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EP1197803
European procedure
Extract from the Register of European Patents
EP About this file: EP1197803
| EP1197803 - Lithographic apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 07.12.2012 Database last updated on 04.06.2024 | Most recent event Tooltip | 19.07.2013 | Lapse of the patent in a contracting state New state(s): GB | published on 21.08.2013 [2013/34] | Applicant(s) | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | [N/P] |
| Former [2004/39] | For all designated states ASML Netherlands B.V. De Run 6501 5504 DR Veldhoven / NL | ||
| Former [2002/34] | For all designated states ASML Netherlands B.V. De Run 1110 5503 LA Veldhoven / NL | ||
| Former [2002/16] | For all designated states ASM LITHOGRAPHY B.V. De Run 1110 5503 LA Veldhoven / NL | Inventor(s) | 01 /
Van Elp, Jan Hoverniersstraat 21 2613 RM Delft / NL | 02 /
Leenders, Martinus Hendrikus Antonius Stadhoudersplein 29b 3039 ER Rotterdam / NL | 03 /
Banine, Vadim Yevgenyevich Nierslaan 2 5704 NK Helmond / NL | 04 /
Visser, Hugo Matthieu Lange Lauwerstraat 52bis 3512 VK Utrecht / NL | 05 /
Bakker, Levinus Pieter Echternachlaan 13 5625 KA Eindhoven / NL | [2002/16] | Representative(s) | Slenders, Petrus Johannes Waltherus, et al ASML Netherlands B.V. Corporate Intellectual Property De Run 6501 P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/23] | Slenders, Petrus J. W., et al ASML Netherlands B.V Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2009/09] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2002/16] | Leeming, John Gerard J.A. Kemp & Co., 14 South Square, Gray's Inn London WC1R 5LX / GB | Application number, filing date | 01308572.5 | 08.10.2001 | [2002/16] | Priority number, date | EP20000308903 | 10.10.2000 Original published format: EP 00308903 | [2002/16] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1197803 | Date: | 17.04.2002 | Language: | EN | [2002/16] | Type: | A3 Search report | No.: | EP1197803 | Date: | 29.09.2004 | [2004/40] | Type: | B1 Patent specification | No.: | EP1197803 | Date: | 01.02.2012 | Language: | EN | [2012/05] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 18.08.2004 | Classification | IPC: | G03F7/20 | [2002/16] | CPC: |
G03F7/70575 (EP);
G03F7/70191 (EP);
G03F7/702 (EP)
| Designated contracting states | DE, FR, GB, IT, NL [2005/24] |
| Former [2002/16] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Title | German: | Lithographischer Apparat | [2002/16] | English: | Lithographic apparatus | [2002/16] | French: | Appareil lithographique | [2002/16] | Examination procedure | 10.03.2005 | Examination requested [2005/19] | 25.06.2009 | Despatch of a communication from the examining division (Time limit: M04) | 28.10.2009 | Reply to a communication from the examining division | 06.09.2011 | Cancellation of oral proceeding that was planned for 19.10.2011 | 19.09.2011 | Communication of intention to grant the patent | 19.10.2011 | Date of oral proceedings (cancelled) | 20.12.2011 | Fee for grant paid | 20.12.2011 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 25.06.2009 | Opposition(s) | 05.11.2012 | No opposition filed within time limit [2013/02] | Fees paid | Renewal fee | 14.11.2003 | Renewal fee patent year 03 | 07.10.2004 | Renewal fee patent year 04 | 25.10.2005 | Renewal fee patent year 05 | 13.10.2006 | Renewal fee patent year 06 | 16.10.2007 | Renewal fee patent year 07 | 14.10.2008 | Renewal fee patent year 08 | 27.10.2009 | Renewal fee patent year 09 | 25.10.2010 | Renewal fee patent year 10 | 20.10.2011 | Renewal fee patent year 11 | Penalty fee | Additional fee for renewal fee | 31.10.2003 | 03 M06 Fee paid on 14.11.2003 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 01.02.2012 | NL | 01.02.2012 | GB | 08.10.2012 | [2013/34] |
| Former [2012/50] | IT | 01.02.2012 | |
| NL | 01.02.2012 | ||
| Former [2012/35] | NL | 01.02.2012 | Documents cited: | Search | [XY]JPH07301696 ; | [X]JPH04248556 ; | [Y]EP0532236 (CANON KK [JP]) [Y] 10-12 * figure 5 * * column 1, lines 19-27 * * column 9, lines 57,58 * * column 11, lines 36-38 *; | [A]JPH11219891 | [XY] - PATENT ABSTRACTS OF JAPAN, (19960329), vol. 1996, no. 03, & JP07301696 A 19951114 (HITACHI LTD) [X] 1-4,6,7,13-21 * abstract * * figure 1 * * paragraphs [0002] , [0005] , [0014] , [0020] , [0025] , [0027] , [0034] * [Y] 10-12 | [X] - PATENT ABSTRACTS OF JAPAN, (19930118), vol. 017, no. 024, Database accession no. (P - 1471), & JP04248556 A 19920904 (NIPPON TELEGR & TELEPH CORP | [A] - KRASTEV K ET AL, "Spectral sampling of a soft X-ray tube emission by a lamellar multilayer grating in standard and conical mountings", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - A: ACCELERATORS, SPECTROMETERS, DETECTORS AND ASSOCIATED EQUIPMENT, NORTH-HOLLAND PUBLISHING COMPANY. AMSTERDAM, NL, (1996), vol. A368, no. 2, ISSN 0168-9002, pages 533 - 542, XP004000379 [A] 5 * Section 3.3 * DOI: http://dx.doi.org/10.1016/0168-9002(95)00729-6 | [A] - PATENT ABSTRACTS OF JAPAN, (19991130), vol. 1999, no. 13, & JP11219891 A 19990810 (HITACHI LTD) [A] 1-19 * abstract * | Examination | US5848119 | by applicant | US5296891 | US5523193 | US5229872 | US6046792 | US5969441 | WO9840791 | - W. PARTLO, I. FOMENKOV, R. OLIVER, D. BIN, "Development of an EUV (13.5 nm) Light Source Employing a Dense Plasma Focus in Lithium Vapor", PROC SPIE, (2000), vol. 3997, pages 136 - 156 | - M.W. MCGEOCH, "Power Scaling of a Z-pinch Extreme Ultraviolet Source", PROC SPIE, (2000), vol. 3997, pages 861 - 866 | - W.T. SILFVAST, M. KLOSNER, G. SHIMKAVEG, H. BENDER, G. KUBIAK, N. FOMACIARI, "High- power plasma discharge source at 13.5 and 11.4 nm for EUV lithography", PROC SPIE, (1999), vol. 3676, pages 272 - 275 | - FRANKE ET AL., J. VAC. SCI. TECHNOL., (1997), vol. 15, page 2940 |