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EP1182273
European procedure
Extract from the Register of European Patents
EP About this file: EP1182273
| EP1182273 - Gas chemistry cycling to achieve high aspect ratio gapfill with hdp-cvd [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 16.10.2009 Database last updated on 10.07.2024 | Most recent event Tooltip | 03.12.2010 | Lapse of the patent in a contracting state New state(s): GB | published on 05.01.2011 [2011/01] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, CA 95054 / US | [N/P] |
| Former [2008/50] | For all designated states APPLIED MATERIALS, INC. 3050 Bowers Avenue Santa Clara, California 95054 / US | ||
| Former [2002/09] | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, California 95054 / US | Inventor(s) | 01 /
Kwan, Michael Chiu 307 Tadley Court Redwood City, CA 94061 / US | 02 /
Liu, Eric 665 Roble Avenue Apartment B Menlo Park, CA 94025 / US | [2002/09] | Representative(s) | Kirschner, Klaus Dieter, et al Puschmann Borchert Bardehle Patentanwälte Partnerschaft Postfach 10 12 31 80086 München / DE | [N/P] |
| Former [2008/28] | Kirschner, Klaus Dieter, et al Puschmann & Borchert Patentanwälte Bajuwarenring 21 82041 Oberhaching / DE | ||
| Former [2006/40] | Kirschner, Klaus Dieter, et al Kirschner Patentanwaltskanzlei Südliche Münchnerstrasse 53 82031 Grünwald / DE | ||
| Former [2002/09] | Kirschner, Klaus Dieter, Dipl.-Phys. Schneiders & Behrendt Rechtsanwälte - Patentanwälte Sollner Strasse 38 81479 München / DE | Application number, filing date | 01119361.2 | 10.08.2001 | [2002/09] | Priority number, date | US20000648395 | 24.08.2000 Original published format: US 648395 | [2002/09] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1182273 | Date: | 27.02.2002 | Language: | EN | [2002/09] | Type: | A3 Search report | No.: | EP1182273 | Date: | 07.01.2004 | [2004/02] | Type: | B1 Patent specification | No.: | EP1182273 | Date: | 10.12.2008 | Language: | EN | [2008/50] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 26.11.2003 | Classification | IPC: | C23C16/04, C23C16/40, C23C16/517, C23C16/52, H01J37/32, H01L21/316, C23C16/44, H01L21/768 | [2004/02] | CPC: |
C23C16/45523 (EP,KR,US);
C23C16/045 (EP,US);
C23C16/4405 (EP,KR,US);
C23C16/463 (EP,US);
C23C16/517 (EP,KR,US);
C23C16/52 (EP,KR,US);
H01J37/321 (EP,US);
H01J37/3244 (EP,US);
H01L21/02164 (EP,US);
H01L21/02274 (EP,KR,US);
H01L21/30655 (EP,US);
H01L21/31608 (US);
H01L21/31629 (US);
H01J2237/3327 (EP,US);
H01J2237/3347 (EP,US);
|
| Former IPC [2002/09] | C23C16/04, C23C16/40, C23C16/517, C23C16/52, H01J37/32, H01L21/316, C23C16/44 | Designated contracting states | BE, DE, GB, NL [2004/40] |
| Former [2002/09] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Zyklen der Gaszusammensetzung bei HDP-CVD zur Erhaltung der Lückenfüllung mit hohem Aspektverhältnis | [2002/09] | English: | Gas chemistry cycling to achieve high aspect ratio gapfill with hdp-cvd | [2002/09] | French: | Cyclage de la composition gazeuse d'un procédé HDP-CVD pour obtenir le remplissage de trou à rapport de forme élevé | [2002/09] | Examination procedure | 06.07.2004 | Examination requested [2004/37] | 24.07.2008 | Communication of intention to grant the patent | 23.10.2008 | Fee for grant paid | 23.10.2008 | Fee for publishing/printing paid | Opposition(s) | 11.09.2009 | No opposition filed within time limit [2009/47] | Fees paid | Renewal fee | 06.08.2003 | Renewal fee patent year 03 | 06.08.2004 | Renewal fee patent year 04 | 08.08.2005 | Renewal fee patent year 05 | 07.08.2006 | Renewal fee patent year 06 | 03.08.2007 | Renewal fee patent year 07 | 08.08.2008 | Renewal fee patent year 08 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | BE | 10.12.2008 | NL | 10.12.2008 | GB | 10.08.2009 | [2011/01] |
| Former [2009/32] | BE | 10.12.2008 | |
| NL | 10.12.2008 | ||
| Former [2009/26] | NL | 10.12.2008 | Documents cited: | Search | [X]JPH10340900 ; | [XY]EP0549994 (TEXAS INSTRUMENTS INC [US]) [X] 1 * page 4 * [Y] 8-10; | [X]GB2320133 (UNITED MICROELECTRONICS CORP [TW]) [X] 1,13 * abstract *; | [YA]US5776834 (AVANZINO STEVEN [US], et al) [Y] 8-10 * the whole document * [A] 1-13; | [A]US5908672 (RYU CHOON KUN [US], et al) [A] 1-13* the whole document *; | [A]US6037018 (JANG SYUN-MING [TW], et al) [A] 1-13 * the whole document *; | [X]US6093654 (KOYAMA KAZUHIDE [JP]) [X] 1 * claim 1 *; | [PX]US6268274 (WANG YING-LANG [TW], et al) [PX] 1,2,4,11,12 * the whole document * * claim 3 *; | [E]US2001030351 (WANG YING-LANG [TW], et al) [E] 1,2,4,11,12 * the whole document * | [X] - PATENT ABSTRACTS OF JAPAN, (19990331), vol. 1999, no. 03, & JP10340900 A 19981222 (APPLIED MATERIALS INC) [X] 14,15 * abstract * |