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EP About this file: EP1207141

EP1207141 - SYNTHETIC QUARTZ GLASS MEMBER, PHOTOLITHOGRAPHY APPARATUS, AND METHOD FOR PRODUCING PHOTOLITHOGRAPHY APPARATUS [Right-click to bookmark this link]
Status	The application has been withdrawn Status updated on 14.10.2011 Database last updated on 06.07.2024
Most recent event Tooltip	14.10.2011	Withdrawal of application	published on 16.11.2011 [2011/46]
Applicant(s)	For all designated states NIKON CORPORATION 12-1, Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP
	[N/P]
Former [2010/30]	For all designated states NIKON CORPORATION 12-1, Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP
Former [2002/21]	For all designated states Nikon Corporation Fuji Building, 2-3 Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP
Inventor(s)	01 / YOSHIDA, Akiko, NIKON CORPORATION 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP
	02 / KOMINE, Norio, NIKON CORPORATION 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP
	03 / JINBO, Hiroki, NIKON CORPORATION 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8331 / JP
	[2002/21]
Representative(s)	Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE
	[N/P]
Former [2008/31]	HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE
Former [2002/21]	HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 D-81925 München / DE
Application number, filing date	01917545.4	28.03.2001
	[2002/21]
	WO2001JP02567
Priority number, date	JP20000089108	28.03.2000 Original published format: JP 2000089108
	[2002/21]
Filing language	JA
Procedural language	EN
Publication	Type:	A1 Application with search report
	No.:	WO0172649
	Date:	04.10.2001
	Language:	EN
	[2001/40]
	Type:	A1 Application with search report
	No.:	EP1207141
	Date:	22.05.2002
	Language:	EN
	The application published by WIPO in one of the EPO official languages on 04.10.2001 takes the place of the publication of the European patent application.
	[2002/21]
Search report(s)	International search report - published on:	JP	04.10.2001
	(Supplementary) European search report - dispatched on:	EP	19.05.2008
Classification	IPC:	C03C3/06, H01L21/027, G03F7/20, G02B1/00	[2002/21]
	CPC:	G03F7/70058 (EP,US); G03F7/70958 (EP,KR,US); C03C3/06 (EP,US); G03F7/70191 (KR); G03F7/70216 (EP,US); G03F7/70558 (KR); (+) G03F7/70566 (KR); G03F7/70891 (KR); C03C2201/21 (EP,US) (-)
Designated contracting states	DE, FR, GB, NL [2004/22]
Former [2002/21]	AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR
Title	German:	SYNTHETISCHES QUARZGLASSELEMENT, PHOTOLITHOGRAPHISCHER APPARAT UND VERFAHREN ZUR HERSTELLUNG DES PHOTOLITHOGRAPHISCHEN APPARATES.	[2002/21]
	English:	SYNTHETIC QUARTZ GLASS MEMBER, PHOTOLITHOGRAPHY APPARATUS, AND METHOD FOR PRODUCING PHOTOLITHOGRAPHY APPARATUS	[2002/21]
	French:	ELEMENT DE VERRE DE SILICE SYNTHETIQUE, APPAREIL DE PHOTOLITHOGRAPHIE, ET PROCEDE DE PRODUCTION D'UN APPAREIL DE PHOTOLITOGRAPHIE	[2002/21]
Entry into regional phase	28.12.2001	Translation filed
	28.12.2001	National basic fee paid
	28.12.2001	Search fee paid
	28.12.2001	Designation fee(s) paid
	28.12.2001	Examination fee paid
Examination procedure	28.12.2001	Examination requested [2002/21]
	13.07.2010	Despatch of a communication from the examining division (Time limit: M06)
	29.12.2010	Reply to a communication from the examining division
	05.10.2011	Application withdrawn by applicant [2011/46]
	10.11.2011	Date of oral proceedings
Divisional application(s)	The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 13.07.2010
Fees paid	Renewal fee
	27.03.2003	Renewal fee patent year 03
	22.03.2004	Renewal fee patent year 04
	23.03.2005	Renewal fee patent year 05
	14.03.2006	Renewal fee patent year 06
	26.03.2007	Renewal fee patent year 07
	13.03.2008	Renewal fee patent year 08
	30.03.2009	Renewal fee patent year 09
	16.03.2010	Renewal fee patent year 10
	25.03.2011	Renewal fee patent year 11
Opt-out from the exclusive Tooltip competence of the Unified Patent Court	See the Register of the Unified Patent Court for opt-out data
	Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:	Search	[X]US5719698 (HIRAIWA HIROYUKI [JP], et al) [X] 1-3 * column 13, line 35 - column 14, line 12 * * column 15, line 51 - column 16, line 14; table 2 *;
		[X]EP0835848 (NIPPON KOGAKU KK [JP]) [X] 1-3 * page 10 - page 13; examples 1-9; table 1 *;
		[X]EP0908716 (NIPPON KOGAKU KK [JP]) [X] 1-3 * paragraph [0020] - paragraph [0031]; figure 3 *;
		[X]EP0921104 (NIPPON KOGAKU KK [JP]) [X] 1-3 * paragraph [0037] - paragraph [0043] * * figure 1 *;
		[A]EP0943586 (NIPPON KOGAKU KK [JP]) [A] 1-3 * paragraph [0048] - paragraph [0072]; figures 3,4 *;
		[PX]EP1050754 (NIKON CORP [JP]) [PX] 1-3 * paragraph [0074] - paragraph [0090] *;
		[X] - ARAUJO ET AL, "Induced Absorption in Silica", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, (19980701), vol. 3424, ISSN 0277-786X, pages 2 - 9, XP002296330 [X] 1-3 * the whole document * DOI: http://dx.doi.org/10.1117/12.323748
		[PX] - SMITH C ET AL, "ADVANCED LITHOGRAPHY NEEDS RIGOROUSLY TESTED FUSED SILICA GLASS", SOLID STATE TECHNOLOGY, PENNWELL CORPORATION, TULSA, OK, US, (20010101), vol. 44, no. 1, ISSN 0038-111X, page 111,113/114,116, XP000976889 [PX] 1-3 * figure 2 *
	International search	[Y]EP0691312 (NIPPON KOGAKU KK [JP]);
		[Y]WO9852879 (HERAEUS QUARZGLAS [DE], et al);
		[YP]EP1001314 (NIKON CORP [JP]);
		[YP]JP3069562B
	Examination	- KHOTIMCHENKO V S ET AL, "Determining the content of hydrogen dissolved in quartz glass using the methods of Raman scattering and mass spectrometry", JOURNAL OF APPLIED SPECTROSCOPY, NEW YORK,NY, US, (19870601), vol. 46, no. 6, doi:10.1007/BF00661243, ISSN 0021-9037, pages 632 - 635, XP009149953 DOI: http://dx.doi.org/10.1007/BF00661243
	by applicant	US5719698
		EP0835848
		EP0921104

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