Extract from the Register of European Patents

EP About this file: EP1243632

EP1243632 - Thermally curable coating composition [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  25.10.2002
Database last updated on 28.03.2026
Most recent event   Tooltip25.10.2002Withdrawal of applicationpublished on 11.12.2002  [2002/50]
Applicant(s)For all designated states
Ciba Specialty Chemicals Holding Inc.
Klybeckstrasse 141
4057 Basel / CH
[2002/39]
Inventor(s)01 / Valet, Andreas
Im Unterwörth 15
79589 Binzen / DE
 [2002/39]
Application number, filing date01810272.319.03.2001
[2002/39]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report 
No.:EP1243632
Date:25.09.2002
Language:DE
[2002/39]
Search report(s)(Supplementary) European search report - dispatched on:EP25.07.2001
ClassificationIPC:C09D201/00, C09D7/12, // C08K5/17
[2002/39]
CPC:
C08K5/3465 (EP); C09D201/00 (EP)
C-Set:
C09D201/00, C08L2666/28 (EP)
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   TR [2002/39]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:Thermisch härtbare Lackzusammensetzung[2002/39]
English:Thermally curable coating composition[2002/39]
French:Composition thermo-durcissables de peinture[2002/39]
Examination procedure14.10.2002Application withdrawn by applicant  [2002/50]
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Documents cited:Search[DA] WO9832756  (CIBA GEIGY AG et al.) [DA] 1 * claims 1,12,13,18,21-23 *
 [A] US5112890  (MALHERBE ROGER FRANCOIS DR et al.) [A] 1 * claim 1 *
 [DA]   MATUSZCZAK S ET AL: "PHOTOGENERATED AMINES AND THEIR USE IN THE DESIGN OF A POSITIVE-TONE RESIST MATERIAL BASED ON ELECTROPHILIC AROMATIC SUBSTITUTION", JOURNAL OF MATERIALS CHEMISTRY,CAMBRIDGE,GB, vol. 1, no. 6, 1991, pages 1045 - 1050, XP000989682 [DA] 1 * abstract *

DOI:   http://dx.doi.org/10.1039/jm9910101045
 [DA]   WINKLE M R ET AL: "ACID GARDENING POSITIVE PHOTORESIST USING PHOTOCHEMICAL GENERATION OF BASE", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY,JP,CHIBA, vol. 3, no. 3, 1990, pages 419 - 422, XP000195923, ISSN: 0914-9244 [DA] 1 * abstract *
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