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Extract from the Register of European Patents

EP About this file: EP1253619

EP1253619 - Charged particle beam exposure apparatus and device manufacturing method using same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.08.2010
Database last updated on 02.07.2024
Most recent event   Tooltip25.03.2011Lapse of the patent in a contracting statepublished on 27.04.2011  [2011/17]
Applicant(s)For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
For all designated states
Hitachi, Ltd.
6, Kanda Surugadai 4-chome
Chiyoda-ku
Tokyo / JP
For all designated states
ADVANTEST CORPORATION
32-1, Asahi-cho 1-chome Nerima-Ku
Tokyo / JP
[N/P]
Former [2009/42]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
For all designated states
Hitachi Ltd.
6, Kanda Surugadai 4-chome, Chiyoda-ku
Tokyo / JP
For all designated states
ADVANTEST CORPORATION
32-1, Asahi-cho 1-chome Nerima-Ku
Tokyo / JP
Former [2002/44]For all designated states
CANON KABUSHIKI KAISHA
30-2, 3-chome, Shimomaruko, Ohta-ku
Tokyo / JP
For all designated states
Hitachi Ltd.
6, Kanda Surugadai 4-chome, Chiyoda-ku
Tokyo / JP
For all designated states
ADVANTEST CORPORATION
32-1, Asahi-cho 1-chome
Nerima-Ku Tokyo / JP
Inventor(s)01 / Muraki, Masato
Canon K.K., 3-30-2 Shimomaruko, Ohta-ku
Tokyo / JP
02 / Sohda, Yasunari, Hitachi, Ltd., I.P.G
New Marunouchi Bldg., 1-5-1 Marunouchi, Chiyoda-ku
Tokyo / JP
03 / Hashimoto, Shinichi
Advantest Corp., 1-32-1, Asahi-cho, Nerima-ku
Tokyo / JP
 [2009/41]
Former [2002/44]01 / Muraki, Masato
Canon K.K., 3-30-2 Shimomaruko, Ohta-ku
Tokyo / JP
02 / Sohda, Yasunari, Hitachi, Ltd., I.P.G
New Marumouchi Bldg., 1-5-1 Marunouchi, Chiyoda-ku
Tokyo / JP
03 / Hashimoto, Shinichi
Advantest Corp., 1-32-1, Asahi-cho, Nerima-ku
Tokyo / JP
Representative(s)TBK
Bavariaring 4-6
80336 München / DE
[N/P]
Former [2008/30]TBK-Patent
Bavariaring 4-6
80336 München / DE
Former [2002/44]Beresford, Keith Denis Lewis, et al
BERESFORD & Co. 2-5 Warwick Court, High Holborn
London WC1R 5DH / GB
Application number, filing date02252818.622.04.2002
[2002/44]
Priority number, dateJP2001012475823.04.2001         Original published format: JP 2001124758
[2002/44]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1253619
Date:30.10.2002
Language:EN
[2002/44]
Type: A3 Search report 
No.:EP1253619
Date:14.11.2007
[2007/46]
Type: B1 Patent specification 
No.:EP1253619
Date:14.10.2009
Language:EN
[2009/42]
Search report(s)(Supplementary) European search report - dispatched on:EP16.10.2007
ClassificationIPC:H01J37/04, H01J37/317
[2002/44]
CPC:
B82Y10/00 (EP,US); H01L21/027 (KR); H01J37/3177 (EP,US);
B82Y40/00 (EP,US); H01J37/045 (EP,US); H01J2237/0437 (EP,US);
H01J2237/31774 (EP,US) (-)
Designated contracting statesDE,   GB,   NL [2008/30]
Former [2002/44]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Ladungsträgerteilchenstrahl-Belichtungsgerät und dessen Anwendungverfahren zur Herstellung von Vorrichtungen[2002/44]
English:Charged particle beam exposure apparatus and device manufacturing method using same[2002/44]
French:Appareil d'exposition à faisceau de particules chargées et procédé pour son utilisation dans la fabrication de dispositifs[2002/44]
Examination procedure28.03.2008Examination requested  [2008/20]
13.05.2008Despatch of a communication from the examining division (Time limit: M04)
20.06.2008Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, FR, GR, IE, IT, LU, MC, PT, SE, TR
22.09.2008Reply to a communication from the examining division
04.05.2009Communication of intention to grant the patent
15.05.2009Loss of particular rights, legal effect: designated state(s)
02.09.2009Fee for grant paid
02.09.2009Fee for publishing/printing paid
Opposition(s)15.07.2010No opposition filed within time limit [2010/38]
Fees paidRenewal fee
26.04.2004Renewal fee patent year 03
19.04.2005Renewal fee patent year 04
20.03.2006Renewal fee patent year 05
17.04.2007Renewal fee patent year 06
28.03.2008Renewal fee patent year 07
29.04.2009Renewal fee patent year 08
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipGB22.04.2010
[2011/17]
Documents cited:Search[XY]US5973332  (MURAKI MASATO [JP], et al) [X] 1 * abstract * * column 7, line 60 - column 8, line 52 * * column 9, lines 19-57 *[Y] 3,4;
 [XY]US6104035  (MURAKI MASATO [JP]) [X] 1,2,5-8 * abstract * * figures 1,3a,3b,4a,5,23 * * column 4, line 51 - column 5, line 19 * * column 5, lines 35-59 * * column 6, lines 29-67 * * column 7, lines 8-59 * * column 21, lines 46-65 * [Y] 3,4
by applicantUS5973332
 US6104035
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.