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EP1286217
European procedure
Extract from the Register of European Patents
EP About this file: EP1286217
| EP1286217 - Phase shift mask blanks, their manufacture and use [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 01.06.2012 Database last updated on 02.09.2024 | Most recent event Tooltip | 01.06.2012 | No opposition filed within time limit | published on 04.07.2012 [2012/27] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Otemachi 2-chome Chiyoda-ku Tokyo / JP | [2011/30] |
| Former [2003/09] | For all designated states SHIN-ETSU CHEMICAL CO., LTD. 6-1, Ohtemachi 2-chome Chiyoda-ku Tokyo / JP | Inventor(s) | 01 /
Kaneko, Hideo c/o New Functional Mat. Research Ctr. Shin-Etsu Chemical Co., Ltd. 28-1 Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 02 /
Inazuki, Yukio c/o New Functional Mat. Research Ctr. Shin-Etsu Chemical Co., Ltd. 28-1 Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 03 /
Tsukamoto, Tetsushi c/o New Functional Mat. Research Ctr. Shin-Etsu Chemical Co., Ltd. 28-1 Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | 04 /
Okazaki, Satoshi c/o New Functional Mat. Research Ctr. Shin-Etsu Chemical Co., Ltd. 28-1 Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | [2011/09] |
| Former [2011/08] | 01 /
Kaneko, Hideo, c/o Shin-Ezsu Chemical Co., Ltd. 28-1 Oaza Nishikushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | ||
| 02 /
Inazuki, Yukio, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | |||
| 03 /
Tsukamoto, Tetsuhi, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | |||
| 04 /
Okazaki, Satoshi, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | |||
| Former [2003/09] | 01 /
Kaneko, Hideo, c/o Shin-Ezsu Chemical Co., Ltd 28-1 Oaza Nishikushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | ||
| 02 /
Inazuki, Yukio, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | |||
| 03 /
Tsukamoto, Tetsuhi, Shin-Etsu Chemical Co., Ltd. 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | |||
| 04 /
Okazaki, Satoshi, Shin-Etsu Chemical Co., Ltd 28-1, Oaza Nishifukushima, Kubiki-mura Nakakubiki-gun, Niigata-ken / JP | Representative(s) | Stoner, Gerard Patrick, et al Mewburn Ellis LLP City Tower 40 Basinghall Street London EC2V 5DE / GB | [N/P] |
| Former [2003/09] | Stoner, Gerard Patrick, et al MEWBURN ELLIS York House 23 Kingsway London WC2B 6HP / GB | Application number, filing date | 02254507.3 | 26.06.2002 | [2003/09] | Priority number, date | JP20010192958 | 26.06.2001 Original published format: JP 2001192958 | [2003/09] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1286217 | Date: | 26.02.2003 | Language: | EN | [2003/09] | Type: | A3 Search report | No.: | EP1286217 | Date: | 07.05.2003 | [2003/19] | Type: | B1 Patent specification | No.: | EP1286217 | Date: | 27.07.2011 | Language: | EN | [2011/30] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 21.03.2003 | Classification | IPC: | G03F1/00, G03F1/08 | [2003/19] | CPC: |
G03F1/58 (EP,US);
G03F1/30 (KR);
B32B18/00 (EP,US);
C04B35/16 (EP,US);
C04B35/58007 (EP,US);
C04B35/58042 (EP,US);
C04B35/597 (EP,US);
G03F1/26 (KR);
G03F1/32 (EP,US);
C04B2235/9653 (EP,US);
C04B2237/34 (EP,US);
C04B2237/36 (EP,US);
C04B2237/704 (EP,US)
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| Former IPC [2003/09] | G03F1/00 | Designated contracting states | DE, FR, GB [2004/05] |
| Former [2003/09] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, SK, TR | Title | German: | Rohling für Phasenschiebermaske, deren Herstellung und Gebrauch | [2003/09] | English: | Phase shift mask blanks, their manufacture and use | [2003/09] | French: | Précurseur de masque à décalage de phase, sa fabrication et son usage | [2003/09] | Examination procedure | 16.07.2003 | Examination requested [2003/38] | 05.06.2009 | Despatch of a communication from the examining division (Time limit: M04) | 25.08.2009 | Reply to a communication from the examining division | 02.02.2011 | Communication of intention to grant the patent | 27.05.2011 | Fee for grant paid | 27.05.2011 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 05.06.2009 | Opposition(s) | 02.05.2012 | No opposition filed within time limit [2012/27] | Fees paid | Renewal fee | 14.06.2004 | Renewal fee patent year 03 | 14.06.2005 | Renewal fee patent year 04 | 14.06.2006 | Renewal fee patent year 05 | 14.06.2007 | Renewal fee patent year 06 | 28.03.2008 | Renewal fee patent year 07 | 16.06.2009 | Renewal fee patent year 08 | 11.06.2010 | Renewal fee patent year 09 | 13.06.2011 | Renewal fee patent year 10 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US5514499 (IWAMATSU TAKAYUKI [JP], et al) [X] 1 * claim 1 *; | [X]US5605776 (ISAO AKIHIKO [JP], et al) [X] 1-4,6-8 * claims 2,4,5,16; table 1 *; | [X]US5939227 (SMITH BRUCE W [US]) [X] 1,3 * column 2, line 25 - line 37; figure 1 *; | [X]US6051345 (HUANG CHIEN-CHAO [TW]) [X] 1 * figure 8A *; | [X]WO0120400 (DAINIPPON PRINTING CO LTD [JP], et al) [X] 1* paragraph [0043] *; | [X]KR20010051529 (MITSUBISHI ELECTRIC CORP, et al); | [PX]EP1117000 (SHINETSU CHEMICAL CO [JP]) [PX] 1,3 * claim 2 *; | [PX]DE10055280 (ULVAC COATING CORP [JP]) [PX] 1-4,6-8 * example - *; | [PX]EP1176466 (DAINIPPON PRINTING CO LTD [JP]) [PX] 1; | [E]US2002119378 (ANGELOPOULOS MARIE [US], et al) [E] 1 * claims 1,27 * | by applicant | US5514499 | US5605776 | US5939227 | US6051345 | WO0120400 | KR20010051529 |