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Extract from the Register of European Patents

EP About this file: EP1399382

EP1399382 - PRODUCTION OF HIGH-PURITY FLUORINE GAS AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS [Right-click to bookmark this link]
Former [2004/13]HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS
[2010/44]
StatusNo opposition filed within time limit
Status updated on  17.02.2012
Database last updated on 05.08.2024
Most recent event   Tooltip27.09.2013Lapse of the patent in a contracting state
New state(s): TR		published on 30.10.2013  [2013/44]
Applicant(s)For all designated states
Showa Denko K.K.
13-9, Shiba Daimon, 1-chome, Minato-ku
Tokyo 105-8518 / JP
[2011/15]
Former [2004/13]For all designated states
SHOWA DENKO K.K.
13-9, Shiba Daimon, 1-chome, Minato-ku
Tokyo 105-8518 / JP
Inventor(s)01 / TORISU, Junichi, c/o SHOWA DENKO K.K.
5-1, Ogimachi, Kawasaki-ku
Kawasaki-shi, Kanagawa 210-0867 / JP
02 / ATOBE, Hitoshi, c/o SHOWA DENKO K.K.
5-1, Ogimachi, Kawasaki-ku
Kawasaki-shi, Kanagawa 210-0867 / JP
03 / HOSHINO, Yasuyuki, c/o SHOWA DENKO K.K.
5-1, Ogimachi, Kawasaki-ku
Kawasaki-shi, Kanagawa 210-0867 / JP
 [2004/13]
Representative(s)Strehl Schübel-Hopf & Partner
Maximilianstrasse 54
80538 München / DE
[2004/13]
Application number, filing date02738834.727.06.2002
[2004/13]
WO2002JP06519
Priority number, dateJP2001019943729.06.2001         Original published format: JP 2001199437
JP2001019973129.06.2001         Original published format: JP 2001199731
[2004/13]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO03002454
Date:09.01.2003
Language:EN
[2003/02]
Type: A2 Application without search report 
No.:EP1399382
Date:24.03.2004
Language:EN
The application published by WIPO in one of the EPO official languages on 09.01.2003 takes the place of the publication of the European patent application.
[2004/13]
Type: B1 Patent specification 
No.:EP1399382
Date:13.04.2011
Language:EN
[2011/15]
Search report(s)International search report - published on:EP30.05.2003
ClassificationIPC:C01B7/20, C01G53/08, G01N30/14, H01S3/225
[2010/44]
CPC:
G01N21/3504 (EP,KR,US); C01B7/20 (EP,KR,US); G01N21/0303 (EP,KR,US);
G01N21/09 (EP,KR,US); H01S3/036 (EP,KR,US); H01S3/225 (EP,KR,US);
G01N2030/143 (EP,KR,US); Y10T436/19 (EP,US) (-)
Former IPC [2004/13]C01B7/20, C01G53/08, G01N30/14, G01N21/35, H01S3/225
Designated contracting statesAT,   BE,   CH,   CY,   DE,   DK,   ES,   FI,   FR,   GB,   GR,   IE,   IT,   LI,   LU,   MC,   NL,   PT,   SE,   TR [2004/13]
Extension statesALNot yet paid
LTNot yet paid
LVNot yet paid
MKNot yet paid
RONot yet paid
SINot yet paid
TitleGerman:HERSTELLUNG EINES HOCHREINEN FLUORGASES UND METHODE ZUR ANALYSE VON SPUREN IN EINEM HOCHREINEN FLUORGAS[2010/44]
English:PRODUCTION OF HIGH-PURITY FLUORINE GAS AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS[2010/44]
French:PRODUCTION DE FLUOR GAZEUX DE GRANDE PURETE ET ET PROCEDE D'ANALYSE D'IMPURETES A L'ETAT DE TRACES DANS DU FLUOR GAZEUX DE GRANDE PURETE[2010/44]
Former [2004/13]HOCHREINES FLUORGAS, DESSEN HERSTELLUNG UND VERWENDUNG UND METHODE ZUR ANALYSE VON SPUREN IN EINEM HOCHREINEN FLUORGAS
Former [2004/13]HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS
Former [2004/13]FLUOR GAZEUX DE GRANDE PURETE, PRODUCTION ET UTILISATION DE CE DERNIER, ET PROCEDE D'ANALYSE D'IMPURETES A L'ETAT DE TRACES DANS DU FLUOR GAZEUX DE GRANDE PURETE
Entry into regional phase17.02.2003National basic fee paid 
17.02.2003Designation fee(s) paid 
17.02.2003Examination fee paid 
