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EP1337700
European procedure
Extract from the Register of European Patents
EP About this file: EP1337700
| EP1337700 - CVD REACTOR COMPRISING A SUBSTRATE HOLDER ROTATABLY MOUNTED AND DRIVEN BY A GAS FLOW [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 30.06.2006 Database last updated on 30.07.2024 | Most recent event Tooltip | 30.06.2006 | No opposition filed within time limit | published on 02.08.2006 [2006/31] | Applicant(s) | For all designated states AIXTRON AG Kackertstrasse 15-17 52072 Aachen / DE | [N/P] |
| Former [2003/35] | For all designated states Aixtron AG Kackertstrasse 15-17 52072 Aachen / DE | Inventor(s) | 01 /
KÄPPELER, Johannes Zeisigweg 47 52146 Würselen / DE | 02 /
WISCHMEYER, Frank Am Rosenhügel 26 52072 Aachen / DE | 03 /
BERGE, Rune Scheelevägen 19F S-22370 Lund / SE | [2003/35] | Representative(s) | Grundmann, Dirk, et al Rieder & Partner mbB Patentanwälte - Rechtsanwalt Yale-Allee 26 42329 Wuppertal / DE | [N/P] |
| Former [2003/35] | Grundmann, Dirk, Dr., et al c/o Rieder & Partner, Corneliusstrasse 45 42329 Wuppertal / DE | Application number, filing date | 01978454.5 | 25.10.2001 | [2003/35] | WO2001EP12311 | Priority number, date | DE20001055182 | 08.11.2000 Original published format: DE 10055182 | [2003/35] | Filing language | DE | Procedural language | DE | Publication | Type: | A1 Application with search report | No.: | WO0238839 | Date: | 16.05.2002 | Language: | DE | [2002/20] | Type: | A1 Application with search report | No.: | EP1337700 | Date: | 27.08.2003 | Language: | DE | The application published by WIPO in one of the EPO official languages on 16.05.2002 takes the place of the publication of the European patent application. | [2003/35] | Type: | B1 Patent specification | No.: | EP1337700 | Date: | 24.08.2005 | Language: | DE | [2005/34] | Search report(s) | International search report - published on: | EP | 16.05.2002 | Classification | IPC: | C30B25/10, C30B25/14 | [2003/35] | CPC: |
C30B25/12 (EP,US);
C30B25/10 (KR);
C23C16/4584 (EP,US);
Y10S117/901 (EP,US)
| Designated contracting states | DE, FR, GB, NL, SE [2004/20] |
| Former [2003/35] | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | CVD-REAKTOR MIT VON EINEM GASSTROM DREHGELAGERTEN UND -ANGETRIEBENEN SUBSTRATHALTER | [2003/35] | English: | CVD REACTOR COMPRISING A SUBSTRATE HOLDER ROTATABLY MOUNTED AND DRIVEN BY A GAS FLOW | [2003/35] | French: | REACTEUR DE DEPOT CHIMIQUE EN PHASE VAPEUR COMPORTANT UN SUPPORT DE SUBSTRAT LOGE DE MANIERE ROTATIVE ET ENTRAINE PAR UN FLUX GAZEUX | [2003/35] | Entry into regional phase | 03.05.2003 | National basic fee paid | 03.05.2003 | Designation fee(s) paid | 03.05.2003 | Examination fee paid | Examination procedure | 23.04.2002 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 03.05.2003 | Examination requested [2003/35] | 10.10.2003 | Despatch of a communication from the examining division (Time limit: M04) | 29.01.2004 | Reply to a communication from the examining division | 19.10.2004 | Observations by third parties | 08.03.2005 | Communication of intention to grant the patent | 04.04.2005 | Fee for grant paid | 04.04.2005 | Fee for publishing/printing paid | Opposition(s) | 26.05.2006 | No opposition filed within time limit [2006/31] | Fees paid | Renewal fee | 02.10.2003 | Renewal fee patent year 03 | 06.10.2004 | Renewal fee patent year 04 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]WO8900212 (AIXTRON GMBH [DE]) [A] 1-9 * abstract *; | [A]WO0014310 (SIEMENS AG [DE], et al) [A] 1-9 * abstract *; | [A]WO9731134 (ABB RESEARCH LTD [CH], et al) [A] 1-9 * abstract *; | [A]EP0748881 (EBARA CORP [JP]) [A] 1-9 * the whole document *; | [A]WO8810324 (EPSILON TECHN INC [US]) [A] 1-9 * abstract *; | [A]WO9851844 (APPLIED MATERIALS INC [US]) [A] 1-9 * abstract * |