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Extract from the Register of European Patents

EP About this file: EP1277221

EP1277221 - ELECTRON/ION GUN FOR ELECTRON OR ION BEAMS WITH HIGH MONOCHROMASY OR HIGH CURRENT DENSITY [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.04.2005
Database last updated on 15.06.2024
Most recent event   Tooltip01.04.2005No opposition filed within time limitpublished on 18.05.2005  [2005/20]
Applicant(s)For all designated states
Ceos Corrected Electron Optical Systems GmbH
Englerstrasse 28
69126 Heidelberg / DE
[2003/04]
Inventor(s)01 / UHLEMANN, Stephan
Bahnhofstrasse 3
69115 Heidelberg / DE
02 / HAIDER, Maximilian
Pfarrgasse 20
69251 Gaiberg / DE
 [2003/04]
Representative(s)Pöhner, Wilfried Anton
Pöhner Scharfenberger & Partner
Kaiserstrasse 33
Postfach 6323
97013 Würzburg / DE
[N/P]
Former [2003/04]Pöhner, Wilfried Anton, Dr.
Postfach 63 23
97013 Würzburg / DE
Application number, filing date01919129.531.01.2001
[2003/04]
WO2001DE00409
Priority number, dateDE2000102038226.04.2000         Original published format: DE 10020382
[2003/04]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO0182330
Date:01.11.2001
Language:DE
[2001/44]
Type: A1 Application with search report 
No.:EP1277221
Date:22.01.2003
Language:DE
The application published by WIPO in one of the EPO official languages on 01.11.2001 takes the place of the publication of the European patent application.
[2003/04]
Type: B1 Patent specification 
No.:EP1277221
Date:26.05.2004
Language:DE
[2004/22]
Search report(s)International search report - published on:EP01.11.2001
ClassificationIPC:H01J37/05
[2003/04]
CPC:
H01J37/05 (EP,US); H01J49/46 (EP,US); H01J2237/2602 (EP,US);
H01J2237/2823 (EP,US)
Designated contracting statesDE,   GB,   NL [2004/22]
Former [2003/04]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:STRAHLERZEUGUNGSSYSTEM FÜR ELEKTRONEN ODER IONENSTRAHLEN HOHER MONOCHROMASIE ODER HOHER STROMDICHTE[2003/04]
English:ELECTRON/ION GUN FOR ELECTRON OR ION BEAMS WITH HIGH MONOCHROMASY OR HIGH CURRENT DENSITY[2003/04]
French:CANON ELECTRONIQUE POUR ELECTRONS OU FAISCEAUX IONIQUES DE HAUTE MONOCHROMIE OU DE HAUTE DENSITE DE COURANT[2003/04]
Entry into regional phase20.09.2002National basic fee paid 
20.09.2002Designation fee(s) paid 
20.09.2002Examination fee paid 
Examination procedure06.10.2001Request for preliminary examination filed
International Preliminary Examining Authority: EP
20.09.2002Examination requested  [2003/04]
30.10.2003Communication of intention to grant the patent
18.02.2004Fee for grant paid
18.02.2004Fee for publishing/printing paid
Opposition(s)01.03.2005No opposition filed within time limit [2005/20]
Fees paidRenewal fee
14.01.2003Renewal fee patent year 03
24.03.2004Renewal fee patent year 04
Penalty fee
Additional fee for renewal fee
31.01.200404   M06   Fee paid on   24.03.2004
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Cited inInternational search[Y]JPH11191384  ;
 US6140645  [ ] (TSUNO KATSUSHIGE [JP]) [ ] * column 4, line 44 - line 48 *;
 [Y]US2429558  (LADISLAUS MARTON) [Y] 1-3,8 * column 2, lines 4-17 *;
 [A]US4812652  (EGLE WILHELM [DE], et al) [A] 4 * column 5, line 11 - line 16; figure 1 *;
 [A]EP0883157  (SCHLUMBERGER TECHNOLOGIES INC [US]) [A] 6 * column 3, line 10 - column 4, line 37 *;
 [A]DE19633496  (CEOS CORRECTED ELECTRON OPTION [DE]) [A] 7 * abstract *;
 [A]US5359197  (KOMATSU FUMIO [JP], et al) [A] 5 * column 1, line 1 - line 5 *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (19991029), vol. 1999, no. 12, & JP11191384 A 19990713 (JEOL LTD) [Y] 1-3,8 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.