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Extract from the Register of European Patents

EP About this file: EP1184727

EP1184727 - Lithographic apparatus [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  06.08.2010
Database last updated on 07.10.2024
Most recent event   Tooltip06.08.2010Application deemed to be withdrawnpublished on 08.09.2010  [2010/36]
Applicant(s)For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
[N/P]
Former [2004/39]For all designated states
ASML Netherlands B.V.
De Run 6501
5504 DR Veldhoven / NL
Former [2002/34]For all designated states
ASML Netherlands B.V.
De Run 1110
5503 LA Veldhoven / NL
Former [2002/10]For all designated states
ASM LITHOGRAPHY B.V.
De Run 1110
5503 LA Veldhoven / NL
Inventor(s)01 / van der Laan, Hans
Olmebeek 6
5501 CL Veldhoven / NL
02 / Dierichs, Marcel
Chirurgijnstraat 1
5914 WR Venlo / NL
03 / van Greevenbroek, Hendrikus Robertus Marie
Karel de Grote Laan 65
5615 SP Eindhoven / NL
04 / Eurlings, Markus Franciscus Antonius
Arenberglaan 159
4824 RK Breda / NL
 [2002/10]
Representative(s)van den Hooven, Jan, et al
ASML Netherlands B.V.
Corporate Intellectual Property
P.O. Box 324
5500 AH Veldhoven / NL
[N/P]
Former [2009/09]Van den Hooven, Jan, et al
ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324
5500 AH Veldhoven / NL
Former [2002/10]Leeming, John Gerard
J.A. Kemp & Co., 14 South Square, Gray's Inn
London WC1R 5JJ / GB
Application number, filing date01307429.931.08.2001
[2002/10]
Priority number, dateEP2000030755801.09.2000         Original published format: EP 00307558
[2002/10]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1184727
Date:06.03.2002
Language:EN
[2002/10]
Search report(s)(Supplementary) European search report - dispatched on:EP26.11.2001
ClassificationIPC:G03F7/20
[2002/10]
CPC:
G03F7/70133 (EP)
Designated contracting statesDE,   FR,   GB,   IT,   NL [2002/48]
Former [2002/10]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Lithographischer Apparat[2002/10]
English:Lithographic apparatus[2002/10]
French:Appareil lithographique[2002/10]
Examination procedure08.08.2002Examination requested  [2002/41]
04.10.2002Despatch of a communication from the examining division (Time limit: M06)
04.04.2003Reply to a communication from the examining division
02.03.2010Application deemed to be withdrawn, date of legal effect  [2010/36]
22.04.2010Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2010/36]
Fees paidRenewal fee
14.11.2003Renewal fee patent year 03
04.08.2004Renewal fee patent year 04
18.08.2005Renewal fee patent year 05
14.08.2006Renewal fee patent year 06
14.08.2007Renewal fee patent year 07
19.08.2008Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.08.200303   M06   Fee paid on   14.11.2003
31.08.200909   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]EP0689099  (CANON KK [JP]) [X] 1-23 * column 5, line 9 - column 6, line 6 * * column 9, line 42 - column 10, line 18 * * figures 1-3 *;
 [X]EP0526242  (CANON KK [JP]) [X] 1-23 * column 16, line 7 - line 29 * * figure 4 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.