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Extract from the Register of European Patents

EP About this file: EP1273677

EP1273677 - Method of depositing optical films [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  18.05.2007
Database last updated on 07.10.2024
Most recent event   Tooltip11.07.2008Change - representativepublished on 13.08.2008  [2008/33]
Applicant(s)For all designated states
Dalsa Semiconductor Inc.
605 McMurray Road
Waterloo, Ontario N2V 2E9 / CA
[2006/28]
Former [2003/38]For all designated states
DALSA Semiconductor Inc.
605 McMurray Road
Waterloo, Ontario N2V 2E9 / CA
Former [2003/02]For all designated states
Zarlink Semiconductor Inc.
400 March Road
Kanata, Ontario K2K 3H4 / CA
Inventor(s)01 / Ouellet, Luc
503 du Rubannier
Granby, Québec J2H 2R8 / CA
02 / Lachance, Jonathan
535 Brunelle
Granby, Québec J2G 9C9 / CA
03 / Grondin, Manuel
492 Auger
Granby, Québec J2J 1E3 / CA
04 / Blain, Stephane
1400 Tetreault
Sherbrooke, Québec J1K 2N6 / CA
 [2003/02]
Representative(s)Harding, Richard Patrick
Marks & Clerk LLP
4220 Nash Court
Oxford Business Park South
Oxford
OX4 2RU / GB
[N/P]
Former [2008/33]Harding, Richard Patrick
Marks & Clerk, 4220 Nash Court Oxford Business Park South Oxford
OX4 2RU / GB
Former [2003/02]Harding, Richard Patrick
Marks & Clerk, 4220 Nash Court Oxford Business Park South
Oxford OX4 2RU / GB
Application number, filing date02253833.430.05.2002
[2003/02]
Priority number, dateUS2001086766231.05.2001         Original published format: US 867662
[2003/02]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1273677
Date:08.01.2003
Language:EN
[2003/02]
Type: A3 Search report 
No.:EP1273677
Date:07.01.2004
[2004/02]
Type: B1 Patent specification 
No.:EP1273677
Date:12.07.2006
Language:EN
[2006/28]
Search report(s)(Supplementary) European search report - dispatched on:EP24.11.2003
ClassificationIPC:C23C16/54, C23C16/40, G02B1/10, G02B6/10, C23C16/52
[2004/02]
CPC:
C23C16/54 (EP,US); C23C16/401 (EP,US)
Former IPC [2003/02]C23C16/54, C23C16/40, G02B1/10, G02B6/10
Designated contracting statesDE,   FR,   GB [2004/43]
Former [2004/40]AT,  BE,  CH,  LI 
Former [2003/02]AT,  BE,  CH,  CY,  DE,  DK,  ES,  FI,  FR,  GB,  GR,  IE,  IT,  LI,  LU,  MC,  NL,  PT,  SE,  TR 
TitleGerman:Verfahren zur Herstellung optischer Schichten[2003/02]
English:Method of depositing optical films[2003/02]
French:Méthode de fabrication de films optiques[2003/02]
Examination procedure16.06.2004Examination requested  [2004/34]
08.07.2004Loss of particular rights, legal effect: designated state(s)
08.07.2004Loss of particular rights, legal effect: designated state(s)
08.07.2004Despatch of communication of loss of particular rights: designated state(s) SE
02.11.2004Despatch of communication of loss of particular rights: designated state(s) AT, BE, CH, CY, DK, ES, FI, GR, IE, IT, LU, MC, NL, PT, TR
08.12.2004Despatch of a communication from the examining division (Time limit: M06)
11.06.2005Reply to a communication from the examining division
29.12.2005Communication of intention to grant the patent
18.04.2006Fee for grant paid
18.04.2006Fee for publishing/printing paid
Opposition(s)13.04.2007No opposition filed within time limit [2007/25]
Fees paidRenewal fee
13.05.2004Renewal fee patent year 03
12.05.2005Renewal fee patent year 04
23.03.2006Renewal fee patent year 05
Penalty fee
Penalty fee Rule 85a EPC 1973
06.09.2004AT   M01   Not yet paid
06.09.2004BE   M01   Not yet paid
06.09.2004CH   M01   Not yet paid
13.08.2004CY   M01   Not yet paid
06.09.2004DK   M01   Not yet paid
06.09.2004ES   M01   Not yet paid
06.09.2004FI   M01   Not yet paid
06.09.2004GR   M01   Not yet paid
06.09.2004IE   M01   Not yet paid
06.09.2004IT   M01   Not yet paid
06.09.2004LU   M01   Not yet paid
06.09.2004MC   M01   Not yet paid
06.09.2004NL   M01   Not yet paid
06.09.2004PT   M01   Not yet paid
06.09.2004SE   M01   Not yet paid
06.09.2004TR   M01   Not yet paid
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Documents cited:Search[A]US4236905  (DABBY FRANKLIN W, et al) [A] 1-29 * column 3, line 1 - line 23 *;
 [A]US4394401  (SHIOYA YOSHIMI [JP], et al) [A] 1-29 * example 2 *;
 [XY]EP0788148  (ASM JAPAN [JP], et al) [X] 1-3,9 * column 4, line 1 - line 23; figure 4 * [Y] 4-8,10-12;
 [Y]US5660895  (LEE GIL S [US], et al) [Y] 29 * figure 16; example 16 *;
 [Y]US6130172  (FULLER ROBERT T [US], et al) [Y] 10-12 * column 6, line 15 - line 22 *;
 [PX]EP1134073  (DAINIPPON PRINTING CO LTD [JP]) [PX] 1-4,13,17,19* paragraphs [0033] , [0037] , [0097] , [0104] - [0107] *;
 [XY]  - KIM K ET AL, "PROPERTIES OF LOW DIELECTRIC CONSTANT FLUORINATED SILICON OXIDE FILMS PREPARED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, (19981102), vol. 332, no. 1/2, ISSN 0040-6090, pages 369 - 374, XP000669232 [X] 20-28 * paragraph [0002] * [Y] 8,29

DOI:   http://dx.doi.org/10.1016/S0040-6090(98)01039-6
 [XY]  - TAKAMATSU A ET AL, "PLASMA-ACTIVATED DEPOSITON AND PROPERTIES OF PHOSPHOSILICATE GLASS FILM", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, ELECTROCHEMICAL SOCIETY. MANCHESTER, NEW HAMPSHIRE, US, (198408), vol. 131, no. 8, ISSN 0013-4651, pages 1865 - 1870, XP000839945 [X] 20 *Eperimental* [Y] 4-7
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.