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Extract from the Register of European Patents

EP About this file: EP1289019

EP1289019 - A method for creating an antiblooming structure in a charge coupled device [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  05.08.2005
Database last updated on 14.06.2024
Most recent event   Tooltip15.08.2008Change - applicantpublished on 17.09.2008  [2008/38]
Applicant(s)For all designated states
Eastman Kodak Company
343 State Street
Rochester, NY 14650-2201 / US
[N/P]
Former [2008/38]For all designated states
Eastman Kodak Company
343 State Street
Rochester NY 14650-2201 / US
Former [2003/10]For all designated states
EASTMAN KODAK COMPANY
343 State Street
Rochester, New York 14650 / US
Inventor(s)01 / Stevens, Eric Gordon
Eastman Kodak Company, PLS, 343 State Street
Rochester, New York 14650-2201 / US
 [2003/10]
Representative(s)Haile, Helen Cynthia, et al
Kodak Limited
Patent Department (W160-G)
Headstone Drive
Harrow, Middlesex
HA1 4TY / GB
[N/P]
Former [2003/10]Haile, Helen Cynthia, et al
Kodak Limited Patent, W92-3A, Headstone Drive
Harrow, Middlesex HA1 4TY / GB
Application number, filing date02078412.019.08.2002
[2003/10]
Priority number, dateUS2001094454831.08.2001         Original published format: US 944548
[2003/10]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1289019
Date:05.03.2003
Language:EN
[2003/10]
Type: A3 Search report 
No.:EP1289019
Date:19.05.2004
[2004/21]
Search report(s)(Supplementary) European search report - dispatched on:EP02.04.2004
ClassificationIPC:H01L27/148
[2003/10]
CPC:
H01L27/14887 (EP,US)
Designated contracting states(deleted) [2005/06]
Former [2003/10]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  SK,  TR 
TitleGerman:Verfahren zur Herstellung einer Überlaufstruktur in einer ladungsgekoppelten Vorrichtung[2003/10]
English:A method for creating an antiblooming structure in a charge coupled device[2003/10]
French:Procédé de fabrication d'une structure anti-éblouissement dans un dispositif à charges couplées[2003/10]
Examination procedure20.11.2004Application deemed to be withdrawn, date of legal effect  [2005/38]
01.04.2005Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time  [2005/38]
Fees paidRenewal fee
06.08.2004Renewal fee patent year 03
Penalty fee
Penalty fee Rule 85a EPC 1973
11.01.2005DE   M01   Not yet paid
11.01.2005FR   M01   Not yet paid
11.01.2005GB   M01   Not yet paid
Penalty fee Rule 85b EPC 1973
11.01.2005M01   Not yet paid
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Documents cited:Search[A]US5804465  (BANGHART EDMUND K [US], et al) [A] 1-4 * column 9, line 4 - column 10, line 20; figures 3,4 *;
 [A]JPS62298163  ;
 [A]US5585298  (STEVENS ERIC G [US], et al) [A] 1-4 * figures 1-8 *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19880607), vol. 012, no. 196, Database accession no. (E - 618), & JP62298163 A 19871225 (NEC CORP) [A] 1-4 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.