EP1398826 - MICROWAVE PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND MICROWAVE RADIATING MEMBER [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 21.05.2010 Database last updated on 31.08.2024 | Most recent event Tooltip | 21.05.2010 | Application deemed to be withdrawn | published on 23.06.2010 [2010/25] | Applicant(s) | For all designated states Ohmi, Tadahiro 1-17-301, Komegafukuro 2-chome Aoba-ku Sendai-shi Miyagi-ken 980-0813 / JP | For all designated states TOKYO ELECTRON LIMITED 3-6 Akasaka 5-chome Minato-ku Tokyo 107-8481 / JP | [N/P] |
Former [2004/12] | For all designated states Ohmi, Tadahiro 1-17-301, Komegabukuro 2-chome, Aoba-ku Sendai-shi, Miyagi-ken 980-0813 / JP | ||
For all designated states TOKYO ELECTRON LIMITED 3-6 Akasaka 5-chome Minato-ku, Tokyo 107-8481 / JP | Inventor(s) | 01 /
OHMI, Tadahiro 1-17-301, Komegafukuro 2-Chome, Aoba-Ku Sendai-Shi, Miyagi 980-0813 / JP | 02 /
HIRAYAMA, Masaki 04, Aza-Aoba, Aramaki, Aoba-Ku sendai-Shi, Miyagi 980-8579 / JP | 03 /
GOTO, Tetsuya 04, Aza-Aoba, Aramaki, aoba-Ku Sendai-shi, Miyagi 980-8579 / JP | [2004/12] | Representative(s) | Liesegang, Eva Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [N/P] |
Former [2004/12] | Liesegang, Eva Forrester & Boehmert, Pettenkoferstrasse 20-22 80336 München / DE | Application number, filing date | 02738770.3 | 19.06.2002 | [2004/12] | WO2002JP06110 | Priority number, date | JP20010186915 | 20.06.2001 Original published format: JP 2001186915 | [2004/12] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO03001578 | Date: | 03.01.2003 | Language: | EN | [2003/01] | Type: | A1 Application with search report | No.: | EP1398826 | Date: | 17.03.2004 | Language: | EN | The application published by WIPO in one of the EPO official languages on 03.01.2003 takes the place of the publication of the European patent application. | [2004/12] | Search report(s) | International search report - published on: | JP | 03.01.2003 | (Supplementary) European search report - dispatched on: | EP | 04.08.2006 | Classification | IPC: | H01L21/31, C23C16/511, H01L21/3065, H05H1/46, H01J37/32 | [2006/36] | CPC: |
H01J37/3222 (EP,US);
H01L21/3065 (KR);
H01J37/32192 (EP,US)
|
Former IPC [2004/12] | H01L21/31, C23C16/511, H01L21/3065, H05H1/46 | Designated contracting states | AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, IT, LI, LU, MC, NL, PT, SE, TR [2004/12] | Extension states | AL | Not yet paid | LT | Not yet paid | LV | Not yet paid | MK | Not yet paid | RO | Not yet paid | SI | Not yet paid | Title | German: | MIKROWELLEN-PLASMAVERARBEITUNGSEINRICHTUNG, PLASMAVERARBEITUNGSVERFAHREN UND MIKROWELLENSTRAHLUNGSGLIED | [2004/12] | English: | MICROWAVE PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND MICROWAVE RADIATING MEMBER | [2004/12] | French: | DISPOSITIF DE TRAITEMENT AU PLASMA PAR MICRO-ONDES, PROCEDE DE TRAITEMENT AU PLASMA, ET ORGANE DE RAYONNEMENT DE MICRO-ONDES | [2004/12] | Entry into regional phase | 13.02.2003 | Translation filed | 13.02.2003 | National basic fee paid | 13.02.2003 | Search fee paid | 13.02.2003 | Designation fee(s) paid | 13.02.2003 | Examination fee paid | Examination procedure | 13.02.2003 | Examination requested [2004/12] | 05.01.2010 | Application deemed to be withdrawn, date of legal effect [2010/25] | 04.02.2010 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2010/25] | Fees paid | Renewal fee | 14.06.2004 | Renewal fee patent year 03 | 14.06.2005 | Renewal fee patent year 04 | 14.06.2006 | Renewal fee patent year 05 | 14.06.2007 | Renewal fee patent year 06 | 12.06.2008 | Renewal fee patent year 07 | Penalty fee | Additional fee for renewal fee | 30.06.2009 | 08   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [ ] - No further relevant documents disclosed | International search | [A]US5024716 (SATO YASUE [JP]); | [A]JPH03262119 (CANON KK); | [A]JPH08111297 (TOKYO ELECTRON LTD); | [A]US5698036 (ISHII NOBUO [JP], et al) |