blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP1248225

EP1248225 - Pattern-collating device, pattern-collating method and pattern-collating program [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  21.03.2008
Database last updated on 03.10.2024
Most recent event   Tooltip02.05.2008Lapse of the patent in a contracting state
New state(s): IT
published on 04.06.2008  [2008/23]
Applicant(s)For all designated states
NEC Corporation
7-1, Shiba 5-chome Minato-ku
Tokyo 108-8001 / JP
[N/P]
Former [2007/20]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome, Minato-ku
Tokyo / JP
Former [2002/41]For all designated states
NEC CORPORATION
7-1, Shiba 5-chome, Minato-ku
Tokyo / JP
Inventor(s)01 / Monden, Akira
NEC Corporation, 7-1, Shiba 5-chome
Minato-ku, Tokyo / JP
 [2002/41]
Representative(s)Betten & Resch
Patent- und Rechtsanwälte PartGmbB
Maximiliansplatz 14
80333 München / DE
[N/P]
Former [2002/41]Betten & Resch
Patentanwälte, Theatinerstrasse 8
80333 München / DE
Application number, filing date02006178.419.03.2002
[2002/41]
Priority number, dateJP2001009224628.03.2001         Original published format: JP 2001092246
[2002/41]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1248225
Date:09.10.2002
Language:EN
[2002/41]
Type: A3 Search report 
No.:EP1248225
Date:07.09.2005
[2005/36]
Type: B1 Patent specification 
No.:EP1248225
Date:16.05.2007
Language:EN
[2007/20]
Search report(s)(Supplementary) European search report - dispatched on:EP26.07.2005
ClassificationIPC:G06K9/00
[2006/45]
CPC:
G06V40/1365 (EP,US); G06V10/40 (KR); G06V10/757 (EP,US)
Former IPC [2002/41]G06K9/62
Designated contracting statesDE,   FR,   GB,   IT,   NL,   SE [2006/21]
Former [2002/41]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Vorrichtung, Verfahren und Programm zum Vergleichen von Mustern[2002/41]
English:Pattern-collating device, pattern-collating method and pattern-collating program[2002/41]
French:Dispositif, procédé et logiciel pour la comparaison de modèles[2002/41]
Examination procedure02.12.2005Examination requested  [2006/05]
27.01.2006Despatch of a communication from the examining division (Time limit: M06)
28.07.2006Reply to a communication from the examining division
13.11.2006Communication of intention to grant the patent
08.03.2007Fee for grant paid
08.03.2007Fee for publishing/printing paid
Opposition(s)19.02.2008No opposition filed within time limit [2008/17]
Fees paidRenewal fee
31.03.2004Renewal fee patent year 03
31.03.2005Renewal fee patent year 04
30.03.2006Renewal fee patent year 05
29.03.2007Renewal fee patent year 06
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipIT16.05.2007
NL16.05.2007
SE16.08.2007
[2008/23]
Former [2008/09]NL16.05.2007
SE16.08.2007
Former [2007/48]SE16.08.2007
Documents cited:Search[A]EP0866424  (NEC CORP [JP]) [A] 1-13 * abstract * * column 4, line 37 - column 5, line 43 *;
 [A]US6185318  (JAIN ANIL K [US], et al) [A] 1-13 * abstract * * column 8, line 28 - line 62 *;
 [A]  - JAIN A ET AL, "ON-LINE FINGERPRINT VERIFICATION", IEEE TRANSACTIONS ON PATTERN ANALYSIS AND MACHINE INTELLIGENCE, IEEE INC. NEW YORK, US, (199704), vol. 19, no. 4, ISSN 0162-8828, pages 302 - 313, XP000690650 [A] 1-13 * paragraph [0003] *

DOI:   http://dx.doi.org/10.1109/34.587996
 [A]  - SHINKI UMEYAMA, "A POINT PATTERN MATCHING ALGORITHM", SYSTEMS & COMPUTERS IN JAPAN, SCRIPTA TECHNICA JOURNALS. NEW YORK, US, (19891001), vol. 20, no. 10, ISSN 0882-1666, pages 95 - 106, XP000128838 [A] 1-13 * the whole document *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.