Examination procedure17.02.2003Examination requested  [2004/13]
16.02.2009Despatch of a communication from the examining division (Time limit: M04)
09.06.2009Reply to a communication from the examining division
23.09.2010Date of oral proceedings
22.10.2010Communication of intention to grant the patent
28.02.2011Fee for grant paid
28.02.2011Fee for publishing/printing paid
Opposition(s)16.01.2012No opposition filed within time limit [2012/12]
Fees paidRenewal fee
21.06.2004Renewal fee patent year 03
20.06.2005Renewal fee patent year 04
22.06.2006Renewal fee patent year 05
18.06.2007Renewal fee patent year 06
24.06.2008Renewal fee patent year 07
18.06.2009Renewal fee patent year 08
22.06.2010Renewal fee patent year 09
Opt-out from the exclusive  Tooltip
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
IT13.04.2011
NL13.04.2011
SE13.04.2011
TR13.04.2011
IE27.06.2011
LU27.06.2011
CH30.06.2011
FR30.06.2011
LI30.06.2011
MC30.06.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
[2013/44]
Former [2013/25]AT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
IT13.04.2011
NL13.04.2011
SE13.04.2011
IE27.06.2011
LU27.06.2011
CH30.06.2011
FR30.06.2011
LI30.06.2011
MC30.06.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2013/21]AT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
IT13.04.2011
NL13.04.2011
SE13.04.2011
IE27.06.2011
CH30.06.2011
FR30.06.2011
LI30.06.2011
MC30.06.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2012/23]AT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
IT13.04.2011
NL13.04.2011
SE13.04.2011
IE27.06.2011
CH30.06.2011
FR30.06.2011
LI30.06.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2012/20]AT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
NL13.04.2011
SE13.04.2011
IE27.06.2011
CH30.06.2011
LI30.06.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2012/10]AT13.04.2011
BE13.04.2011
CY13.04.2011
DK13.04.2011
FI13.04.2011
NL13.04.2011
SE13.04.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2012/02]AT13.04.2011
BE13.04.2011
CY13.04.2011
FI13.04.2011
NL13.04.2011
SE13.04.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2012/01]AT13.04.2011
BE13.04.2011
CY13.04.2011
FI13.04.2011
SE13.04.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2011/49]CY13.04.2011
FI13.04.2011
SE13.04.2011
GR14.07.2011
ES24.07.2011
PT16.08.2011
Former [2011/47]PT16.08.2011
Cited inInternational search[Y]JP2001007423  ;
 [A]JPH07287001  ;
 [XY]US3989808  (ASPREY LARNED B) [X] 1-9,12-14 * column 2, line 15 - column 3, line 25; claim . * [Y] 15-19;
 [A]US4292287  (ORLETT MICHAEL J, et al) [A] 1-19 * the whole document *;
 [Y]GB2240639  (MAN TECHNOLOGIE GMBH [DE]) [Y] 20-24 * page 1, line 1 - line 3 * * page 2, line 7 - line 22 * * page 3, line 32 - page 4, line 19 * * page 5, line 8 - line 22 *;
 [X]US5363396  (WEBB COLIN E [GB], et al) [X] 1-7,12-14 * column 4, line 61 - column 5, line 20; figure 1 * * claims 1-7 *;
 [A]DE19618119  (LAMBDA PHYSIK GMBH [DE]) [A] 9,12 * abstract * * column 3, line 39 - line 46 *;
 [DA]EP0902101  (SHOWA DENKO KK [JP]) [DA] 21,22* page 3, line 35 - page 5, line 8; example - *;
 [Y]EP0957351  (AIR LIQUIDE [FR]) [Y] 20-24 * column 1, line 7 - column 1, line 13 * * column 5, line 57 - column 6, line 45 * * column 9, line 12 - line 50 * * figure 3 *
 [Y]  - PATENT ABSTRACTS OF JAPAN, (20010508), vol. 2000, no. 16, & JP2001007423 A 20010112 (SHOWA DENKO KK) [Y] 15-19 * abstract *
 [A]  - PATENT ABSTRACTS OF JAPAN, (19960229), vol. 1996, no. 02, & JP07287001 A 19951031 (KANTO DENKA KOGYO CO LTD) [A] 1-19 * abstract *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.