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Extract from the Register of European Patents

EP About this file: EP1313896

EP1313896 - APPARATUS AND METHOD FOR FLOW OF PROCESS GAS IN AN ULTRA-CLEAN ENVIRONMENT [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  12.03.2010
Database last updated on 15.06.2024
Most recent event   Tooltip12.03.2010Application deemed to be withdrawnpublished on 14.04.2010  [2010/15]
Applicant(s)For all designated states
Texas Instruments Incorporated
P.O. Box 655474
Mail Station 3999
Dallas, Texas 75265 / US
[N/P]
Former [2007/06]For all designated states
TEXAS INSTRUMENTS INCORPORATED
P.O. Box 655474, Mail Station 3999
Dallas, Texas 75265 / US
Former [2003/22]For all designated states
Reflectivity Inc.
Suite 103, 3910 Freedom Circle
Santa Clara, CA 95054 / US
Inventor(s)01 / PATEL, Satyadev
Apt. 86, 5201 Laguna Oaks Drive
Elk Grove, CA 95758 / US
02 / SCHAADT, Gregory P.
1524 Bellomy Street
Santa Clara, CA 95050 / US
03 / MACDONALD, Douglas B.
204 Tait Avenue
Los Gatos, CA 95030 / US
04 / MACDONALD, Niles K.
2515 Appley Way
San Jose, CA 95124 / US
 [2003/22]
Representative(s)Prinz & Partner mbB
Patent- und Rechtsanwälte
Rundfunkplatz 2
80335 München / DE
[N/P]
Former [2009/02]Prinz & Partner
Patentanwälte Rundfunkplatz 2
80335 München / DE
Former [2007/06]Degwert, Hartmut, et al
Prinz & Partner GbR Rundfunkplatz 2
80335 München / DE
Former [2006/40]Kirschner, Klaus Dieter, et al
Kirschner Patentanwaltskanzlei Südliche Münchnerstrasse 53
82031 Grünwald / DE
Former [2003/22]Kirschner, Klaus Dieter, Dipl.-Phys.
Schneiders & Behrendt Rechtsanwälte - Patentanwälte Sollner Strasse 38
81479 München / DE
Application number, filing date01973670.128.08.2001
[2003/22]
WO2001US41913
Priority number, dateUS2000064956928.08.2000         Original published format: US 649569
[2003/22]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO0219391
Date:07.03.2002
Language:EN
[2002/10]
Type: A2 Application without search report 
No.:EP1313896
Date:28.05.2003
Language:EN
The application published by WIPO in one of the EPO official languages on 07.03.2002 takes the place of the publication of the European patent application.
[2003/22]
Search report(s)International search report - published on:US13.06.2002
(Supplementary) European search report - dispatched on:EP02.01.2006
ClassificationIPC:H01L21/00, C03C15/00
[2006/07]
CPC:
H01L21/67063 (EP); H01L21/3065 (KR); C23F1/08 (US);
B81C1/00587 (EP,US); B81C99/0025 (EP,US); B82Y30/00 (EP,US);
C03C15/00 (EP); H01L21/67017 (EP,US); B81C2201/0138 (EP,US);
C03C2218/33 (EP) (-)
Former IPC [2003/22]C25F3/12
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   TR [2003/22]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:VORRICHTUNG UND VERFAHREN FÜR DEN FLUSS VON PROZESSGAS IN EINER ULTRASAUBEREN UMGEBUNG[2003/22]
English:APPARATUS AND METHOD FOR FLOW OF PROCESS GAS IN AN ULTRA-CLEAN ENVIRONMENT[2003/22]
French:APPAREIL ET PROCEDE D'ECOULEMENT DE GAZ DE TRAITEMENT DANS UN ENVIRONNEMENT ULTRAPROPRE[2003/22]
Entry into regional phase24.03.2003National basic fee paid 
24.03.2003Search fee paid 
24.03.2003Designation fee(s) paid 
24.03.2003Examination fee paid 
Examination procedure26.03.2002Request for preliminary examination filed
International Preliminary Examining Authority: US
24.03.2003Examination requested  [2003/22]
05.06.2009Despatch of a communication from the examining division (Time limit: M04)
16.10.2009Application deemed to be withdrawn, date of legal effect  [2010/15]
24.11.2009Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2010/15]
Fees paidRenewal fee
01.09.2003Renewal fee patent year 03
31.08.2004Renewal fee patent year 04
25.08.2005Renewal fee patent year 05
28.07.2006Renewal fee patent year 06
24.08.2007Renewal fee patent year 07
28.08.2008Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.08.200909   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XA]US4431477  (ZAJAC JOHN [US]) [X] 1,9 * column 3, line 11 - column 3, line 64; figure 1 * [A] 2-8,10-14;
 [XA]JPS58145612  ;
 [XA]JPS52139372  ;
 [PX]WO0130715  (REFLECTIVITY INC [US], et al) [PX] 1-14 * page 9, line 1 - line 4; figure 1 *
 [XA]  - PATENT ABSTRACTS OF JAPAN, (19831124), vol. 007, no. 263, Database accession no. (C - 196), & JP58145612 A 19830830 (OLYMPUS KOGAKU KOGYO KK) [X] 1,9 * abstract * [A] 2-8,10-14
 [XA]  - PATENT ABSTRACTS OF JAPAN, (19780209), vol. 002, no. 020, Database accession no. (E - 012), & JP52139372 A 19771121 (HITACHI LTD) [X] 1,9 * abstract * [A] 2-8,10-14
International search[X]US5206471  (SMITH DONALD K [US]);
 [X]US5858065  (LI YAO-EN [US], et al);
 [X]JPH09251981  (TOSHIBA CORP);
 [Y]EP0878824  (SURFACE TECH SYS LTD [GB]);
 [A]US6022456  (MANNING THOMAS J [US]);
 [XE]US6277173  (SADAKATA TAKAYUKI [JP], et al);
 [YP]US6290864  (PATEL SATYADEV R [US], et al);
 [AE]US6328801  (GARY DANIEL [FR], et al);
 [AE]US6334928  (SEKINE MAKOTO [JP], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.