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Extract from the Register of European Patents

EP About this file: EP1319248

EP1319248 - CONTROL OF SEPARATION BETWEEN GATE AND STORAGE NODE IN VERTICAL DRAM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  10.08.2012
Database last updated on 07.10.2024
Most recent event   Tooltip10.08.2012Lapse of the patent in a contracting statepublished on 12.09.2012  [2012/37]
10.08.2012No opposition filed within time limitpublished on 12.09.2012  [2012/37]
Applicant(s)For all designated states
Infineon Technologies North America Corp.
1730 North First Street
San Jose, CA 95112-4508 / US
[2003/25]
Inventor(s)01 / SEITZ, Mihel
35 Mina Drive
Wappinger Falls, NY 12590 / US
02 / KNORR, Andreas
2607 Trailsie Drive
Austin TX 78704 / US
03 / MCSTAY, Irene
71 Saint Andrews Lane
Hopewell, NY 12533 / US
 [2003/36]
Former [2003/25]01 / SEITZ, Mihel
35 Mina Drive
Wappinger Falls, NY 12590 / US
02 / KNORR, Andreas
4B Locust Court
Fishkill, NY 12524 / US
03 / MCSTAY, Irene
71 Saint Andrews Lane
Hopewell, NY 12533 / US
Representative(s)Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH
Schlossschmidstrasse 5
80639 München / DE
[N/P]
Former [2011/40]Epping - Hermann - Fischer
Patentanwaltsgesellschaft mbH Ridlerstrasse 55
80339 München / DE
Former [2003/25]Epping Hermann & Fischer
Ridlerstrasse 55
80339 München / DE
Application number, filing date01966082.822.08.2001
[2003/25]
WO2001US26232
Priority number, dateUS2000066482519.09.2000         Original published format: US 664825
[2003/25]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO0225729
Date:28.03.2002
Language:EN
[2002/12]
Type: A2 Application without search report 
No.:EP1319248
Date:18.06.2003
Language:EN
The application published by WIPO in one of the EPO official languages on 28.03.2002 takes the place of the publication of the European patent application.
[2003/25]
Type: B1 Patent specification 
No.:EP1319248
Date:05.10.2011
Language:EN
[2011/40]
Search report(s)International search report - published on:EP06.02.2003
ClassificationIPC:H01L21/8242, H01L21/20
[2003/25]
CPC:
H10B12/0385 (EP,US); H10B12/00 (KR); H10B12/0383 (EP,US)
Designated contracting statesDE,   FR,   GB,   IE,   IT [2004/21]
Former [2003/25]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:KONTROLLE DES ABSTANDS ZWISCHEN GATE UND SPEICHERKNOTEN IN VERTIKALEM DRAM[2003/25]
English:CONTROL OF SEPARATION BETWEEN GATE AND STORAGE NODE IN VERTICAL DRAM[2003/25]
French:CONTROLE DE SEPARATION ENTRE LA PORTE DE TRANSFERT ET LE NOEUD DE STOCKAGE DANS LE DRAM VERTICAL[2003/25]
Entry into regional phase19.03.2003National basic fee paid 
19.03.2003Designation fee(s) paid 
19.03.2003Examination fee paid 
Examination procedure19.04.2002Request for preliminary examination filed
International Preliminary Examining Authority: EP
19.03.2003Examination requested  [2003/25]
08.04.2011Communication of intention to grant the patent
28.07.2011Fee for grant paid
28.07.2011Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.04.2011
Opposition(s)06.07.2012No opposition filed within time limit [2012/37]
Fees paidRenewal fee
25.08.2003Renewal fee patent year 03
23.08.2004Renewal fee patent year 04
19.08.2005Renewal fee patent year 05
29.08.2006Renewal fee patent year 06
16.08.2007Renewal fee patent year 07
12.08.2008Renewal fee patent year 08
19.02.2010Renewal fee patent year 09
26.08.2010Renewal fee patent year 10
20.08.2011Renewal fee patent year 11
Penalty fee
Additional fee for renewal fee
31.08.200909   M06   Fee paid on   19.02.2010
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT05.10.2011
[2012/37]
Cited inInternational search[A]US5451809  (SHIOZAWA JUN-ICHI [US], et al);
 [A]EP0715350  (TOSHIBA KK [JP]);
 [A]EP0720220  (SIEMENS AG [DE]);
 [A]US6063657  (BRONNER GARY B [US], et al);
 [A]WO0035006  (IBM [US], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.