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EP1168421
European procedure
Extract from the Register of European Patents
EP About this file: EP1168421
| EP1168421 - Liquid processing apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 31.12.2010 Database last updated on 30.10.2024 | Most recent event Tooltip | 31.12.2010 | No opposition filed within time limit | published on 02.02.2011 [2011/05] | Applicant(s) | For all designated states TOKYO ELECTRON LIMITED 3-1, Akasaka 5-chome Minato-ku Tokyo 107-6325 / JP | [N/P] |
| Former [2010/04] | For all designated states TOKYO ELECTRON LIMITED 3-1 Akasaka 5-chome Minato-ku Tokyo 107-6325 / JP | ||
| Former [2002/01] | For all designated states TOKYO ELECTRON LIMITED 3-6 Akasaka 5-chome Minato-ku, Tokyo 107-0052 / JP | Inventor(s) | 01 /
Kamikawa, Yuji c/o Tokyo Electron Kyushu Limited 1375-41, Nishishin-machi Tosu-city, Saga 841-0074 / JP | [2009/40] |
| Former [2002/01] | 01 /
Kamikawa, Yuji Tokyo Electron Kyushu Ltd 1375-41, Nishishin-machi Tosu-city, Saga 841-0074 / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2002/01] | HOFFMANN - EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 01114880.6 | 29.06.2001 | [2002/01] | Priority number, date | JP20000198645 | 30.06.2000 Original published format: JP 2000198645 | JP20000198646 | 30.06.2000 Original published format: JP 2000198646 | JP20000381717 | 15.12.2000 Original published format: JP 2000381717 | [2002/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1168421 | Date: | 02.01.2002 | Language: | EN | [2002/01] | Type: | A3 Search report | No.: | EP1168421 | Date: | 19.10.2005 | [2005/42] | Type: | B1 Patent specification | No.: | EP1168421 | Date: | 24.02.2010 | Language: | EN | [2010/08] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.09.2005 | Classification | IPC: | H01L21/00, H01L21/68 | [2005/42] | CPC: |
H01L21/67781 (EP,US);
H01L21/304 (KR);
H01L21/67051 (EP,US);
H01L21/67248 (EP,US);
H01L21/67303 (EP,US);
H01L21/67313 (EP,US);
H01L21/67745 (EP,US);
H01L21/67748 (EP,US);
H01L21/67751 (EP,US);
|
| Former IPC [2002/01] | H01L21/00 | Designated contracting states | AT, DE, FR [2006/26] |
| Former [2002/01] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Flüssigkeitsbehandlungsapparat | [2002/01] | English: | Liquid processing apparatus | [2002/01] | French: | Appareil pour traitement liquide | [2002/01] | Examination procedure | 19.12.2005 | Examination requested [2006/07] | 18.06.2007 | Despatch of a communication from the examining division (Time limit: M04) | 29.10.2007 | Reply to a communication from the examining division | 08.09.2009 | Communication of intention to grant the patent | 07.01.2010 | Fee for grant paid | 07.01.2010 | Fee for publishing/printing paid | Opposition(s) | 25.11.2010 | No opposition filed within time limit [2011/05] | Fees paid | Renewal fee | 23.06.2003 | Renewal fee patent year 03 | 25.06.2004 | Renewal fee patent year 04 | 29.06.2005 | Renewal fee patent year 05 | 28.06.2006 | Renewal fee patent year 06 | 26.06.2007 | Renewal fee patent year 07 | 26.03.2008 | Renewal fee patent year 08 | 25.06.2009 | Renewal fee patent year 09 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [PX]JP2001077075 ; | [A]US3889632 (BRUNNER ROLF H, et al) [A] 1-29 * abstract * * column 3, line 23 - column 4, line 45 *; | [A]US5055036 (ASANO TAKANOBU [JP], et al) [A] 1-29 * abstract * * page 3, column 4; figures 3,6a,6b *; | [A]US5547515 (KUDO HIDEO [JP], et al) [A] 1-29 * abstract *; | [A]EP0854499 (TOKYO ELECTRON LTD [JP]) [A] 1-29 * abstract * * column 10 - column 11 *; | [A]DE19853260 (TOKYO ELECTRON LTD [JP]) [A] 1-29 * abstract * * column 4, line 18 - column 6, line 24 * | [PX] - PATENT ABSTRACTS OF JAPAN, (20010710), vol. 2000, no. 20, & JP2001077075 A 20010323 (TOKYO ELECTRON LTD) [PX] 1,12,17 * abstract * | by applicant | US3889632 | US5055036 | US5547515 | EP0854499 | DE19853260 |