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EP1172690
European procedure
Extract from the Register of European Patents
EP About this file: EP1172690
| EP1172690 - Photothermographic material and processing method thereof [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 21.07.2006 Database last updated on 08.10.2024 | Most recent event Tooltip | 28.11.2008 | Lapse of the patent in a contracting state New state(s): FR | published on 31.12.2008 [2009/01] | Applicant(s) | For all designated states KONICA CORPORATION 26-2 Nishishinjuku 1-chome, Shinjuku-ku Tokyo / JP | [N/P] |
| Former [2002/03] | For all designated states KONICA CORPORATION 26-2 Nishishinjuku 1-chome, Shinjuku-ku Tokyo / JP | Inventor(s) | 01 /
Goto, Narito c/o Konica Corporation, 1 Sakura-machi Hino-shi, Tokyo, 191-8511 / JP | [2002/03] | Representative(s) | Ellis-Jones, Patrick George Armine J.A. KEMP & CO. 14 South Square Gray's Inn London WC1R 5JJ / GB | [N/P] |
| Former [2002/03] | Ellis-Jones, Patrick George Armine J.A. KEMP & CO. 14 South Square Gray's Inn London WC1R 5JJ / GB | Application number, filing date | 01305981.1 | 11.07.2001 | [2002/03] | Priority number, date | JP20000211278 | 12.07.2000 Original published format: JP 2000211278 | [2002/03] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1172690 | Date: | 16.01.2002 | Language: | EN | [2002/03] | Type: | A3 Search report | No.: | EP1172690 | Date: | 07.05.2003 | [2003/19] | Type: | B1 Patent specification | No.: | EP1172690 | Date: | 14.09.2005 | Language: | EN | [2005/37] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 20.03.2003 | Classification | IPC: | G03C1/498 | [2002/03] | CPC: |
G03C1/49863 (EP,US);
G03C1/49872 (EP,US);
G03C1/04 (EP,US);
G03C1/061 (EP,US);
G03C1/32 (EP,US);
G03C1/49845 (EP,US);
| Designated contracting states | DE, FR, GB [2004/05] |
| Former [2002/03] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Photothermographisches Material und Verfahren zu seiner Verarbeitung | [2002/03] | English: | Photothermographic material and processing method thereof | [2002/03] | French: | Matériau photothermographique et procédé de traitement l'utilisant | [2002/03] | Examination procedure | 10.10.2003 | Examination requested [2003/50] | 25.11.2004 | Communication of intention to grant the patent | 11.05.2005 | Fee for grant paid | 11.05.2005 | Fee for publishing/printing paid | Opposition(s) | 15.06.2006 | No opposition filed within time limit [2006/34] | Fees paid | Renewal fee | 14.07.2003 | Renewal fee patent year 03 | 14.07.2004 | Renewal fee patent year 04 | 13.07.2005 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | FR | 14.09.2005 | DE | 15.12.2005 | [2009/01] |
| Former [2006/36] | DE | 15.12.2005 | Documents cited: | Search | [A]EP0810467 (AGFA GEVAERT NV [BE]) [A] 1-11 * page 2, line 5 - line 6 * * page 3, line 29 - line 40 * * examples 6-8 * * claims 6,10,11 *; | [A]JPH11327076 ; | [A]US6028029 (TAKEUCHI KOH [JP]) [A] 1-11 * column 1, line 6 - line 11 * * column 2, line 40 - line 67 * * column 5, line 32 - line 67 * * column 6, line 21 - line 42 * * column 7, line 12 - line 17 * * example 6 * * claim 1 * | [A] - DATABASE WPI, 1, Derwent World Patents Index, vol. 2000, no. 08, Database accession no. 2000-091107, XP002234189 & JPH11327076 A 19991126 (FUJI PHOTO FILM CO LTD) [A] 1-11 * abstract * |