EP1152288 - Method of designing and method of using a phase-shift mask [Right-click to bookmark this link] | |||
Former [2001/45] | Phase-shift mask | ||
[2004/49] | Status | No opposition filed within time limit Status updated on 09.06.2006 Database last updated on 19.10.2024 | Most recent event Tooltip | 09.06.2006 | No opposition filed within time limit | published on 12.07.2006 [2006/28] | Applicant(s) | For all designated states ASML MaskTools B.V. De Run 6501 5504 DR Veldhoven / NL | [2004/39] |
Former [2002/34] | For all designated states ASML Masktools B.V. De Run 1110 5503 LA Veldhoven / NL | ||
Former [2001/45] | For all designated states ASML Masktools Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Chen, Jang-Fung 11752 Pine Brook Lane Cupertino, California 95014 / US | 02 /
Petersen, John S. 8834 North Capital of Texas Highway Austin, Texas 78759 / US | [2001/45] | Representative(s) | Leeming, John Gerard J A Kemp 14 South Square Gray's Inn London WC1R 5JJ / GB | [N/P] |
Former [2001/45] | Leeming, John Gerard J.A. Kemp & Co., 14 South Square, Gray's Inn London WC1R 5JJ / GB | Application number, filing date | 01303850.0 | 27.04.2001 | [2001/45] | Priority number, date | US20000562445 | 01.05.2000 Original published format: US 562445 | [2001/45] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1152288 | Date: | 07.11.2001 | Language: | EN | [2001/45] | Type: | B1 Patent specification | No.: | EP1152288 | Date: | 03.08.2005 | Language: | EN | [2005/31] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 12.09.2001 | Classification | IPC: | G03F1/00, G03F1/14, G03F7/20 | [2001/45] | CPC: |
G03F1/32 (EP,US);
H01L21/027 (KR);
G03F1/26 (EP,US);
G03F7/70125 (EP,US);
G03F7/70283 (EP,US);
G03F7/70441 (EP,US);
Y10T428/24802 (EP,US)
(-)
| Designated contracting states | DE, FR, GB, IT, NL [2002/30] |
Former [2001/45] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Verfahren zum Entwurf und Verfahren zur Verwendung einer Phasenverschiebungsmaske | [2004/49] | English: | Method of designing and method of using a phase-shift mask | [2004/49] | French: | Méthode de conception et méthode d'utilisation d'un masque à décalage de phase | [2004/49] |
Former [2001/45] | Phasenverschiebungsmaske | ||
Former [2001/45] | Phase-shift mask | ||
Former [2001/45] | Masque à décalage de phase | Examination procedure | 22.10.2001 | Examination requested [2001/51] | 22.10.2001 | Request for accelerated examination filed | 21.11.2001 | Despatch of a communication from the examining division (Time limit: M04) | 21.11.2001 | Decision about request for accelerated examination - accepted: Yes | 28.03.2002 | Reply to a communication from the examining division | 10.06.2002 | Despatch of a communication from the examining division (Time limit: M06) | 19.12.2002 | Reply to a communication from the examining division | 08.10.2003 | Despatch of a communication from the examining division (Time limit: M06) | 01.03.2004 | Reply to a communication from the examining division | 07.12.2004 | Communication of intention to grant the patent | 27.05.2005 | Fee for grant paid | 27.05.2005 | Fee for publishing/printing paid | Opposition(s) | 04.05.2006 | No opposition filed within time limit [2006/28] | Fees paid | Renewal fee | 27.03.2003 | Renewal fee patent year 03 | 31.03.2004 | Renewal fee patent year 04 | 11.04.2005 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]WO9947981 (MICROUNITY SYSTEMS ENG [US]) [X] 1-12 * page 3, line 1 - line 15 * * page 7, line 6 - line 7 * * page 14, line 1 - line 3 * * page 15, line 1 - page 16, line 5 * * figures 1,10,11 *; | [DXA]WO9927420 (MICROUNITY SYSTEMS ENG [US]) [DX] 12 * abstract * [A] 1,2,5,6,10,11 |