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Extract from the Register of European Patents

EP About this file: EP1363851

EP1363851 - MICROMACHINED COMPONENT AND METHOD OF MANUFACTURE [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  19.09.2008
Database last updated on 15.06.2024
Most recent event   Tooltip19.09.2008Application deemed to be withdrawnpublished on 22.10.2008  [2008/43]
Applicant(s)For all designated states
Freescale Semiconductor, Inc.
6501 William Cannon Drive West
Austin, TX 78735 / US
[N/P]
Former [2004/50]For all designated states
Freescale Semiconductor, Inc.
6501 William Cannon Drive West
Austin, Texas 78735 / US
Former [2003/48]For all designated states
MOTOROLA, INC.
1303 East Algonquin Road
Schaumburg, IL 60196 / US
Inventor(s)01 / GORRELL, Jonathan, F.
5314 East Sheridan Street
Phoenix, AZ 85008 / US
02 / NIELSEN, Gordana, S.
6602 North 36th Street
Phoenix, AZ 85018 / US
 [2003/48]
Representative(s)Wharmby, Martin Angus
Freescale Semiconductor Inc.
c/o Impetus IP Limited
Grove House
Lutyens Close
Basingstoke, Hampshire RG24 8AG / GB
[N/P]
Former [2004/27]Wharmby, Martin Angus
Freescale Semiconductor Inc. c/o Impetus IP Limited Grove House Lutyens Close
Basingstoke, Hampshire RG24 8AG / GB
Former [2003/48]Gibson, Sarah Jane, et al
Motorola European Intellectual Property Operations Midpoint Alencon Link
Basingstoke, Hampshire RG21 7PL / GB
Application number, filing date01977465.204.10.2001
[2003/48]
WO2001US31067
Priority number, dateUS2000068077706.10.2000         Original published format: US 680777
[2003/48]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO0230809
Date:18.04.2002
Language:EN
[2002/16]
Type: A2 Application without search report 
No.:EP1363851
Date:26.11.2003
Language:EN
The application published by WIPO in one of the EPO official languages on 18.04.2002 takes the place of the publication of the European patent application.
[2003/48]
Search report(s)International search report - published on:EP25.09.2003
ClassificationIPC:B81C1/00, B81B3/00
[2003/48]
CPC:
B81C1/00928 (EP,US)
Designated contracting statesDE,   FR,   GB [2004/22]
Former [2003/48]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:MIKROFABRIZIERTES BAUELEMENT UND DESSEN HERSTELLUNGSVERFAHREN[2003/48]
English:MICROMACHINED COMPONENT AND METHOD OF MANUFACTURE[2003/48]
French:COMPOSANT MICRO-USINE ET PROCEDE DE FABRICATION[2003/48]
Entry into regional phase06.05.2003National basic fee paid 
25.03.2004Designation fee(s) paid 
25.03.2004Examination fee paid 
Examination procedure04.04.2002Request for preliminary examination filed
International Preliminary Examining Authority: US
31.03.2003Amendment by applicant (claims and/or description)
25.03.2004Examination requested  [2004/22]
30.10.2006Despatch of a communication from the examining division (Time limit: M06)
26.04.2007Reply to a communication from the examining division
01.05.2008Application deemed to be withdrawn, date of legal effect  [2008/43]
06.06.2008Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2008/43]
Fees paidRenewal fee
06.10.2003Renewal fee patent year 03
06.10.2004Renewal fee patent year 04
07.10.2005Renewal fee patent year 05
05.10.2006Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.10.200707   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[YA]WO9500258  (UNIV CALIFORNIA [US]) [Y] 8-14 * figure 2 * * page 6, line 17 - page 8, line 16 * [A] 1-7,15-25;
 [A]DE19506404  (SIEMENS AG [DE]) [A] 1-25 * column 3, line 5 - column 4, line 32 *;
 [XAY]  - HOWE R T, "Applications of silicon micromachining to resonator fabrication", FREQUENCY CONTROL SYMPOSIUM, 1994. 48TH., PROCEEDINGS OF THE 1994 IEEE INTERNATIONAL BOSTON, MA, USA 1-3 JUNE 1994, NEW YORK, NY, USA,IEEE, (19940601), ISBN 0-7803-1945-1, pages 2 - 7, XP010137898 [X] 1,2,15 * figure 2 * * paragraph [SURFACE] * [A] 3-7,16-25 [Y] 8-14

DOI:   http://dx.doi.org/10.1109/FREQ.1994.398361
 [A]  - PAUL O ET AL, "Sacrificial aluminum etching for CMOS microstructures", MICRO ELECTRO MECHANICAL SYSTEMS, 1997. MEMS ' 97, PROCEEDINGS, IEEE., TENTH ANNUAL INTERNATIONAL WORKSHOP ON NAGOYA, JAPAN 26-30 JAN. 1997, NEW YORK, NY, USA,IEEE, US, (19970126), ISBN 0-7803-3744-1, pages 523 - 528, XP010216961 [A] 1-25 * paragraph [TECHNOLOGY] * * table I *

DOI:   http://dx.doi.org/10.1109/MEMSYS.1997.581918
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.