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Extract from the Register of European Patents

EP About this file: EP1118693

EP1118693 - Suspended gas distribution manifold for plasma chamber [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.11.2007
Database last updated on 05.10.2024
Most recent event   Tooltip04.04.2008Lapse of the patent in a contracting state
New state(s): GB
published on 07.05.2008  [2008/19]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [2007/01]For all designated states
APPLIED MATERIALS, INC.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Former [2001/30]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, California 95054 / US
Inventor(s)01 / White, John M.
2811 Colony View Place
Hayward, California 94541 / US
02 / Keller, Ernst
259 Leota Avenue
Sunnyville, California 94086 / US
03 / Blonigan, Wendell T.
32478 Monterey Drive
Union City, California 94587 / US
 [2001/30]
Representative(s)Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT
Verulam Gardens
70 Gray's Inn Road
London WC1X 8BT / GB
[N/P]
Former [2001/30]Bayliss, Geoffrey Cyril, et al
BOULT WADE TENNANT, Verulam Gardens 70 Gray's Inn Road
London WC1X 8BT / GB
Application number, filing date01300380.117.01.2001
[2001/30]
Priority number, dateUS2000048861220.01.2000         Original published format: US 488612
[2001/30]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1118693
Date:25.07.2001
Language:EN
[2001/30]
Type: A3 Search report 
No.:EP1118693
Date:17.10.2001
[2001/42]
Type: B1 Patent specification 
No.:EP1118693
Date:03.01.2007
Language:EN
[2007/01]
Search report(s)(Supplementary) European search report - dispatched on:EP31.08.2001
ClassificationIPC:C23C16/455, C23C16/509
[2001/30]
CPC:
C23C16/45565 (EP,KR,US); C23C16/455 (EP,US); C23C16/5096 (EP,KR,US);
H01J37/3244 (EP,KR,US); H01L21/67069 (KR); Y10T29/49428 (EP,US);
Y10T29/49826 (EP,US) (-)
Designated contracting statesBE,   DE,   FR,   GB,   NL [2002/27]
Former [2001/30]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Hängende Gasverteilungvorrichtung für Plasmakammer[2001/30]
English:Suspended gas distribution manifold for plasma chamber[2001/30]
French:Unité de distribution de gaz suspendue pour chambre à plasma[2001/30]
Examination procedure22.03.2002Examination requested  [2002/23]
10.07.2002Despatch of a communication from the examining division (Time limit: M04)
20.11.2002Reply to a communication from the examining division
17.05.2004Despatch of a communication from the examining division (Time limit: M06)
03.01.2005Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
25.02.2005Reply to a communication from the examining division
17.07.2006Communication of intention to grant the patent
13.11.2006Fee for grant paid
13.11.2006Fee for publishing/printing paid
Opposition(s)05.10.2007No opposition filed within time limit [2007/50]
Request for further processing for:25.02.2005Request for further processing filed
25.02.2005Full payment received (date of receipt of payment)
Request granted
15.03.2005Decision despatched
Fees paidRenewal fee
10.01.2003Renewal fee patent year 03
05.01.2004Renewal fee patent year 04
07.01.2005Renewal fee patent year 05
09.01.2006Renewal fee patent year 06
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipBE03.01.2007
GB03.04.2007
[2008/19]
Former [2008/01]BE03.01.2007
Documents cited:Search[A]WO9533866  (MATERIALS RESEARCH CORP [US], et al) [A] 1-35 * page 24, line 15 - page 25, line 15 * * page 33, lines 3-21; figures 2,2A *;
 [A]US5567243  (FOSTER ROBERT F [US], et al) [A] 1-35 * column 14, line 49 - column 17, line 47; figures 2,2A *;
 [A]US5647911  (VANELL JAMES [US], et al) [A] 28-35 * column 5, lines 40-65; figure 1 *;
 [A]EP0843348  (APPLIED MATERIALS INC [US]) [A] 28-35* page 17, line 44 - page 18, line 19; figure 5 *;
 [A]WO9925012  (TOKYO ELECTRON LTD [JP], et al) [A] 1-35 * page 9, line 4 - page 10, line 23; figure 1 *;
 [A]WO9925895  (SYMETRIX CORP [US]) [A] 1-35 * page 22, lines 3-16 * * page 23, lines 2-5 * * page 25, lines 1-17; figures 8-11 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.