1156531
	Date:	15.10.2014
	Language:	EN
	[2014/42]
Search report(s)	International search report - published on:	JP	07.06.2001
	(Supplementary) European search report - dispatched on:	EP	12.03.2007
Classification	IPC:	H01L21/762, // H01L21/66, H01L21/02	[2014/17]
	CPC:	H01L21/02032 (EP,US); H01L27/12 (KR); H01L21/76254 (EP,US); H01L21/84 (KR); H01L22/34 (EP,US); Y10S438/906 (EP,US); (+) Y10S438/974 (EP,US); Y10S438/977 (EP,US) (-)
	Former IPC [2007/15]	H01L21/762
	Former IPC [2001/47]	H01L27/12
Designated contracting states	DE, FR, GB [2004/22]
Former [2001/47]	AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR
Title	German:	VERFAHREN ZUR RÜCKGEWINNUNG EINES ABGETRENNTEN WAFER	[2014/17]
	English:	METHOD FOR RECLAIMING A DELAMINATED WAFER	[2014/17]
	French:	PROCEDE DE RECUPERATION D'UN SUBSTRAT DELAMINE	[2014/17]
	Former [2001/47]	WIEDERVERWERTUNG SEPARIERTER SCHEIBE UND WIEDERVERWERTBARE SEPARIERTE SCHEIBE
	Former [2001/47]	METHOD FOR RECYCLED SEPARATED WAFER AND RECYCLED SEPARATED WAFER
	Former [2001/47]	PROCEDE DE RECYCLAGE D'UNE PLAQUETTE SEPAREE ET PLAQUETTE SEPAREE RECYCLEE
Entry into regional phase	01.08.2001	Translation filed
	10.08.2001	National basic fee paid
	10.08.2001	Search fee paid
	10.08.2001	Designation fee(s) paid
	10.08.2001	Examination fee paid
Examination procedure	10.08.2001	Examination requested [2001/47]
	13.05.2008	Despatch of a communication from the examining division (Time limit: M04)
	04.09.2008	Reply to a communication from the examining division
	22.01.2014	Cancellation of oral proceeding that was planned for 29.01.2014
	29.01.2014	Date of oral proceedings (cancelled)
	26.05.2014	Communication of intention to grant the patent
	29.08.2014	Fee for grant paid
	29.08.2014	Fee for publishing/printing paid
	29.08.2014	Receipt of the translation of the claim(s)
Divisional application(s)	The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 13.05.2008
Opposition(s)	16.07.2015	No opposition filed within time limit [2015/39]
Fees paid	Renewal fee
	13.11.2002	Renewal fee patent year 03
	12.11.2003	Renewal fee patent year 04
	08.11.2004	Renewal fee patent year 05
	07.11.2005	Renewal fee patent year 06
	06.11.2006	Renewal fee patent year 07
	06.11.2007	Renewal fee patent year 08
	07.11.2008	Renewal fee patent year 09
	15.10.2009	Renewal fee patent year 10
	13.10.2010	Renewal fee patent year 11
	11.10.2011	Renewal fee patent year 12
	23.10.2012	Renewal fee patent year 13
	25.10.2013	Renewal fee patent year 14
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition Tooltip	GB	15.01.2015
	[2015/48]
Documents cited:	Search	[X]JPH11297583 (SHINETSU HANDOTAI KK, et al) [X] 1-5 * page 4, paragraph 19 - page 4, paragraph 24; figure 1 * * page 6, paragraph 42 - paragraph 48; figure 2 *;
		[A]EP0843344 (CANON KK [JP]) [A] 1-5 * abstract *;
		[A]JPH08339947 (HITACHI LTD, et al) [A] 2,3 * abstract *;
		[E]US6174222 (SATO TOMOMI [JP], et al) [E] 2,3 * abstract *;
		[A]JPH05226305 (HITACHI LTD) [A] 1-5
	International search	[X]JPH11297583 (SHINETSU HANDOTAI KK, et al);
		[Y]JPH0562951 (FUJITSU LTD);
		[Y]JPH11121310 (DENSO CORP);
		[Y]EP0843344 (CANON KK [JP])
	by applicant	JPH05211128

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