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EP1208594
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EP About this file: EP1208594
| EP1208594 - TRENCH-DIFFUSION CORNER ROUNDING IN A SHALLOW-TRENCH (STI) PROCESS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 24.03.2006 Database last updated on 19.10.2024 | Most recent event Tooltip | 23.11.2007 | Change - applicant | published on 26.12.2007 [2007/52] | Applicant(s) | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | For all designated states Philips Semiconductors Inc. 1251 Avenue of Americas New York, NY 10020 / US | [N/P] |
| Former [2007/52] | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | ||
| For all designated states Philips Semiconductors Inc. 1251 Avenue of Americas New York, NY 10020 / US | |||
| Former [2002/22] | For all designated states Koninklijke Philips Electronics N.V. Groenewoudseweg 1 5621 BA Eindhoven / NL | ||
| For:MC
Philips Semiconductors Inc. 1251 Avenue of Americas New York, NY 10020 / US | Inventor(s) | 01 /
OLSEN, Christopher, S. 6290 Lido Court Newark, CA 94560 / US | [2002/22] | Representative(s) | Duijvestijn, Adrianus Johannes Philips Intellectual Property & Standards High Tech Campus 5 5656 AE Eindhoven / NL | [N/P] |
| Former [2002/22] | Duijvestijn, Adrianus Johannes Internationaal Octrooibureau B.V., Prof. Holstlaan 6 5656 AA Eindhoven / NL | Application number, filing date | 00992860.7 | 06.12.2000 | [2002/22] | WO2000US42666 | Priority number, date | US19990465151 | 16.12.1999 Original published format: US 465151 | [2002/22] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | WO0147010 | Date: | 28.06.2001 | Language: | EN | [2001/26] | Type: | A2 Application without search report | No.: | EP1208594 | Date: | 29.05.2002 | Language: | EN | The application published by WIPO in one of the EPO official languages on 28.06.2001 takes the place of the publication of the European patent application. | [2002/22] | Search report(s) | International search report - published on: | EP | 21.03.2002 | Classification | IPC: | H01L21/762 | [2002/22] | CPC: |
H01L21/76235 (EP,US);
H01L21/76 (KR)
| Designated contracting states | DE, FR, GB [2004/22] |
| Former [2002/22] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | ECKENRUNDUNG EINER GRABENDIFFUSION IM HERSTELLUNGSPROZESS EINES FLACHEN GRABENS (STI) | [2002/22] | English: | TRENCH-DIFFUSION CORNER ROUNDING IN A SHALLOW-TRENCH (STI) PROCESS | [2002/22] | French: | ARRONDISSEMENT DES ANGLES POUR LA DIFFUSION EN TRANCHEE DANS UN PROCESSUS A TRANCHEE ETROITE | [2002/22] | Entry into regional phase | 17.09.2001 | National basic fee paid | 23.09.2002 | Designation fee(s) paid | 23.09.2002 | Examination fee paid | Examination procedure | 23.09.2002 | Examination requested [2002/47] | 24.06.2004 | Despatch of a communication from the examining division (Time limit: M04) | 23.08.2004 | Reply to a communication from the examining division | 20.06.2005 | Despatch of a communication from the examining division (Time limit: M04) | 01.11.2005 | Application deemed to be withdrawn, date of legal effect [2006/19] | 06.12.2005 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2006/19] | Fees paid | Renewal fee | 02.01.2003 | Renewal fee patent year 03 | 02.01.2004 | Renewal fee patent year 04 | 03.01.2005 | Renewal fee patent year 05 | 02.01.2006 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XY]US4735824 (YAMABE KIKUO [JP], et al) [X] 1,2,4 * abstract * * column 2, line 49 - column 3, line 15 * * column 5, line 56 - line 68 * * column 6, line 56 - column 7, line 52 * [Y] 3,5,6,8,9; | [Y]US5891809 (CHAU ROBERT S K [US], et al) [Y] 3 * abstract * * column 3, line 60 *; | [A]US5854505 (SUZUKI ATSUSHI [JP], et al) [A] 1,3,5,7 * abstract * * column 6, line 5 - line 14 * | [Y] - NANDAKUMAR M ET AL, "SHALLOW TRENCH ISOLATION FOR ADVANCED ULSI CMOS TECHNOLOGIES", INTERNATIONAL ELECTRON DEVICES MEETING 1998. IEDM TECHNICAL DIGEST. SAN FRANCISCO, CA, DEC. 6 - 9, 1998, NEW YORK, NY: IEEE, US, (19981206), ISBN 0-7803-4775-7, pages 133 - 136, XP000859338 [Y] 5,6,8,9 * page 133, column R, paragraph 3; figure 1 * | Examination | US5863827 |